Eu 3+ ions were incorporated in sol and gel by a sol gel processing using 3 glycidoxypropyltrimethoxysilane (CH 2OCHCH 2O(CH 2) 3Si(OCH 3) 3, GPTMS) and ethyl silicate (TEOS) as precursors. The basic chem...Eu 3+ ions were incorporated in sol and gel by a sol gel processing using 3 glycidoxypropyltrimethoxysilane (CH 2OCHCH 2O(CH 2) 3Si(OCH 3) 3, GPTMS) and ethyl silicate (TEOS) as precursors. The basic chemical physical properties such as DTA curve, FT IR spectra and specific surface area were recorded. The characteristics of their optical spectra were measured and investigated. The results indicate that the emission intensity of Eu 3+ ion in ormocer is much higher and the global line width is wider than those in SiO 2 gel. The relationship between the composition and structure of gels and the fluorescence intensity and width were discussed. The obtained ormocer shows good mechanical strength, which can be cut and polished in machine without broken.展开更多
Ag nanoparticles coated trisodium citrate were incorporated in ormocer by sol-gel method. The doping concentration of Ag in ormocer is about 1.0% in weight. The HRTEM demonstrated that the particles disperse in ormoce...Ag nanoparticles coated trisodium citrate were incorporated in ormocer by sol-gel method. The doping concentration of Ag in ormocer is about 1.0% in weight. The HRTEM demonstrated that the particles disperse in ormocer, and the size of Ag nanoparticles is 5-10 nm. The absorption band of Ag nanoparticle at 410 nm was observed.展开更多
Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures,which are of interest in nanophotonics,are presented.As originals fo...Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures,which are of interest in nanophotonics,are presented.As originals for subsequent replication steps,two families of masters were developed:(i)3.2μm deep,180 nm wide trenches were fabricated by silicon cryo-etching and(ii)9.8μm high,350 nm wide ridges were fabricated using 2-photon polymerization direct laser writing.Both emerging technologies enable the vertical smooth sidewalls needed for a successful imprint into thin layers of polymers with aspect ratios exceeding 15.Nanoridges with high aspect ratios of up to 28 and no residual layer were produced in Ormocers using the micromoulding into capillaries(MIMIC)process with subsequent ultraviolet-curing.This work presents and balances the different fabrication routes and the subsequent generation of working tools from masters with inverted tones and the combination of hard and soft materials.This provides these techniques with a proof of concept for their compatibility with high volume manufacturing of complex micro-and nanostructures.展开更多
文摘Eu 3+ ions were incorporated in sol and gel by a sol gel processing using 3 glycidoxypropyltrimethoxysilane (CH 2OCHCH 2O(CH 2) 3Si(OCH 3) 3, GPTMS) and ethyl silicate (TEOS) as precursors. The basic chemical physical properties such as DTA curve, FT IR spectra and specific surface area were recorded. The characteristics of their optical spectra were measured and investigated. The results indicate that the emission intensity of Eu 3+ ion in ormocer is much higher and the global line width is wider than those in SiO 2 gel. The relationship between the composition and structure of gels and the fluorescence intensity and width were discussed. The obtained ormocer shows good mechanical strength, which can be cut and polished in machine without broken.
文摘Ag nanoparticles coated trisodium citrate were incorporated in ormocer by sol-gel method. The doping concentration of Ag in ormocer is about 1.0% in weight. The HRTEM demonstrated that the particles disperse in ormocer, and the size of Ag nanoparticles is 5-10 nm. The absorption band of Ag nanoparticle at 410 nm was observed.
基金This work is partially funded by the Swiss National Science Foundation(SNF)Ambizione project(no.PZ00P2_142511)granted to VJC.
文摘Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures,which are of interest in nanophotonics,are presented.As originals for subsequent replication steps,two families of masters were developed:(i)3.2μm deep,180 nm wide trenches were fabricated by silicon cryo-etching and(ii)9.8μm high,350 nm wide ridges were fabricated using 2-photon polymerization direct laser writing.Both emerging technologies enable the vertical smooth sidewalls needed for a successful imprint into thin layers of polymers with aspect ratios exceeding 15.Nanoridges with high aspect ratios of up to 28 and no residual layer were produced in Ormocers using the micromoulding into capillaries(MIMIC)process with subsequent ultraviolet-curing.This work presents and balances the different fabrication routes and the subsequent generation of working tools from masters with inverted tones and the combination of hard and soft materials.This provides these techniques with a proof of concept for their compatibility with high volume manufacturing of complex micro-and nanostructures.
