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烧结NdFeB磁体表面化学镀Ni-Cu-P合金及防腐性能 被引量:9
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作者 应华根 罗伟 严密 《北京科技大学学报》 EI CAS CSCD 北大核心 2007年第2期162-167,共6页
在烧结NdFeB磁体表面化学镀Ni-Cu-P以提高其耐腐蚀性能.研究了络合剂的质量浓度、镀液的pH值、施镀温度及金属离子配比[Cu2+]/[Ni2+]对沉积速度和镀层成分的影响.用扫描电镜(SEM)和能谱仪(EDAX)观察镀层形貌并分析镀层成分.测定Ni-Cu-P... 在烧结NdFeB磁体表面化学镀Ni-Cu-P以提高其耐腐蚀性能.研究了络合剂的质量浓度、镀液的pH值、施镀温度及金属离子配比[Cu2+]/[Ni2+]对沉积速度和镀层成分的影响.用扫描电镜(SEM)和能谱仪(EDAX)观察镀层形貌并分析镀层成分.测定Ni-Cu-P合金镀层在质量分数3·5%NaCl溶液中的极化曲线,并结合中性盐雾实验表征镀层的耐腐蚀性能.研究表明:烧结NdFeB永磁体经碱性超声波除油、酸洗活化后进行化学镀Ni-Cu-P,可得到结合力良好的合金镀层;随着镀液中金属离子配比[Cu2+]/[Ni2+]的增大,所得镀层从非晶向晶态转变,镀层中的磷含量先升高后降低,镀层表面变得平整、致密;化学镀Ni-Cu-P三元合金的耐腐蚀性能优于相同条件下所得到的Ni-P镀层,且从金属离子配比([Cu2+]/[Ni2+])为0·02的镀液中得到的镀层的耐腐蚀性能最强. 展开更多
关键词 烧结钕铁硼 化学镀 ni—cu-p合金 耐腐蚀性
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Hot deformation behavior and processing map of Cu-Ni-Si-P alloy 被引量:6
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作者 张毅 刘平 +3 位作者 田保红 刘勇 李瑞卿 许倩倩 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第8期2341-2347,共7页
The high-temperature deformation behavior of Cu-Ni-Si-P alloy was investigated by using the hot compression test in the temperature range of 600-800 ℃ and strain rate of 0.01-5 s-1. The hot deformation activation ene... The high-temperature deformation behavior of Cu-Ni-Si-P alloy was investigated by using the hot compression test in the temperature range of 600-800 ℃ and strain rate of 0.01-5 s-1. The hot deformation activation energy, Q, was calculated and the hot compression constitutive equation was established. The processing maps of the alloy were constructed based on the experiment data and the forging process parameters were then optimized based on the generated maps for forging process determination. The flow behavior and the microstructural mechanism of the alloy were studied. The flow stress of the Cu-Ni-Si-P alloy increases with increasing strain rate and decreasing deformation temperature, and the dynamic recrystallization temperature of alloy is around 700 ℃. The hot deformation activation energy for dynamic recrystallization is determined as 485.6 kJ/mol. The processing maps for the alloy obtained at strains of 0.3 and 0.5 were used to predict the instability regimes occurring at the strain rate more than 1 s-1 and low temperature (〈650 ℃). The optimum range for the alloy hot deformation processing in the safe domain obtained from the processing map is 750-800 ℃ at the strain rate of 0.01-0.1 s i The characteristic microstructures predicted from the processing map agree well with the results of microstructural observations. 展开更多
关键词 Cu-ni-Si-P alloy hot compression deformation dynamic recrystallization constitutive equation processing maps
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