Optimization of fin geometry in heat convection with entransy theory

The entransy theory developed in recent years is used to optimize the aspect ratio of a plate fin in heat convection.Based on a two-dimensional model,the theoretical analysis shows that the minimum thermal resistance defined with the concept of entransy dissipation corresponds to the maximum heat transfer rate when the temperature of the heating surface is fixed.On the other hand,when the heat flux of the heating surface is fixed,the minimum thermal resistance corresponds to the minimum average temperature of the heating surface.The entropy optimization is also given for the heat transfer processes.It is observed that the minimum entropy generation,the minimum entropy generation number,and the minimum revised entropy generation number do not always correspond to the best heat transfer performance.In addition,the influence factors on the optimized aspect ratio of the plate fin are also discussed.The optimized ratio decreases with the enhancement of heat convection,while it increases with fin thermal conductivity increasing.

THE OPTIMIZATION OF THE HULL FORM WITH THE MINIMUM WAVE MAKING RESISTANCE BASED ON RANKINE SOURCE METHOD

The hull form optimization concerns one of the most important applications of wave making resistance theories. In order to obtain a hull form with the minimum wave making resistance, an optimization design method based on the CFD is proposed, which combines the Rankine source method with the nonlinear programming （NLP）. The bow-body shape is optimized with the minimum wave making resistance as the objective function. A hull form modification function is introduced to represent an improved hull surface, which can be used to generate a new smooth hull surface by multiplying it by the offset data of the original hull surface. The parameters of the hull form modification function are taken as the design variables. Other constraint conditions can also be considered, for example, in optimizing the lines of the bow, appropriate displacements can be taken as the basic constraints. S60 hull form is selected as the original hull. Three improved hulls are obtained by optimal design. Rankine source method proves to be an effective method in ship form optimization based on analysis of the resistance performance and lines of the improved hull.

Ship hull optimization based on wave resistance using wavelet method

The ship hull surface optimization based on the wave resistance is an important issue in the ship engineering industry. The wavelet method may provide a convenient tool for the surface hull optimization. As a preliminary study, we use the wavelet method to optimize the hull surface based on the Michel wave resistance for a Wigley model in this paper. Firstly, we express the model＇s surface by the wavelet decomposition expressions and obtain a reconstructed surface and then validate its accuracy. Secondly, we rewrite the Michel wave resistance formula in the wavelet bases, resulting in a simple formula containing only the ship hull surface＇s wavelet coefficients. Thirdly, we take these wavelet coefficients as optimization variables, and analyze the main wave resistance distribution in terms of scales and locations, to reduce the number of optimization variables. Finally, we obtain the optimal hull surface of the Wigley model through genetic algorithms, reducing the wave resistance almost by a half. It is shown that the wavelet method may provide a new approach for the hull optimization.

Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction

As technology node shrinks, aggressive design rules for contact and other back end of line（BEOL）layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the major challenges for 28 nm and below technology nodes, which can lead to post-etch hotspots that are difficult to predict and eventually degrade the process window significantly. To tackle this problem, we used an advanced programmable illuminator（FlexRay） and Tachyon SMO（Source Mask Optimization） platform to make resistaware source optimization possible, and it is proved to greatly improve the imaging contrast, enhance focus and exposure latitude, and minimize resist top loss thus improving the yield.