采用原位磷注入合成法在高压单晶炉内合成富磷的磷化铟 (In P)熔体 ,并利用液封直拉法 (LEC)生长出了 1 0 0 mm In P掺硫单晶材料。对富磷单晶分别用快速扫描光荧光谱技术、腐蚀金相法和扫描电镜进行了研究。结果表明在富磷量足够大的...采用原位磷注入合成法在高压单晶炉内合成富磷的磷化铟 (In P)熔体 ,并利用液封直拉法 (LEC)生长出了 1 0 0 mm In P掺硫单晶材料。对富磷单晶分别用快速扫描光荧光谱技术、腐蚀金相法和扫描电镜进行了研究。结果表明在富磷量足够大的情况下 ,晶片上会出现孔洞 ,并对孔洞周围位错的形成原因及分布进行了分析。 1 0 0 mm In P单晶的平均位错密度也没有明显的增加 ,为今后生长更大尺寸的完整 In展开更多
The Ni/p-InP Schottky diodes（SDs） have been prepared by DC magnetron sputtering deposition. After the diode fabrication, they have been thermally annealed at 700 ℃ for 1 min in N2 atmosphere. Then, the current–vol...The Ni/p-InP Schottky diodes（SDs） have been prepared by DC magnetron sputtering deposition. After the diode fabrication, they have been thermally annealed at 700 ℃ for 1 min in N2 atmosphere. Then, the current–voltage characteristics of the annealed and non-annealed（as-deposited） SDs have been measured in the measurement temperature range of 60–400 K with steps of 20 K under dark conditions. After 700 ℃ annealing,an improvement in the ideality factor value has been observed from 60 to 200 K and the barrier height（BH）value approximately has remained unchanged in the measurement temperature range of 200–400 K. The BH of the annealed diode has decreased obeying the double-Gaussian distribution（GD） of the BHs with decreasing measurement temperature from 200 to 60 K. The BH for the as-deposited diode has decreased with decreasing temperature obeying the single-GD over the whole measurement temperature range. An effective Richardson constant value of54：21 A/cm^2K^2 for the as-deposited SD has been obtained from the modified Richardson plot by the single-GD plot, which is in very close agreement with the value of 60 A/K^2cm^2 for p-type InP. The series resistance value of the annealed SD is lower than that of the non-annealed SD at each temperature and approximately has remained unchanged from 140 to 240 K. Thus, it can be said that an improvement in the diode parameters has been observed due to the thermal annealing at 700 ℃ for 1 min in N_2 atmosphere.展开更多
Two types of ordered InP nanowire arrays have been prepared on the same anodic aluminum oxide template by a template-assisted metallo-organic chemical vapor deposition technique.When using template with an appropriate...Two types of ordered InP nanowire arrays have been prepared on the same anodic aluminum oxide template by a template-assisted metallo-organic chemical vapor deposition technique.When using template with an appropriate pore size,free-standing wires on the template surface and highly ordered wires in the nanochannels of the same template can be simultaneously achieved.The highly ordered InP nanowire arrays in the nanochannels serve as an n-type semiconductor to assemble the p-n heterojunction solar cell with p-type Cu2O.Such a Cu2O/lnP p-n heterojunction solar cell possesses a power conversion efficiency of 1.55%.展开更多
基金Supported by the National Natural Science Foundation of China(12027805,62171136,62174166,U2241219)the Science and Technology Commission of Shanghai Municipality(2019SHZDZX01,22JC1402902)the Strategic Priority Research Program of the Chinese Academy of Sciences(XDB43010200)。
文摘采用原位磷注入合成法在高压单晶炉内合成富磷的磷化铟 (In P)熔体 ,并利用液封直拉法 (LEC)生长出了 1 0 0 mm In P掺硫单晶材料。对富磷单晶分别用快速扫描光荧光谱技术、腐蚀金相法和扫描电镜进行了研究。结果表明在富磷量足够大的情况下 ,晶片上会出现孔洞 ,并对孔洞周围位错的形成原因及分布进行了分析。 1 0 0 mm In P单晶的平均位错密度也没有明显的增加 ,为今后生长更大尺寸的完整 In
文摘The Ni/p-InP Schottky diodes（SDs） have been prepared by DC magnetron sputtering deposition. After the diode fabrication, they have been thermally annealed at 700 ℃ for 1 min in N2 atmosphere. Then, the current–voltage characteristics of the annealed and non-annealed（as-deposited） SDs have been measured in the measurement temperature range of 60–400 K with steps of 20 K under dark conditions. After 700 ℃ annealing,an improvement in the ideality factor value has been observed from 60 to 200 K and the barrier height（BH）value approximately has remained unchanged in the measurement temperature range of 200–400 K. The BH of the annealed diode has decreased obeying the double-Gaussian distribution（GD） of the BHs with decreasing measurement temperature from 200 to 60 K. The BH for the as-deposited diode has decreased with decreasing temperature obeying the single-GD over the whole measurement temperature range. An effective Richardson constant value of54：21 A/cm^2K^2 for the as-deposited SD has been obtained from the modified Richardson plot by the single-GD plot, which is in very close agreement with the value of 60 A/K^2cm^2 for p-type InP. The series resistance value of the annealed SD is lower than that of the non-annealed SD at each temperature and approximately has remained unchanged from 140 to 240 K. Thus, it can be said that an improvement in the diode parameters has been observed due to the thermal annealing at 700 ℃ for 1 min in N_2 atmosphere.
基金supported by the National Natural Science Foundation of China(Nos.11374090,51372075 and 11204070)
文摘Two types of ordered InP nanowire arrays have been prepared on the same anodic aluminum oxide template by a template-assisted metallo-organic chemical vapor deposition technique.When using template with an appropriate pore size,free-standing wires on the template surface and highly ordered wires in the nanochannels of the same template can be simultaneously achieved.The highly ordered InP nanowire arrays in the nanochannels serve as an n-type semiconductor to assemble the p-n heterojunction solar cell with p-type Cu2O.Such a Cu2O/lnP p-n heterojunction solar cell possesses a power conversion efficiency of 1.55%.
