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Nitridation Kinetics of Silicon Monocrystal and Morphology of Nitride Film
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作者 孙贵如 李立本 +3 位作者 李文超 王俭 冯艳丽 李净 《Rare Metals》 SCIE EI CAS CSCD 1993年第1期49-56,共8页
Basing on TGA (thermal gravimetric analysis) of thermal nitridation at l200, l250, l300℃, respectively, analysis of high temperature kinetics for nitridation of silicon monocrystal has been carried out. According to ... Basing on TGA (thermal gravimetric analysis) of thermal nitridation at l200, l250, l300℃, respectively, analysis of high temperature kinetics for nitridation of silicon monocrystal has been carried out. According to the theory for kinetics of reaction of vapour with solid phase a nitridation kinetic model, from which it can be shown thal the rate of nitridation reaction of silicon crystal should be controlled by three stage limiting factors, was proposed. These limiting factors are chemical reaction, chemical reaction mixed with diffusion and diffu- sion. Using this model to treat our experimental data, satisfactory correlation coefficient and apparent activation energy of nitridation of p-type (lll) silicon crystal have been obtained. The nitride film was identi' fied to be a-Si_3N_4 (Hexagonal, a=0.7758nm,c_o=0.5623nm) by X-ray diffraction analysis. Morphology of the nitride films formed in different nitridation duration was observed in both planar andcross-sectional views by SEM (scanning electron microscope). 展开更多
关键词 Nitridation mechanism Silicon monocrystal Nitride film morphology
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Oxidation Kinetics of (111) Silicon Monocrystal and Morphology of Oxide Film in Dry Oxygen Atmosphere
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作者 李文超 樊自拴 +1 位作者 孙贵如 秦福 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1989年第5期362-365,共4页
1. Introduction Thermal oxidation of silicon monocrystalis a very important process in fabricationof metal--oxide--semiconductor (MOS) devices.In recent years it has received great atten-tion. Various proposals for ox... 1. Introduction Thermal oxidation of silicon monocrystalis a very important process in fabricationof metal--oxide--semiconductor (MOS) devices.In recent years it has received great atten-tion. Various proposals for oxidation modeshave been made by different groups.Now most of the authors working in thisfield hold the view that the oxidation rateof silicon obeys a typical parabolic rule,that is, the oxidation reaction is controlledby diffusion. The experimental data inRef. can be taken and a kinetic curve 展开更多
关键词 oxidation mechanism silicon monocrystal oxide film morphology
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Φ76 mm GaAs Monocrystal
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《Rare Metals》 SCIE EI CAS CSCD 1993年第1期71-71,共1页
General Research Institute for Nonferrous Metals (GRINM) obtained firstly in China aф76 mm, 180 mm-long, 4.5 kg GaAs crystal with a ± 3 mm deviation for diameter. At present thistechnique is introducing a crysta... General Research Institute for Nonferrous Metals (GRINM) obtained firstly in China aф76 mm, 180 mm-long, 4.5 kg GaAs crystal with a ± 3 mm deviation for diameter. At present thistechnique is introducing a crystal growth process in batches. 展开更多
关键词 GAAS mm GaAs monocrystal
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A CMOS Compatible MEMS Pirani Vacuum Gauge with Monocrystal Silicon Heaters and Heat Sinks
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作者 张乐民 焦斌斌 +3 位作者 云世昌 孔延梅 辜志伟 陈大鹏 《Chinese Physics Letters》 SCIE CAS CSCD 2017年第2期52-55,共4页
We present a micro-Pirani vacuum gauge using the low-resistivity monocrystal silicon as the heaters and heat sinks fabricated by the post complementary metal oxide semiconductor (CMOS) microelectromechanical system ... We present a micro-Pirani vacuum gauge using the low-resistivity monocrystal silicon as the heaters and heat sinks fabricated by the post complementary metal oxide semiconductor (CMOS) microelectromechanical system (MEMS) process. The metal interconnection of the device is fabricated by a 0.5 μm standard CMOS process on 8-inch silicon wafer. Then, a SiO2-Si low-temperature fusion bonding is developed to bond the CMOS wafer and the MEMS wafer, with the electrical connection realized by the tungsten through silicon via process. Wafer- level A1Ge euteetic bonding is adopted to package the Pirani gauge in a non-hermetic cavity to protect the gauge from being damaged or contaminated in the dicing and assembling process, and to make it suitable for actual applications. To increase the accuracy of the test and restrain negative influence of temperature drift, the Wheatstone bridge structure is introduced. The test results show that before capping, the gauge has an average sensitivity of 1.04 × 104 K.W-1Torr-1 in dynamic range of 0.01 20 Torr. After capping, the sensitivity of the gauge does not decrease but increases to 1.12 × 104 K.W-1 Torr-1. 展开更多
关键词 A CMOS Compatible MEMS Pirani Vacuum Gauge with monocrystal Silicon Heaters and Heat Sinks
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MONOCRYSTAL宝石的应用
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作者 郝全新 《工业金刚石》 2000年第4期27-27,共1页
关键词 monocrystal宝石 单晶金刚石毛坯 金刚石工具
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Interface evolution in the platelet-like SiC@C and SiC@ SiO2 monocrystal nanocapsules 被引量:3
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作者 Jian Gao Jieyi Yu +7 位作者 Lei Zhou Javid Muhammad Xinglong Dong Yinong Wang Hongtao Yu Xie Quan Shaojie Li Youngguan Jung 《Nano Research》 SCIE EI CAS CSCD 2017年第8期2644-2656,共13页
Carbon-coated SiC@C nanocapsules (NCs) with a hexagonal platelet-like morphology were fabricated by a simple direct current (DC) arc-discharge plasma method. The SiC@C NCs were monocrystalline, 120-150 nm in size,... Carbon-coated SiC@C nanocapsules (NCs) with a hexagonal platelet-like morphology were fabricated by a simple direct current (DC) arc-discharge plasma method. The SiC@C NCs were monocrystalline, 120-150 nm in size, and approximately 50 nm thick. The formation of the as-prepared SiC@C NCs included nucleation of truncated octahedral SiC seeds and subsequent anisotropic growth of the seeds into hexagonal nanoplatelets in a carbon-rich atmosphere. The disordered carbon layers on the SiC@C NCs were converted into SiO2 shells of SiC@SiO2 NCs by heat treatment at 650 ℃ in air, during which the shape and inherent characteristics of the crystalline SiC core were obtained. The interface evolution from carbon to SiO2 shells endowed the SiC@SiO2 NCs with enhanced photocatalytic activity due to the hydrophilic and transparent nature of the SiO2 shell, as well as to the photosensitive SiC nanocrystals. The band gap of the nanostructured SiC core was determined to be 2.70 eV. The SiC@SiO2 NCs degraded approximately 95% of methylene blue in 160 min under visible light irradiation. 展开更多
关键词 silicon carbide silicon oxide NANOCAPSULE monocrystal PHOTOCATALYST
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单晶金刚石工具 被引量:4
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作者 谈耀麟 《珠宝科技》 2002年第2期61-64,共4页
介绍了单晶金刚石工具在工业加工中的应用。对天然金刚石、人造金刚石单晶及人造金刚石聚晶的性质、特点以及在现代精密加工中的应用作了比较。重点对 De Beers公司的 MONOCRYSTAL
关键词 单晶金刚石工具 坯件 monocrystal 精密加工 应用
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单晶硅力学性能及尺寸效应的离散元模拟 被引量:5
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作者 姜胜强 谭援强 +1 位作者 李才 杨冬民 《中国机械工程》 EI CAS CSCD 北大核心 2010年第5期589-594,共6页
通过建立紧密连接且随机分布在指定区域内的圆盘形颗粒离散单元的力学模型来研究单晶硅的力学性能,并采用不同尺寸的离散元模型研究力学性能尺寸效应。结果表明:泊松比、单轴抗压强度、弹性模量以及断裂韧性的尺寸效应不明显,弯曲强度... 通过建立紧密连接且随机分布在指定区域内的圆盘形颗粒离散单元的力学模型来研究单晶硅的力学性能,并采用不同尺寸的离散元模型研究力学性能尺寸效应。结果表明:泊松比、单轴抗压强度、弹性模量以及断裂韧性的尺寸效应不明显,弯曲强度则随着模型尺寸的增大而减小。建立了连续体经典断裂力学有限宽板条单边直裂纹的离散元力学模型,改变初始裂纹长度进行模拟得到的结果与单边切口梁模拟结果及文献报道的试验值一致。 展开更多
关键词 单晶硅 力学特性 模拟 离散元法
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Stabilization of cubic ordering of zirconium dioxide nanoclusters on silicon with laser ablation
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作者 KUZ'MENKO A P PETERSON M B +3 位作者 KUZ'MENKO N A ZAVODINSKY V G PUGACHEVSKY M A DOBROMYSLOV M B 《Rare Metals》 SCIE EI CAS CSCD 2007年第S1期10-13,共4页
Regimes of continuous and pulsed laser action on high-melting oxide compounds of ZrO2 were found with the aim of obtaining steady coatings on monocrystal silicon on laser ablation.X-ray phase analyses,scanning and ato... Regimes of continuous and pulsed laser action on high-melting oxide compounds of ZrO2 were found with the aim of obtaining steady coatings on monocrystal silicon on laser ablation.X-ray phase analyses,scanning and atomic-force microscopy reveal that the coatings obtained are of nanocluster structure with the cubic ordering.In this case the nanoclusters reach several hundreds of nanometers in size.An assumption was made that on laser ablation of ZrO2 thermostabilization may take place where a minimum of the surface energy is attained just at cubic ordering. 展开更多
关键词 laser ablation thermostabilization atomic-force microscopy nanocluster structure monocrystal silicon
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单晶质CVD金刚石的特性及其制作切削工具的应用
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作者 谈耀麟 《超硬材料工程》 CAS 2007年第6期42-44,共3页
阐述单晶质CVD金刚石作切削工具所应考虑的力学与热学性质。元素6公司进行的研究试验表明,单晶质CVD金刚石切削工具在加工强度高质量轻的结构材料如金属基体复合材料(MMCs)等方面具有广阔发展前景。CVD金刚石镀覆工具在现代飞机制造业... 阐述单晶质CVD金刚石作切削工具所应考虑的力学与热学性质。元素6公司进行的研究试验表明,单晶质CVD金刚石切削工具在加工强度高质量轻的结构材料如金属基体复合材料(MMCs)等方面具有广阔发展前景。CVD金刚石镀覆工具在现代飞机制造业中加工碳纤维增强塑料(CFPs)和CFP-金属复合材料已显示出其重要作用。在汽车工业中用单晶金刚石镀覆刀片高效高精度车削含硅铝合金(Al-Si11Cu2Fe)材料的试验取得了良好的效果。 展开更多
关键词 单晶质CVD金刚石 特性 切削工具 金属基体复合材料 碳纤维增强塑料
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First Evidence of Surface SH-Wave Propagation in Cubic Piezomagnetics
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作者 Aleksey Zakharenko 《Journal of Electromagnetic Analysis and Applications》 2010年第5期287-296,共10页
This theoretical work provides with results of characteristics calculation of the ultrasonic surface Zakharenko waves (USZWs) existing in piezomagnetic cubic monocrystals of class m3m that can be readily used for non-... This theoretical work provides with results of characteristics calculation of the ultrasonic surface Zakharenko waves (USZWs) existing in piezomagnetic cubic monocrystals of class m3m that can be readily used for non-destructive testing. The piezomagnetic waves propagate in direction [101] corresponding to relatively easy magnetization for the following piezomagnetics: Galfenol, Terfenol-D, and CoFe2O4 with cubic structures. The phase velocities of the USZW-waves and the coefficient of magnetomechanical coupling (CMMC) K2 were calculated for the crystals. It was found that the coefficient K2 for piezomagnetics with Km2 > 1/3 and Km2 >> 1/3 is about 8% to 9%, where K2 = 2 (VUSZW,o – VUSZW,c)/VUSZW,o and Km2 = h2/(Cμ). Knowledge of piezomagnetic properties of cubic crystals makes possible the use of them in new products utilizing the phenomenon called the magnetoelectric effect. Also, this study is useful for possible application of cubic piezomagnetics in composite structures consisting of piezoelectric and (or) piezomagnetic materials and in the microwave technology. This broadens choice of possible piezomagnetic materials for utilization in various technical devices. 展开更多
关键词 Piezomagnetic CUBIC monocrystalS GALFENOL and TERFENOL-D Ultrasonic SURFACE Zakharenko Waves
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