为提升瓦斯抽采利用率、促进煤矿安全生产,采用介质阻挡放电(DBD)试验系统对CH4-O2-N2-H2O反应体系进行低温等离子体转化研究,分析水蒸气与CH4物质的量比、O2/N2物质的量比、放电电压、放电频率,以及气体总流量对CH4转化率及主要产物产...为提升瓦斯抽采利用率、促进煤矿安全生产,采用介质阻挡放电(DBD)试验系统对CH4-O2-N2-H2O反应体系进行低温等离子体转化研究,分析水蒸气与CH4物质的量比、O2/N2物质的量比、放电电压、放电频率,以及气体总流量对CH4转化率及主要产物产率的影响。结果表明:CH4-O2-N2-H2O反应体系DBD的主要产物为H2、CO、CO2、C2H2、C2H4、C2H6和CH3OH;反应参数对CH4转化率和H2、CO、CO2、C2H6、CH3OH产率影响较为显著,而对C2H2、C2H4产率影响不显著;CH4转化率及主要产物产率均在放电频率为9.8 k Hz时取得最大值。展开更多
This paper investigates the effect of O2 plasma treatment on the electric property of Cu/SiCOH low dielectric constant （low-k） film integrated structure. The results show that the leakage current of Cu/SiCOH low-k i...This paper investigates the effect of O2 plasma treatment on the electric property of Cu/SiCOH low dielectric constant （low-k） film integrated structure. The results show that the leakage current of Cu/SiCOH low-k integrated structure can be reduced obviously at the expense of a slight increase in dielectric constant k of SiCOH films. Bythe Fourier transform infrared （FTIR） analysis on the bonding configurations of SiCOH films treated by O2 plasmar it is found that the decrease of leakage current is related to the increase of Si-O cages originating from the linkage of Si dangling bonds through O, which makes the open pores sealed and reduces the diffusion of Cu to pores.展开更多
The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and proper...The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and properties of treated fibers were investigated by means of SEM,XPS,single fiber tensile tester and so on.The results proved that the effects of plasma treatments depended on structural characteristics of fibers to a great extent,besides conditions of plasma treatment.By atmospheric pressure plasma treatment,wool fiber had significant changes in morphology structure,surface chemical component,mechanic properties and dyeability,while ramie fiber just showed a little change.In additional,Ar/O2 plasma showed more effective action than argon.And at the beginning of treatment,plasma brought about remarkable effects,which did not increase with prolonging of treat time.展开更多
Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational ...Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational parameters were determined using argon as the actinometer. At a pressure of 30 Pa, the oxygen dissociation fraction decreased from 13.4% to 9.5% as the input power increased from 10 W to 70 W. At an input power of 50 W, the oxygen dissociation fraction decreased from 12.3% to 7.7% when the gas pressure increased from 10 Pa to 40 Pa. The influences of operational parameters on the generation of atomic oxygen were also discussed.展开更多
In a novel plasma-shade reactor for oxidative reforming of biogas(CH4/CO2=3/2),the effects of specific-energy-input (SEI) on CH4 and CO2 conversions and energy cost of syngas were investigated at O2/CH4ratios ranged f...In a novel plasma-shade reactor for oxidative reforming of biogas(CH4/CO2=3/2),the effects of specific-energy-input (SEI) on CH4 and CO2 conversions and energy cost of syngas were investigated at O2/CH4ratios ranged from 0.42 to 0.67.At each of O2/CH4 ratios,V-shape profiles of energy cost of syngas increasing with SEI were observed,reaching the lowest value at the optimal SEI(Opt-SEI).With the increase of O2/CH4 ratio,the Opt-SEI decreased significantly.Moreover,at the Opt-SEI,O2 and CH4 conversions and dry-basis concentration of syngas increased and energy cost of syngas decreased greatly with the increase of O2/CH4 ratio.展开更多
Deposition of TiO2 film from atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morpholog...Deposition of TiO2 film from atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morphologies and controlled crystallization were deposited from mixtures of TiCl4 and O2 on quartz substrate by one step process. Scanning electron microscope (SEM) and transmission electron microscope (TEM) were used to analyze the morphology and crystallization of the deposited TiO2 films. It was found that the discharge power played a key role in the morphology and crystallization of the deposited TiO2 film whether the flow of TiCl4 was large or small. When the flow of TiCl4 was large, the deposited TiO2 film was amorphous particles at low discharge power and was multi-crystalline at high discharge power. When the flow of TiCl4 [JP2]was small, the deposited TiO2 film became more compact and the crystallization was enhanced as the discharge power increased . The dependence of the discharge current and the applied voltage with the discharge power indicated that it was a glow discharge. The gas temperature which increases with the discharge power is one of the main causes that affect the morphology and crystallization of the deposited film.展开更多
文摘为提升瓦斯抽采利用率、促进煤矿安全生产,采用介质阻挡放电(DBD)试验系统对CH4-O2-N2-H2O反应体系进行低温等离子体转化研究,分析水蒸气与CH4物质的量比、O2/N2物质的量比、放电电压、放电频率,以及气体总流量对CH4转化率及主要产物产率的影响。结果表明:CH4-O2-N2-H2O反应体系DBD的主要产物为H2、CO、CO2、C2H2、C2H4、C2H6和CH3OH;反应参数对CH4转化率和H2、CO、CO2、C2H6、CH3OH产率影响较为显著,而对C2H2、C2H4产率影响不显著;CH4转化率及主要产物产率均在放电频率为9.8 k Hz时取得最大值。
基金Project supported by the National Natural Science Foundation of China （Grant No 10575074）, the Specialized Research Fund for the Doctoral Program of Higher Education of China and the Foundation of Key Laboratory of Thin Films, Jiangsu Province, China.
文摘This paper investigates the effect of O2 plasma treatment on the electric property of Cu/SiCOH low dielectric constant （low-k） film integrated structure. The results show that the leakage current of Cu/SiCOH low-k integrated structure can be reduced obviously at the expense of a slight increase in dielectric constant k of SiCOH films. Bythe Fourier transform infrared （FTIR） analysis on the bonding configurations of SiCOH films treated by O2 plasmar it is found that the decrease of leakage current is related to the increase of Si-O cages originating from the linkage of Si dangling bonds through O, which makes the open pores sealed and reduces the diffusion of Cu to pores.
文摘The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and properties of treated fibers were investigated by means of SEM,XPS,single fiber tensile tester and so on.The results proved that the effects of plasma treatments depended on structural characteristics of fibers to a great extent,besides conditions of plasma treatment.By atmospheric pressure plasma treatment,wool fiber had significant changes in morphology structure,surface chemical component,mechanic properties and dyeability,while ramie fiber just showed a little change.In additional,Ar/O2 plasma showed more effective action than argon.And at the beginning of treatment,plasma brought about remarkable effects,which did not increase with prolonging of treat time.
基金supported by the Beijing Municipal Education Commission of China(No.KM201010015005)Beijing Key Laboratory of Printing & Packaging Materials and Technology of Beijing Institute of Graphic Communication of China(No.KF201005)
文摘Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational parameters were determined using argon as the actinometer. At a pressure of 30 Pa, the oxygen dissociation fraction decreased from 13.4% to 9.5% as the input power increased from 10 W to 70 W. At an input power of 50 W, the oxygen dissociation fraction decreased from 12.3% to 7.7% when the gas pressure increased from 10 Pa to 40 Pa. The influences of operational parameters on the generation of atomic oxygen were also discussed.
基金supported by International Science&Technology Cooperation Program of China (2013DFG60060)
文摘In a novel plasma-shade reactor for oxidative reforming of biogas(CH4/CO2=3/2),the effects of specific-energy-input (SEI) on CH4 and CO2 conversions and energy cost of syngas were investigated at O2/CH4ratios ranged from 0.42 to 0.67.At each of O2/CH4 ratios,V-shape profiles of energy cost of syngas increasing with SEI were observed,reaching the lowest value at the optimal SEI(Opt-SEI).With the increase of O2/CH4 ratio,the Opt-SEI decreased significantly.Moreover,at the Opt-SEI,O2 and CH4 conversions and dry-basis concentration of syngas increased and energy cost of syngas decreased greatly with the increase of O2/CH4 ratio.
基金National Natural Science Foundations of China (No.10835004,No.10775031)Science and Technology Commission of Shanghai Municipality,China (No.10XD1400100)
文摘Deposition of TiO2 film from atmospheric pressure non-equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morphologies and controlled crystallization were deposited from mixtures of TiCl4 and O2 on quartz substrate by one step process. Scanning electron microscope (SEM) and transmission electron microscope (TEM) were used to analyze the morphology and crystallization of the deposited TiO2 films. It was found that the discharge power played a key role in the morphology and crystallization of the deposited TiO2 film whether the flow of TiCl4 was large or small. When the flow of TiCl4 was large, the deposited TiO2 film was amorphous particles at low discharge power and was multi-crystalline at high discharge power. When the flow of TiCl4 [JP2]was small, the deposited TiO2 film became more compact and the crystallization was enhanced as the discharge power increased . The dependence of the discharge current and the applied voltage with the discharge power indicated that it was a glow discharge. The gas temperature which increases with the discharge power is one of the main causes that affect the morphology and crystallization of the deposited film.
基金National Ministry of Science and Technology“13thFive-Year”Key Research and Development Program Sub Project for High Performance Computing(2016YFB0200205)2018 Shanghai Public R&D Service Center Construction Project(18DZ2295400)
