NiO films were fabricated by reactive direct current magnetron sputtering on glass and alumina substrates for the application in energetic nano-multilayers. The structural and thermal properties of the films were inve...NiO films were fabricated by reactive direct current magnetron sputtering on glass and alumina substrates for the application in energetic nano-multilayers. The structural and thermal properties of the films were investigated with the volume ratio of oxygen to argon ranging from 1：9 to 3：2, and the optimized ratio value is obtained as 1：3, which was confirmed by X-ray diffraction （XRD）, atomic force microscopy and ultrafast measure- ment system. The effect of the film thickness, varying from 150 to 900 nm, on the structural properties was characterized by XRD and scanning electron microscopy （SEM）. XRD analysis reveals that the （111） lattice plane is the preferred orientation. The intensities of preferential peaks and the grain sizes increase as the film thicknesses increase.展开更多
Nanomultilayered TiN/Ni thin films with different bilayer periods(57.8-99.7 nm) and Ni single-layer thickness(3.9-19.2 nm) were prepared by alternatively sputtering Ti and Ni targets in N2 gas atmosphere.The micros tr...Nanomultilayered TiN/Ni thin films with different bilayer periods(57.8-99.7 nm) and Ni single-layer thickness(3.9-19.2 nm) were prepared by alternatively sputtering Ti and Ni targets in N2 gas atmosphere.The micros tructure,mechanical and corrosion properties of the multilayer films were investigated by X-ray diffraction(XRD),field emission scanning electron microscopy(FESEM),X-ray photoelectron spectroscopy(XPS),nanoindenter and electrochemical technologies.The multilayer films are fine with a mean grain size of ~8-9 nm independent of the bilayer period.However,the smoothness and compactness seem to decrease with the bilayer period increasing.The hardness(H) and elastic modulus(E) of the multilayer films gradually decrease as the bilayer period increases,and the multilayer film with bilayer period of 57.8 nm exhibits higher H,ratios of(H/E^*and H^3/E^*2)(E^*is effective Young’s modulus)than the monolithic TiN film and the other multilayers.The multilayer films exhibit an obvious passivation phenomenon in 10% H2SO4 solution,and the passive current and corrosion current densities decrease,whereas the corrosion potential increases when the bilayer period or Ni single-layer thickness decreases.It is found that the passivating behavior and corrosion potential of the multilayers are more sensitive to Ni single-layer thickness than the bilayer period.More corrosion pits and lamellar flaking could be found on the films with larger bilayer period or Ni single-layer thickness.展开更多
基金financially supported by the Military Pre-Research fund(No.9140A12040412DZ02138)
文摘NiO films were fabricated by reactive direct current magnetron sputtering on glass and alumina substrates for the application in energetic nano-multilayers. The structural and thermal properties of the films were investigated with the volume ratio of oxygen to argon ranging from 1：9 to 3：2, and the optimized ratio value is obtained as 1：3, which was confirmed by X-ray diffraction （XRD）, atomic force microscopy and ultrafast measure- ment system. The effect of the film thickness, varying from 150 to 900 nm, on the structural properties was characterized by XRD and scanning electron microscopy （SEM）. XRD analysis reveals that the （111） lattice plane is the preferred orientation. The intensities of preferential peaks and the grain sizes increase as the film thicknesses increase.
基金financially supported by the National Natural Science Foundation of China (No.51171118)
文摘Nanomultilayered TiN/Ni thin films with different bilayer periods(57.8-99.7 nm) and Ni single-layer thickness(3.9-19.2 nm) were prepared by alternatively sputtering Ti and Ni targets in N2 gas atmosphere.The micros tructure,mechanical and corrosion properties of the multilayer films were investigated by X-ray diffraction(XRD),field emission scanning electron microscopy(FESEM),X-ray photoelectron spectroscopy(XPS),nanoindenter and electrochemical technologies.The multilayer films are fine with a mean grain size of ~8-9 nm independent of the bilayer period.However,the smoothness and compactness seem to decrease with the bilayer period increasing.The hardness(H) and elastic modulus(E) of the multilayer films gradually decrease as the bilayer period increases,and the multilayer film with bilayer period of 57.8 nm exhibits higher H,ratios of(H/E^*and H^3/E^*2)(E^*is effective Young’s modulus)than the monolithic TiN film and the other multilayers.The multilayer films exhibit an obvious passivation phenomenon in 10% H2SO4 solution,and the passive current and corrosion current densities decrease,whereas the corrosion potential increases when the bilayer period or Ni single-layer thickness decreases.It is found that the passivating behavior and corrosion potential of the multilayers are more sensitive to Ni single-layer thickness than the bilayer period.More corrosion pits and lamellar flaking could be found on the films with larger bilayer period or Ni single-layer thickness.
