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Microstructure and Optical Characterization of Magnetron Sputtered NbN Thin Films
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作者 DU Xin-kang WANG Tian-min +2 位作者 WANG Cong CHEN Bu-liang ZHOU Long 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2007年第2期140-144,共5页
Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and diff... Some fundamental studies on the preparation, structure and optical properties of NbN films were carried out. NbN thin films were deposited by DC reactive magnetron sputtering at different N2 partial pressures and different substrate temperatures ranging from -50℃ to 600℃. X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM) were employed to characterize their phase components, microstructures, grain sizes and surface morphology. Optical properties inclusive of refractive indexes, extinction coefficients and transmittance of the NbN films under different sputtering conditions were measured. With the increase in the N2 partial pressure, 6-NbN phase structure gets forming and the grain size and lattice constant of the cubic NbN increasing. The deposited NbN film has relatively high values of refractive index and extinction coefficient in the wavelength ranging from 240 nm to 830 nm. Substrate temperature exerts notable influences on the microstructure and optical transmittance of the NbN films. The grain sizes of the 6-NbN film remarkably increase with the rise of the substrate temperature, while the transmittance of the films with the same thickness decreases. Ultra-fine granular film with particle size of several nanometers forms when the substrate is cooled to -50℃, and a remarkable augmentation of transmittance could be noticed under so low a temperature. 展开更多
关键词 reactive magnetron sputtering nbn thin film MICROSTRUCTURE optical properties
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Fabrication of superconducting NbN meander nanowires by nano-imprint lithography 被引量:1
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作者 杨美 刘丽华 +5 位作者 宁鲁慧 金贻荣 邓辉 李洁 李阳 郑东宁 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第1期384-389,共6页
Superconducting nanowire single photon detector (SNSPD), as a new type of superconducting single photon detector (SPD), has a broad application prospect in quantum communication and other fields. In order to prepa... Superconducting nanowire single photon detector (SNSPD), as a new type of superconducting single photon detector (SPD), has a broad application prospect in quantum communication and other fields. In order to prepare SNSPD with high performance, it is necessary to fabricate a large area of uniform meander nanowires, which is the core of the SNSPD. In this paper, we demonstrate a process of patterning ultra-thin NbN films into meander-type nanowires by using the nano- imprint technology. In this process, a combination of hot embossing nano-imprint lithography (HE-NIL) and ultraviolet nano-imprint lithography (UV-NIL) is used to transfer the meander nanowire structure from the NIL Si hard mold to the NbN film. We have successfully obtained a NbN nanowire device with uniform line width. The critical temperature (Tc) of the superconducting NbN meander nanowires is about 5 K and the critical current (lc) is about 3.5 μA at 2.5 K. 展开更多
关键词 nano-imprint lithography meander nanowires ultra-thin nbn films
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