Liu Linsheng Wu Junhong (School of Electronic Engineering, University of Electronic Science and Technology of China,Chengdu 611731, China)(Chengdu R&D Center, Ericsson (China)
90-nm T-shaped gate InP-based In_（0.52）Al_（0.48）As/In_（0.6）Ga_（0.4）As pseudomorphic high electron mobility transistors were designed and fabricated with a gate-width of 2×30 μm,a source-drain space of 2...90-nm T-shaped gate InP-based In_（0.52）Al_（0.48）As/In_（0.6）Ga_（0.4）As pseudomorphic high electron mobility transistors were designed and fabricated with a gate-width of 2×30 μm,a source-drain space of 2.5 μm,and a source-gate space of 0.75 μm.DC,RF and small-signal model characterizations were demonstrated.The maximum saturation current density was measured to be 755 mA/mm biased at V_（gs）=0.6 V and V_（ds）=1.5 V.The maximum extrinsic transconductance was measured to be 1006 mS/mm biased at V_（ds）=—0.1V and V_（ds）=1.5 V.The extrapolated current gain cutoff frequency and maximum oscillation frequency based on S-parameters measured from 0.5 to 110 GHz were 180 and 264 GHz,respectively.The inflection point（the stability factor k=1）where the slope from-10 dB/decade（MSG） to-20 dB/decade（MAG） was measured to be 83 GHz.The smallsignal model of this device was also established,and the S-parameters of the model are consistent with those measured from 0.5-110 GHz.展开更多
The effect of drain-source voltage on A1GaAs/InGaAs PHEMTs thermal resistance is studied by experimental measuring and simulation. The result shows that A1GaAs/InGaAs PHEMTs thermal resistance presents a downward tren...The effect of drain-source voltage on A1GaAs/InGaAs PHEMTs thermal resistance is studied by experimental measuring and simulation. The result shows that A1GaAs/InGaAs PHEMTs thermal resistance presents a downward trend under the same power dissipation when the drain-source voltage （VDs） is decreased. Moreover, the relatively low VDS and large drain-source current （IDs） result in a lower thermal resistance. The chip-level and package-level thermal resistance have been extracted by the structure function method. The simulation result indicated that the high electric field occurs at the gate contact where the temperature rise occurs. A relatively low VDS leads to a relatively low electric field, which leads to the decline of the thermal resistance.展开更多
A quantitative comparison of multiline TRL （thru-reflect-line） and LRM （line-reflect-match） on-wafer calibrations for scattering parameters （S-parameters） measurement of InP-based PHEMTs is presented. The com- p...A quantitative comparison of multiline TRL （thru-reflect-line） and LRM （line-reflect-match） on-wafer calibrations for scattering parameters （S-parameters） measurement of InP-based PHEMTs is presented. The com- parison is undertaken for the first time and covers a frequency range from 70 kHz to 110 GHz. It is demonstrated that the accuracy of multiline TRL and LRM calibration is in good agreement. Both methods outperform the conven- tional SOLT calibration in the full frequency band up to 110 GHz. Then the excellent RF performance is obtained by extrapolation on the basis of inflection point, including a maximum current gain cut-off frequency ft of 247 GHz and a maximum oscillation frequency fmax of 392 GHz. The small-signal model based on LRM calibration is es- tablished as well. The S-parameters of the model are consistent with the measured from 1 to 110 GHz.展开更多
83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors （PHEMTs） with excellent DC and RF performance as well as low noise characteristics are reported, including...83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors （PHEMTs） with excellent DC and RF performance as well as low noise characteristics are reported, including a maximum saturation current density/ass of 894 mA/mm, a maximum extrinsic transconductance gm, max of 1640 mS/mm, an extrapolated cutoff frequency ft of 247 GHz and a maximum oscillation frequency fmax of 392 GHz which were based on the measured S-parameters from 1 to 110 GHz. The minimum noise figure （NFmin） measured by the cold-source method is 1 dB at 30 GHz associated with a gain of 14.5 dB at Vds of 0.8 V and Ids of 17 mA. These results were obtained by the combination of increased InAs mole fraction in the channel, gate size scaling, parasitic reduction and the quantization channel. These excellent results make it one of the most suitable devices for millimeter wave （MMW） low noise applications.展开更多
文章基于赝高电子迁移率晶体管(Pseudomorphic High Electron Mobility Transistor,PHEMT)工艺,设计一款Ka波段单刀四掷反射式开关芯片。为降低芯片插入损耗和提高隔离度,电路选取并联型反射式拓扑结构。同时,为提高工作带宽和减小芯片...文章基于赝高电子迁移率晶体管(Pseudomorphic High Electron Mobility Transistor,PHEMT)工艺,设计一款Ka波段单刀四掷反射式开关芯片。为降低芯片插入损耗和提高隔离度,电路选取并联型反射式拓扑结构。同时,为提高工作带宽和减小芯片面积,采用高低阻抗变换线替代50Ω传输线方式匹配阻抗。芯片采用0 V和-5 V电压控制支路开关的导通或关断。芯片尺寸为1.85 mm×1.55 mm。实测结果表明,在28~42 GHz工作频带范围内,输入输出回波损耗小于-10 dB,插入损耗小于3.2 dB,隔离度大于38 dB,实现了开关芯片低插损、高隔离度的优异性能。展开更多
文摘Liu Linsheng Wu Junhong (School of Electronic Engineering, University of Electronic Science and Technology of China,Chengdu 611731, China)(Chengdu R&D Center, Ericsson (China)
基金Project supported by the National Natural Science Foundation of China(No.61275107)
文摘90-nm T-shaped gate InP-based In_（0.52）Al_（0.48）As/In_（0.6）Ga_（0.4）As pseudomorphic high electron mobility transistors were designed and fabricated with a gate-width of 2×30 μm,a source-drain space of 2.5 μm,and a source-gate space of 0.75 μm.DC,RF and small-signal model characterizations were demonstrated.The maximum saturation current density was measured to be 755 mA/mm biased at V_（gs）=0.6 V and V_（ds）=1.5 V.The maximum extrinsic transconductance was measured to be 1006 mS/mm biased at V_（ds）=—0.1V and V_（ds）=1.5 V.The extrapolated current gain cutoff frequency and maximum oscillation frequency based on S-parameters measured from 0.5 to 110 GHz were 180 and 264 GHz,respectively.The inflection point（the stability factor k=1）where the slope from-10 dB/decade（MSG） to-20 dB/decade（MAG） was measured to be 83 GHz.The smallsignal model of this device was also established,and the S-parameters of the model are consistent with those measured from 0.5-110 GHz.
基金Project supported by the National Natural Science Foundation of China(Nos.61376077,61201046,61204081)the Beijing Natural Science Foundation(Nos.4132022,4122005)+1 种基金the Guangdong Strategic Emerging Industry Project of China(No.2012A080304003)the Doctoral Fund of Innovation of Beijing University of Technology
文摘The effect of drain-source voltage on A1GaAs/InGaAs PHEMTs thermal resistance is studied by experimental measuring and simulation. The result shows that A1GaAs/InGaAs PHEMTs thermal resistance presents a downward trend under the same power dissipation when the drain-source voltage （VDs） is decreased. Moreover, the relatively low VDS and large drain-source current （IDs） result in a lower thermal resistance. The chip-level and package-level thermal resistance have been extracted by the structure function method. The simulation result indicated that the high electric field occurs at the gate contact where the temperature rise occurs. A relatively low VDS leads to a relatively low electric field, which leads to the decline of the thermal resistance.
基金Project supported by the National Natural Science Foundation of China(No.61275107)
文摘A quantitative comparison of multiline TRL （thru-reflect-line） and LRM （line-reflect-match） on-wafer calibrations for scattering parameters （S-parameters） measurement of InP-based PHEMTs is presented. The com- parison is undertaken for the first time and covers a frequency range from 70 kHz to 110 GHz. It is demonstrated that the accuracy of multiline TRL and LRM calibration is in good agreement. Both methods outperform the conven- tional SOLT calibration in the full frequency band up to 110 GHz. Then the excellent RF performance is obtained by extrapolation on the basis of inflection point, including a maximum current gain cut-off frequency ft of 247 GHz and a maximum oscillation frequency fmax of 392 GHz. The small-signal model based on LRM calibration is es- tablished as well. The S-parameters of the model are consistent with the measured from 1 to 110 GHz.
基金supported by the National Natural Science Foundation of China(No.61275107)
文摘83-nm T-shaped gate InP-based In0.52Al0.48As/In0.65Ga0.35As pseudomorphic high electron mobility transistors （PHEMTs） with excellent DC and RF performance as well as low noise characteristics are reported, including a maximum saturation current density/ass of 894 mA/mm, a maximum extrinsic transconductance gm, max of 1640 mS/mm, an extrapolated cutoff frequency ft of 247 GHz and a maximum oscillation frequency fmax of 392 GHz which were based on the measured S-parameters from 1 to 110 GHz. The minimum noise figure （NFmin） measured by the cold-source method is 1 dB at 30 GHz associated with a gain of 14.5 dB at Vds of 0.8 V and Ids of 17 mA. These results were obtained by the combination of increased InAs mole fraction in the channel, gate size scaling, parasitic reduction and the quantization channel. These excellent results make it one of the most suitable devices for millimeter wave （MMW） low noise applications.
