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Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO_2/SiO_2 multilayer dielectric films at 532 nm 被引量:1
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作者 刘文文 魏朝阳 +1 位作者 易葵 邵建达 《Chinese Optics Letters》 SCIE EI CAS CSCD 2015年第9期53-57,共5页
Nanosecond single- and multiple-pulse laser damage studies on HfOffSiO2 high-reflection (HR) coatings are performed at 532 nm. For single-pulse irradiation, the damage is attributed to the defects and the electric i... Nanosecond single- and multiple-pulse laser damage studies on HfOffSiO2 high-reflection (HR) coatings are performed at 532 nm. For single-pulse irradiation, the damage is attributed to the defects and the electric intensity distribution in the multilayer thin films. When the defect density in the irradiated area is high, delami- nation is observed. Other than the 1064 nm laser damage, the plasma scalding of the 532 nm laser damage is not pits-centered for normal incidence, and the size of the plasma scalding has no relation to the defect density and position, but increases with the laser fluence. For multiple-pulse irradiations, some damage sites show deeper precursors than those from the single-shot irradiation due to the accumulation effects. The cumulative laser- induced damages behave as pits without the presence of plasma scalding, which is unaffected by the laser fluence and shot numbers. The damage morphologies and depth information both confirm the fatigue effect of a HfO2/SiO2 HR coating under 532 nm laser irradiation. 展开更多
关键词 Multiscale analysis of single and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm
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