The NiO-Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique. The effect of substrate temperature on the structural, optical, morpholog...The NiO-Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique. The effect of substrate temperature on the structural, optical, morphological and electrical properties of the films was mainly investigated. X-ray diffraction studies revealed that when the substrate temperature increased to above 200 ℃, the preferred orientation tended to move to another preferred site from （220） to （111） and had a band gap values increased with increasing substrate observed that the grain size and root mean square stable cubic structure. The optical transmittance and temperature. From the morphological studies, it was roughness were increased with increasing substrate temperature. The electrical resistivity of the film decreased to 0.017 Ωcm at high substrate temperature of 400 ℃.展开更多
基金supported by the National Natural Science Foundation of China(50772107)National Key Basic Research Program of China(973)(2007CB210206)National High-Tech Research and Development Program of China(863)(2009AA05Z435)~~
基金the University Grants Commission(UGC),New Delhi(File No. F.40-419/2011(SR)) for providing the financial assistance to carry out the above work
文摘The NiO-Cu composite films were deposited on a glass substrate at various substrate temperatures by DC reactive magnetron sputtering technique. The effect of substrate temperature on the structural, optical, morphological and electrical properties of the films was mainly investigated. X-ray diffraction studies revealed that when the substrate temperature increased to above 200 ℃, the preferred orientation tended to move to another preferred site from （220） to （111） and had a band gap values increased with increasing substrate observed that the grain size and root mean square stable cubic structure. The optical transmittance and temperature. From the morphological studies, it was roughness were increased with increasing substrate temperature. The electrical resistivity of the film decreased to 0.017 Ωcm at high substrate temperature of 400 ℃.
