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Comparison of band-to-band tunneling models in Si and Si–Ge junctions
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作者 矫亦朋 魏康亮 +2 位作者 王泰寰 杜刚 刘晓彦 《Journal of Semiconductors》 EI CAS CSCD 2013年第9期6-10,共5页
We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si... We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si homo-junctions, different models could achieve similar results. However, in the Si-Ge hetero-junctions, there were significant differences among these models at high reverse biases (over 2 V). Compared to the nonlocal model, the local models in Sentaurus underrated the BTBT rate distinctly, and the Monte Carlo method was shown to give a better approximation. Additionally, it was found that in the Si region near the interface of the Si-Ge hetero-junctions, the direct tunneling rates increased largely due to the interaction of the band structures of Si and Ge. 展开更多
关键词 hetero-structure monte carlo device simulation carrier transport band-to-band tunneling
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