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分级三维结构高活性自支撑NiO_(x)H_(y)电化学析氧催化电极制备研究 被引量:1
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作者 李静 蔡卫卫 《聊城大学学报(自然科学版)》 2023年第2期11-16,共6页
氢能技术是当前最具前景的洁净能源技术之一,而电解水制氢作为其中的关键一环,其阴阳极的两个半反应对贵金属的过分依赖极大地限制了电解水技术的商业化应用。为寻求低成本、耐用和高效的替代材料,以泡沫镍为镍源,使用苯甲醇作为有机溶... 氢能技术是当前最具前景的洁净能源技术之一,而电解水制氢作为其中的关键一环,其阴阳极的两个半反应对贵金属的过分依赖极大地限制了电解水技术的商业化应用。为寻求低成本、耐用和高效的替代材料,以泡沫镍为镍源,使用苯甲醇作为有机溶剂,在水热条件下实现泡沫镍表面的有机无机界面反应,生长得到了分级三维结构NiO_(x)H_(y)。这种分级三维结构可以增加自支撑催化电极的电化学析氧反应(OER)活性。同时,由于NiO_(x)H_(y)是原位生长在泡沫镍基底上,催化剂表现出卓越的稳定性。通过一系列的电化学测试可知,得到的NiO_(x)H_(y)是一种高活性、高稳定性的碱性OER催化剂,具备在商业电解池中使用的潜力。 展开更多
关键词 电化学析氧反应 自支撑催化电极 nio_(x)h_(y) 分级三维结构
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Ni_(x)Cu_(y)-B_(24)N_(28)催化CO_(2)氧化C_(3)H_(8)速控步骤的反应机理研究 被引量:1
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作者 律佳媛 任瑞鹏 吕永康 《分子催化》 CAS CSCD 北大核心 2022年第2期137-144,共8页
采用密度泛函理论(DFT)研究了C_(3)H_(8)和CO_(2)在Ni_(x)Cu_(y)-B_(24)N_(28)(x+y=4,x=1、2、3、4)表面吸附及速控步骤反应机理.计算了C_(3)H_(8)、CO_(2)和相应中间体在Ni_(x)Cu_(y)-B_(24)N_(28)表面的吸附能以及6条可能路径下的反... 采用密度泛函理论(DFT)研究了C_(3)H_(8)和CO_(2)在Ni_(x)Cu_(y)-B_(24)N_(28)(x+y=4,x=1、2、3、4)表面吸附及速控步骤反应机理.计算了C_(3)H_(8)、CO_(2)和相应中间体在Ni_(x)Cu_(y)-B_(24)N_(28)表面的吸附能以及6条可能路径下的反应热和活化能.计算结果表明,C_(3)H_(8)和CO_(2)在Ni_(x)Cu_(y)-B_(24)N_(28)表面是物理吸附,C_(3)H_(8)+CO_(2)→CH_(3)CHCH_(3)+OCOH是最有利的路径,其在不同催化剂表面的活化能顺序是NiCu_(3)-B_(24)N_(28)(1.42 eV)、Ni_(2)Cu_(2)-B_(24)N_(28)(1.57 eV)、Ni_(3)Cu-B_(24)N_(28)(1.62 eV)、Ni_(4)-B_(24)N_(28)(1.75 eV).由此可知,在Ni_(x)Cu_(y)-B_(24)N_(28)催化CO_(2)氧化C_(3)H_(8)的体系中,Cu含量直接影响其催化活性,即NiCu_(3)-B_(24)N_(28)用于催化CO_(2)氧化C_(3)H_(8)有一定优势. 展开更多
关键词 Ni_(x)Cu_(y)-B_(24)N_(28) 丙烷 二氧化碳 初步氧化 密度泛函理论
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Effect of pressure and space between electrodes on the deposition of SiN_(x)H_(y)films in a capacitively coupled plasma reactor
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作者 Meryem Grari CifAllah Zoheir +1 位作者 Yasser Yousfi Abdelhak Benbrik 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第5期507-512,共6页
The fluid model,also called the macroscopic model,is commonly used to simulate low temperature and low pressure radiofrequency plasma discharges.By varying the parameters of the model,numerical simulation allows us to... The fluid model,also called the macroscopic model,is commonly used to simulate low temperature and low pressure radiofrequency plasma discharges.By varying the parameters of the model,numerical simulation allows us to study several cases,providing us the physico-chemical information that is often difficult to obtain experimentally.In this work,using the fluid model,we employ numerical simulation to show the effect of pressure and space between the reactor electrodes on the fundamental properties of silicon plasma diluted with ammonia and hydrogen.The results show the evolution of the fundamental characteristics of the plasma discharge as a function of the variation of the pressure and the distance between the electrodes.By examining the pressure-distance product in a range between 0.3 Torr 2.7 cm and 0.7 Torr 4 cm,we have determined the optimal pressure-distance product that allows better deposition of hydrogenated silicon nitride(SiN_(x)H_(y))films which is 0.7 Torr 2.7 cm. 展开更多
关键词 fluid model numerical simulation SiN_(x)h_(y) capacitively coupled plasma reactor
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Rational distribution of Ru nanodots on 2D Ti_(3−x)C_(2)T_(y)/g-C_(3)N_(4)heterostructures for boosted photocatalytic H_(2)evolution 被引量:3
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作者 Wen-Jing Yi Xin Du +7 位作者 Meng Zhang Sha-Sha Yi Rui-Hao Xia Chuan-Qi Li Yan Liu Zhong-Yi Liu Wen-Lei Zhang Xin-Zheng Yue 《Nano Research》 SCIE EI CSCD 2023年第5期6652-6660,共9页
Incorporating metal nanodots(NDs)into heterostructures for high charge separation and transfer capacities is one of the most effective strategies for improving their photocatalytic activities.However,controlling the s... Incorporating metal nanodots(NDs)into heterostructures for high charge separation and transfer capacities is one of the most effective strategies for improving their photocatalytic activities.However,controlling the space distribution of metal NDs for optimizing charge transport pathways remains a significant challenge,particularly in two-dimensional(2D)face-to-face heterostructures.Herein,we develop a simple targeted self-reduction strategy for selectively loading Ru NDs onto the Ti_(3−x)C_(2)T_(y)(TC)surface of 2D TC/g-C_(3)N_(4)(CN)heterojunction based on the reductive Ti vacancy defects creatively increased during the preparation of TC/CN by reducing calcination.Notably,the optimized Ru/TC/CN photocatalyst exhibits an outstanding H_(2)evolution rate of 3.21 mmol·g^(−1)·h^(−1)and a high apparent quantum efficiency of 30.9%at 380 nm,which is contributed by the unidirectional transfer of the photogenerated electrons from CN to Ru active sites(CN→TC→Ru)and the suppressed backflow of electrons from Ru sites to CN,as revealed by comprehensive characterizations and density functional theory(DFT)calculations.This work provides a novel strategy for synthesizing the highly efficient photocatalysts with a controllable charge transfer paths,which will boost the development of photocatalysis. 展开更多
关键词 Ru/Ti_(3−x)C_(2)T_(y)/g-C_(3)N_(4) targeted self-reduction strategy selective growth unidirectional electron migration photocatalytic h_(2)evolution
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氢氟酸清洗晶圆表面氮氧化硅材料导致缺陷的研究
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作者 唐斌 张志敏 《广州化工》 CAS 2023年第9期66-68,共3页
在晶圆制造过程发现了一种制程缺陷:晶圆表面薄膜是氮氧化硅用氢氟酸清洗后,晶圆表面经常发现圆球形状的缺陷。随着制程越来越先进,这样的异常缺陷越来越重要,会越来越引起广泛的关注及研究。本研究通过产生缺陷的原理及考察了相关清洗... 在晶圆制造过程发现了一种制程缺陷:晶圆表面薄膜是氮氧化硅用氢氟酸清洗后,晶圆表面经常发现圆球形状的缺陷。随着制程越来越先进,这样的异常缺陷越来越重要,会越来越引起广泛的关注及研究。本研究通过产生缺陷的原理及考察了相关清洗酸的性质和清洗机台结构,根据实验得出最佳的制程条件:使晶圆表面的氮氧化硅与晶圆表面残留的氢氟酸溶液反应的产物原硅酸立即溶解,阻止了原硅酸分解成偏硅酸从而解决了制程缺陷。 展开更多
关键词 球状缺陷 清洗 氮氧化硅 原硅酸 偏硅酸 氢氟酸
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