Two thixoforming technologies of 6066 aluminum alloy (Al 1.37Si 1.37Mg 0.77Cu 0.07Mn ) produced by multi layer spray deposition process were studied. The spray formed materials are of equiaxed and very fine grain (10...Two thixoforming technologies of 6066 aluminum alloy (Al 1.37Si 1.37Mg 0.77Cu 0.07Mn ) produced by multi layer spray deposition process were studied. The spray formed materials are of equiaxed and very fine grain (10~20 μm). And the grain size coarsens slower than that of conventional casting materials at temperature below the liquidus, which may relate to high temperature particles distributed along the grain boundaries. Extrusion and hot pressing were used as the thixoforming processes respectively. After extrusion the materials show a microstructure of mean grain size below 20 μm without obvious recrystallization. The mechanical properties achieved via extrusion and pressing in semi solid state attain that of common wrought materials with shorter peak aging time of 4~5 h, about half of that in conventional condition. [展开更多
SiC particulate reinforced 6066 aluminium alloy metal matrix composites (MMCs) were prepared by multi layer spray forming. The preparation technology and process parameters were discussed. It is shown that SiC particu...SiC particulate reinforced 6066 aluminium alloy metal matrix composites (MMCs) were prepared by multi layer spray forming. The preparation technology and process parameters were discussed. It is shown that SiC particulate can be continuously and evenly fed and co deposited in the spray forming process. The reciprocally scanning movement of spraying system can make the SiC particulates distribute homogeneously in the composite. The ratio of SiC particulates captured by the metal matrix is influenced by process parameters, especially the metal flow rate. 6066/SiC p composite preforms of d 300 mm×540 mm and tubes with a size of up to d 650/ d 300 mm×1 000 mm were made by the same process. After extrusion and T6 heat treatment, the multi layer spray deposited 6066/SiC p composites can achieve improved properties. [展开更多
Preparation of large scale aluminium alloy cylindrical preforms have been studied by the methods of vertical spray deposition and tilted spray deposition respectively. The results show that aluminium alloy cylindrical...Preparation of large scale aluminium alloy cylindrical preforms have been studied by the methods of vertical spray deposition and tilted spray deposition respectively. The results show that aluminium alloy cylindrical preforms of a size up to d 320 mm×500 mm can take shape well by applying multi layer tilted spray deposition technology if the process is controlled properly. The spray system scans in a radius ranging from the center to the rim of the preform, and the velocity is inversely proportional to the displacement. The multi layer deposited preforms exhibit high cooling rate. The larger the diameter is and the higher the cooling rate and yield are.展开更多
A quantitative method is developed to identify the structures of multi-layer woven fabric in this study. Six structural parameters are selected to represent the fabric structure. With some design criteria for the rein...A quantitative method is developed to identify the structures of multi-layer woven fabric in this study. Six structural parameters are selected to represent the fabric structure. With some design criteria for the reinforcement of textile composites, the relationships among the structural parameters are derived for different binding patterns of the fabric structure. The conditions, which meet the requirements of structural cell stability,are also discussed.展开更多
ZnTe, CdTe, and the ternary alloy CdZnTe are important semiconductor materials used widely for the detection of an important range of electromagnetic radiation as gamma ray and X-ray. Although, recently these material...ZnTe, CdTe, and the ternary alloy CdZnTe are important semiconductor materials used widely for the detection of an important range of electromagnetic radiation as gamma ray and X-ray. Although, recently these materials have acquired renewed importance due to the new explored nanolayer properties of modern devices. In addition, as shown in this work they can be grown using uncomplicated synthesis techniques based on the deposition in vapour phase of the elemental precursors. This work presents the results obtained from the deposition of nanolayers of these materials using the precursor vapour on GaAs and GaSb (001) substrates. This growth technique, extensively known as atomic layer deposition (ALD), allows the layers growth with nanometric dimension. The main results presented in this work are the used growth parameters and the results of the structural characterization of the layers by the means of Raman spectroscopy measurements. Raman scattering shows the peak corresponding to longitudinal optical (LO)-ZnTe, which is weak and slightly redshift in comparison with that reported for the ZnTe bulk at 210 cm^-1. For the case of the CdTe nanolayer, Raman spectra presented the LO-CdTe peak, which is indicative of the successful growth of the layer. Its weak and slightly redshift in comparison with that reported for the CdTe bulk can be related with the nanometric characteristic of this layer. The performed high-resolution X-ray diffraction (HR-XRD) measurement allows to study some important characteristics such as the crystallinity of the grown layer. In addition, the HR-XRD measurement suggests that the crystalline quality has dependence on the growth temperature.展开更多
Applying a novel method of arc-glow plasma depositing, a 2μm-thick coating with 12 sub-layers of TiN and CrN was deposited alternately on the surface of magnesium alloy AZ91D to improve its wear resistance. The wear ...Applying a novel method of arc-glow plasma depositing, a 2μm-thick coating with 12 sub-layers of TiN and CrN was deposited alternately on the surface of magnesium alloy AZ91D to improve its wear resistance. The wear behavior was investigated by test of ball on disc sliding. The composition and microstructure of the coating were also analyzed by means of X-ray diffraction (XRD) and glow discharge spectrum (GDS), and the morphology of TiN-CrN film was surveyed through scanning electronic microscopy (SEM) and atom force microscopy (AFM).The adhesion strength between film and matrix was evaluated by ways of stick-peeling test. The surface micro-hardness of the coating is above HK0.011 433, and the specific wear ratio of specimens coated with TiN-CrN films tested decreases greatly compared to that of the bare metal.展开更多
A metal-insulator-silicon (MIS) capacitor with hemi-spherical grained poly atomic layer deposition (ALD) deposited Al2O3 and multi-layered chemical vapor deposition (CVD) TiN structure is fabricated. The impact ...A metal-insulator-silicon (MIS) capacitor with hemi-spherical grained poly atomic layer deposition (ALD) deposited Al2O3 and multi-layered chemical vapor deposition (CVD) TiN structure is fabricated. The impact of the deposition process and post treatment condition on the MIS capacitor's time-dependent dielectric breakdown (TDDB) performance is also studied. With an optimized process, it is confirmed by Auger electron spectroscopy and secondary ion mass spectrometry analysis that the Al(CH3)3/O3-based ALD Al2O3 dielectric film is carbon free and the hydrogen content is as low as 9 × 1019 cm-3. The top electrode TiN is obtained by multi-layered TiCl4/NH3 CVD deposited TiN followed by 120 s post NH3 treatment after each layer. This has higher diffusion barrier in preventing impurity diffusion through TiN into the Al2O3 dielectric due to its smaller grain size. As shown in energy dispersive X-ray analysis, there is no chlorine residue in the MIS capacitor structure. The leakage current of the capacitor is lower than 1 × 10-12 A/cm2. No early failures under stress conditions are found in its TDDB test. The novel MIS capacitor is proven to have excellent reliability for advanced DRAM technology.展开更多
To further study the effect of sputtered Au film as transition electrode layer on the electrical properties and interface microstructures of Na20-PbO-Nb2O5-SiO2 multilayer glass-ceramic capacitors, Au films pre-deposi...To further study the effect of sputtered Au film as transition electrode layer on the electrical properties and interface microstructures of Na20-PbO-Nb2O5-SiO2 multilayer glass-ceramic capacitors, Au films pre-deposited at different time were prepared by DC magnetron sputtering. Compared with the single paste electrode structure, samples with Au films pre-deposited from 6 to 18 min have the consistent perfor- mance to effectively improve the electrical properties of the capacitors, resulting in the doubled breakdown strength, an increase of equivalent capacitance by 22% and a decrease of leakage current by an order of magnitude. SEM observations indicate that the Au films with deposition time from 6 to 18 min would all help the formation of a dense electrode/dielectric interface and inhibit the diffusion of Ag. The results reveal that Au film pre-deposited for 6 min as inner electrode was sufficient to improve the interface microstructure and therefore to inhibit the Ag diffusion and enhance the overall performance of the multi-layer glass-ceramic capacitors.展开更多
A stack of Al2O3/SiNx dual layer was applied for the back side surface passivation of p-type multi-crystalline silicon solar cells, with laser-opened line metal contacts, forming a local aluminum back surface field (...A stack of Al2O3/SiNx dual layer was applied for the back side surface passivation of p-type multi-crystalline silicon solar cells, with laser-opened line metal contacts, forming a local aluminum back surface field (local Al-BSF) structure. A slight amount of Al2O3, wrapping around to the front side of the wafer during the thermal atomic layer deposition process, was found to have a negative influence on cell performance. The different process flow was found to lead to a different cell performance, because of the Al2O3 wrapping around the front surface. The best cell performance, with an absolute efficiency gain of about 0.6% compared with the normal full Al-BSF structure solar cell, was achieved when the Al2O3 layer was deposited after the front surface of the wafer had been covered by a SiNx layer. We discuss the possible reasons for this phenomenon, and propose three explanations as the Ag paste, being hindered from firing through the front passivation layer, degraded the SiNx passivation effect and the Al2O3 induced an inversion effect on the front surface. Characterization methods like internal quantum efficiency and contact resistance scanning were used to assist our understanding of the underlying mechanisms.展开更多
文摘Two thixoforming technologies of 6066 aluminum alloy (Al 1.37Si 1.37Mg 0.77Cu 0.07Mn ) produced by multi layer spray deposition process were studied. The spray formed materials are of equiaxed and very fine grain (10~20 μm). And the grain size coarsens slower than that of conventional casting materials at temperature below the liquidus, which may relate to high temperature particles distributed along the grain boundaries. Extrusion and hot pressing were used as the thixoforming processes respectively. After extrusion the materials show a microstructure of mean grain size below 20 μm without obvious recrystallization. The mechanical properties achieved via extrusion and pressing in semi solid state attain that of common wrought materials with shorter peak aging time of 4~5 h, about half of that in conventional condition. [
文摘SiC particulate reinforced 6066 aluminium alloy metal matrix composites (MMCs) were prepared by multi layer spray forming. The preparation technology and process parameters were discussed. It is shown that SiC particulate can be continuously and evenly fed and co deposited in the spray forming process. The reciprocally scanning movement of spraying system can make the SiC particulates distribute homogeneously in the composite. The ratio of SiC particulates captured by the metal matrix is influenced by process parameters, especially the metal flow rate. 6066/SiC p composite preforms of d 300 mm×540 mm and tubes with a size of up to d 650/ d 300 mm×1 000 mm were made by the same process. After extrusion and T6 heat treatment, the multi layer spray deposited 6066/SiC p composites can achieve improved properties. [
文摘Preparation of large scale aluminium alloy cylindrical preforms have been studied by the methods of vertical spray deposition and tilted spray deposition respectively. The results show that aluminium alloy cylindrical preforms of a size up to d 320 mm×500 mm can take shape well by applying multi layer tilted spray deposition technology if the process is controlled properly. The spray system scans in a radius ranging from the center to the rim of the preform, and the velocity is inversely proportional to the displacement. The multi layer deposited preforms exhibit high cooling rate. The larger the diameter is and the higher the cooling rate and yield are.
文摘A quantitative method is developed to identify the structures of multi-layer woven fabric in this study. Six structural parameters are selected to represent the fabric structure. With some design criteria for the reinforcement of textile composites, the relationships among the structural parameters are derived for different binding patterns of the fabric structure. The conditions, which meet the requirements of structural cell stability,are also discussed.
文摘ZnTe, CdTe, and the ternary alloy CdZnTe are important semiconductor materials used widely for the detection of an important range of electromagnetic radiation as gamma ray and X-ray. Although, recently these materials have acquired renewed importance due to the new explored nanolayer properties of modern devices. In addition, as shown in this work they can be grown using uncomplicated synthesis techniques based on the deposition in vapour phase of the elemental precursors. This work presents the results obtained from the deposition of nanolayers of these materials using the precursor vapour on GaAs and GaSb (001) substrates. This growth technique, extensively known as atomic layer deposition (ALD), allows the layers growth with nanometric dimension. The main results presented in this work are the used growth parameters and the results of the structural characterization of the layers by the means of Raman spectroscopy measurements. Raman scattering shows the peak corresponding to longitudinal optical (LO)-ZnTe, which is weak and slightly redshift in comparison with that reported for the ZnTe bulk at 210 cm^-1. For the case of the CdTe nanolayer, Raman spectra presented the LO-CdTe peak, which is indicative of the successful growth of the layer. Its weak and slightly redshift in comparison with that reported for the CdTe bulk can be related with the nanometric characteristic of this layer. The performed high-resolution X-ray diffraction (HR-XRD) measurement allows to study some important characteristics such as the crystallinity of the grown layer. In addition, the HR-XRD measurement suggests that the crystalline quality has dependence on the growth temperature.
基金Project(20041065) supported by the Natural Science Foundation of Shanxi Province, China
文摘Applying a novel method of arc-glow plasma depositing, a 2μm-thick coating with 12 sub-layers of TiN and CrN was deposited alternately on the surface of magnesium alloy AZ91D to improve its wear resistance. The wear behavior was investigated by test of ball on disc sliding. The composition and microstructure of the coating were also analyzed by means of X-ray diffraction (XRD) and glow discharge spectrum (GDS), and the morphology of TiN-CrN film was surveyed through scanning electronic microscopy (SEM) and atom force microscopy (AFM).The adhesion strength between film and matrix was evaluated by ways of stick-peeling test. The surface micro-hardness of the coating is above HK0.011 433, and the specific wear ratio of specimens coated with TiN-CrN films tested decreases greatly compared to that of the bare metal.
基金supported by the National Natural Science Foundation of China (No.50371033)the Specialized Research Fund for the Doctoral Program of Higher Education (No.20040674009)the Semiconductor Manufacturing International Corporation
文摘A metal-insulator-silicon (MIS) capacitor with hemi-spherical grained poly atomic layer deposition (ALD) deposited Al2O3 and multi-layered chemical vapor deposition (CVD) TiN structure is fabricated. The impact of the deposition process and post treatment condition on the MIS capacitor's time-dependent dielectric breakdown (TDDB) performance is also studied. With an optimized process, it is confirmed by Auger electron spectroscopy and secondary ion mass spectrometry analysis that the Al(CH3)3/O3-based ALD Al2O3 dielectric film is carbon free and the hydrogen content is as low as 9 × 1019 cm-3. The top electrode TiN is obtained by multi-layered TiCl4/NH3 CVD deposited TiN followed by 120 s post NH3 treatment after each layer. This has higher diffusion barrier in preventing impurity diffusion through TiN into the Al2O3 dielectric due to its smaller grain size. As shown in energy dispersive X-ray analysis, there is no chlorine residue in the MIS capacitor structure. The leakage current of the capacitor is lower than 1 × 10-12 A/cm2. No early failures under stress conditions are found in its TDDB test. The novel MIS capacitor is proven to have excellent reliability for advanced DRAM technology.
基金financially supported by the National High Technical Research and Development Programme of China (No.2008AA03A236)
文摘To further study the effect of sputtered Au film as transition electrode layer on the electrical properties and interface microstructures of Na20-PbO-Nb2O5-SiO2 multilayer glass-ceramic capacitors, Au films pre-deposited at different time were prepared by DC magnetron sputtering. Compared with the single paste electrode structure, samples with Au films pre-deposited from 6 to 18 min have the consistent perfor- mance to effectively improve the electrical properties of the capacitors, resulting in the doubled breakdown strength, an increase of equivalent capacitance by 22% and a decrease of leakage current by an order of magnitude. SEM observations indicate that the Au films with deposition time from 6 to 18 min would all help the formation of a dense electrode/dielectric interface and inhibit the diffusion of Ag. The results reveal that Au film pre-deposited for 6 min as inner electrode was sufficient to improve the interface microstructure and therefore to inhibit the Ag diffusion and enhance the overall performance of the multi-layer glass-ceramic capacitors.
文摘A stack of Al2O3/SiNx dual layer was applied for the back side surface passivation of p-type multi-crystalline silicon solar cells, with laser-opened line metal contacts, forming a local aluminum back surface field (local Al-BSF) structure. A slight amount of Al2O3, wrapping around to the front side of the wafer during the thermal atomic layer deposition process, was found to have a negative influence on cell performance. The different process flow was found to lead to a different cell performance, because of the Al2O3 wrapping around the front surface. The best cell performance, with an absolute efficiency gain of about 0.6% compared with the normal full Al-BSF structure solar cell, was achieved when the Al2O3 layer was deposited after the front surface of the wafer had been covered by a SiNx layer. We discuss the possible reasons for this phenomenon, and propose three explanations as the Ag paste, being hindered from firing through the front passivation layer, degraded the SiNx passivation effect and the Al2O3 induced an inversion effect on the front surface. Characterization methods like internal quantum efficiency and contact resistance scanning were used to assist our understanding of the underlying mechanisms.