This paper concentrates on the research of plaster-bonded moulding matertal with coal mine waste as its major filler and its process. Having made a careful investigation of various factorsaffecting properties of the m...This paper concentrates on the research of plaster-bonded moulding matertal with coal mine waste as its major filler and its process. Having made a careful investigation of various factorsaffecting properties of the moulding material, the authors optimize several new formulations of thismaterial and the prarees which are inexpensive, convenient in application, precise in bokling sizoof moulds.展开更多
To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bott...To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bottom surface and wafer top surface. In nanoimprint lithography process, a mathematical equation is formulated to demonstrate the relation between the residual re- sist thickness and the pressing force during pressing the mould toward the resist-coated wafer. Based on these analytical studies, a new imprint process, which includes a pre-cure release of the pressing force, was proposed for the high-conformity transfer of nano-patterns from the mould to the wafer. The results of a series of imprint experiments showed that the proposed loading process could meet the requirements for the imprint of different patterns and feature sizes while maintaining a uniform residual resist and non-distorted transfer of nano-patterns from the mould to the resist- coated wafer.展开更多
文摘This paper concentrates on the research of plaster-bonded moulding matertal with coal mine waste as its major filler and its process. Having made a careful investigation of various factorsaffecting properties of the moulding material, the authors optimize several new formulations of thismaterial and the prarees which are inexpensive, convenient in application, precise in bokling sizoof moulds.
基金Supported by National Natural Science Foundation of China (No. E05020203) , "863" National Hi-Tech Program(No.2002AA420050) and "973" National Key Basic Research Program ( No. 2003CB716202).
文摘To tackle the demoulding and conglutinating problem with the resist and hard mold in the nanoimprint lithography process, a soft mould can be used to demould and reduce the macro or mi- cro mismatch between mould bottom surface and wafer top surface. In nanoimprint lithography process, a mathematical equation is formulated to demonstrate the relation between the residual re- sist thickness and the pressing force during pressing the mould toward the resist-coated wafer. Based on these analytical studies, a new imprint process, which includes a pre-cure release of the pressing force, was proposed for the high-conformity transfer of nano-patterns from the mould to the wafer. The results of a series of imprint experiments showed that the proposed loading process could meet the requirements for the imprint of different patterns and feature sizes while maintaining a uniform residual resist and non-distorted transfer of nano-patterns from the mould to the resist- coated wafer.
