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NANOSTRUCTURES OF FUNCTIONAL BLOCK COPOLYMERS
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作者 Guojun Liu Department of Chemistry, University of Calgary, 2500 University Dr., NW, Calgary, Alberta, Canada T2N IN4 《Chinese Journal of Polymer Science》 SCIE CAS CSCD 2000年第3期255-262,共8页
Nanostructure fabrication from block copolymers in my group normally involves polymer design, synthesis, self-assembly, selective domain crosslinking, and sometimes selective domain removal. Preparation of thin films ... Nanostructure fabrication from block copolymers in my group normally involves polymer design, synthesis, self-assembly, selective domain crosslinking, and sometimes selective domain removal. Preparation of thin films withnanochannels was used to illustrate the strategy we took. In this particular case, a linear triblock copolymer polyisoprenc-block-poly(2-cinnamoylethyl methacrylate)-block-poly(t-butyl acrylate), PI-b-PCEMA-b-PtBA, was used. Films, 25 to50 μm thick, were prepared from casting on glass slides a toluene solution of PI-b-PCEMA-b-PtBA and PtBA homopolymer,hPtBA, where hPtBA is shorter than the PtBA block. At the hPtBA mass faction of 20% relative to the triblock or the totalPtBA (hPtBA and PtBA block) volume fraction of 0.44, hPtBA and PtBA formed a seemingly continuous phase in the matrixof PCEMA and Pl. Such a block segregation pattern was locked in by photocrosslinking the PCEMA domain. Nanochannelswere formed by extracting out hPtBA with solvent. Alternatively. larger channels were obtained from extracting out hPtBAand hydrolyzing the t-butyl groups of the PtBA block. Such membranes were not liquid permeable but had gas permeabilityconstants ~6 orders of magnitude higher than that of low-density polyethylene films. 展开更多
关键词 NANOSTRUCTURES Block copolymers nanochannel generation Self-Assembly Polyisoprene-b-poly(2-cinnanoylethyl methacrylate)-b-poly(t-butyl acrylate)
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