It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effect...It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show that： with an increasing flow rate, the total ion（N＋2, N＋） density decreases, the mean sheath thickness becomes wider, the radial electric field in the sheath and the axial electric field show an increase, and the energies of both kinds of nitrogen ions increase;and, as the axial ion current density that is moving toward the ground electrode increases, the ion current density near the ground electrode increases. The simulation results will provide a useful reference for plasma jet technology involving rf hollow cathode discharges in N2.展开更多
用等摩尔量甘油和癸二酸在N2流除水条件下缩聚,对N2流量和反应温度进行优化.采用FTIR、酸值、特性黏度、凝胶渗透色谱和1 H NMR对产物进行分析,得到优化反应条件.当N2流量0.1m3/h,聚合温度160℃,反应时间7.75h时,产物羧基酯化率达90.3%...用等摩尔量甘油和癸二酸在N2流除水条件下缩聚,对N2流量和反应温度进行优化.采用FTIR、酸值、特性黏度、凝胶渗透色谱和1 H NMR对产物进行分析,得到优化反应条件.当N2流量0.1m3/h,聚合温度160℃,反应时间7.75h时,产物羧基酯化率达90.3%,特性黏度为42.0mL/g,数均相对分子质量为2 200,重均相对分子质量为249 800,相对分子质量大于10 000和3 000的组分质量分数分别为50.5%和71.5%.该方法经济性地合成了较高相对分子质量的聚癸二酸甘油酯.展开更多
基金supported by the Natural Science Foundation of Hebei Province,China(No.A2012205072)
文摘It is known that gas flow rate is a key factor in controlling industrial plasma processing. In this paper, a 2D PIC/MCC model is developed for an rf hollow cathode discharge with an axial nitrogen gas flow. The effects of the gas flow rate on the plasma parameters are calculated and the results show that： with an increasing flow rate, the total ion（N＋2, N＋） density decreases, the mean sheath thickness becomes wider, the radial electric field in the sheath and the axial electric field show an increase, and the energies of both kinds of nitrogen ions increase;and, as the axial ion current density that is moving toward the ground electrode increases, the ion current density near the ground electrode increases. The simulation results will provide a useful reference for plasma jet technology involving rf hollow cathode discharges in N2.
