期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Microstructure and properties of Nb/Ta multilayer films irradiated by a high current pulse electron beam
1
作者 马欣新 郭光伟 +2 位作者 唐光泽 孙明仁 王黎钦 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第5期407-411,共5页
Nb/Ta multilayer films deposited on Ti6A14V substrate with Nb and Ta monolayer thicknesses of 30 nm, 120 nm, and 240 nm were irradiated by a high current pulse electron beam (HCPEB) to prepare Nb-Ta alloyed layers. ... Nb/Ta multilayer films deposited on Ti6A14V substrate with Nb and Ta monolayer thicknesses of 30 nm, 120 nm, and 240 nm were irradiated by a high current pulse electron beam (HCPEB) to prepare Nb-Ta alloyed layers. The mi- crostructure and the composition of the outmost surface of melted alloyed layers were investigated using a transmission electron microscope (TEM) equipped with an X-ray energy dispersive spectrometer (EDS) attachment. The Ta content of the alloyed surface layer prepared from the monolayer of thickness 30 nm, 120 nm, and 240 nm was- 27.7 at.%, 6.37 at.%, and 0 at.%, respectively. It was found that the Ta content in the alloyed layer plays a dominant role in the microstructure of the films. The hardness and the wear rate of the alloyed layers decrease with the increasing content of Ta in the surface laver. 展开更多
关键词 nb-ta alloyed layer multilayer film high current pulse electron beam wear resistance
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部