By means of EPMA,SIMS and XTEM tech- niques,the element distribution at the transition zone of Y-modified ion plated titanium and titanium nitride film on A3 steel substrate and the variation of the element content on...By means of EPMA,SIMS and XTEM tech- niques,the element distribution at the transition zone of Y-modified ion plated titanium and titanium nitride film on A3 steel substrate and the variation of the element content on the surface of the evaporation source before and after service were studied in detail.A mode was proposed in terms of preferential evaporation and micro-tunnel trans- portation of Y at the interface of film/substrate.展开更多
Evaluation of adhesion of PVD Ti and TiN films on steel A_3 was carried out with constant rate pulling test(CRPT)at 0.05 mm/min under simultaneous SEM observation. As a criterion,the critical elongations of the film/s...Evaluation of adhesion of PVD Ti and TiN films on steel A_3 was carried out with constant rate pulling test(CRPT)at 0.05 mm/min under simultaneous SEM observation. As a criterion,the critical elongations of the film/substrate system for the initial cracking and spelling of the film may be applied to evaluate the plasticity and adhesion of the film to substrate.The conventional scratch test was also made for evaluation of the adhesion for the same systems.Both methods give the coordinate assessment for all the systems. In addition,the influence of the films on the ultimate yield strength of the substrate was discussed and another criterion of conherent work was proposed for the evaluation.展开更多
The 2D kinetic Monte Carlo （KMC） simulation was used to study the effects of different substrate temperatures on the microstructure of Ni-Cr films in the process of deposition by the electron beam physical vapor dep...The 2D kinetic Monte Carlo （KMC） simulation was used to study the effects of different substrate temperatures on the microstructure of Ni-Cr films in the process of deposition by the electron beam physical vapor deposition （EB-PVD）. In the KMC model, substrate was assumed to be a ＂surface＂ of tight-packed rows, and the simulation includes two phenomena： adatom-surface collision and adatom diffusion. While the interaction between atoms was described by the embedded atom method, the jumping energy was calculated by the molecular static （MS） calculation. The initial location of the adatom was defined by the Momentum Scheme. The results reveal that there exists a critical substrate temperature which means that the lowest packing density and the highest surface roughness structure will be achieved when the temperature is lower than the smaller critical value, while the roughness of both surfaces and the void contents keep decreasing with the substrate temperature increasing until it reaches the higher critical value. The results also indicate that the critical substrate temperature rises as the deposition rate increases.展开更多
提出kinetic Monte Carlo模拟物理气相沉积(physical vapor deposition,简写为PVD)薄膜生长的新算法:用红黑树搜索实现跃迁路径选择及系统跃迁概率更新,通过比较红黑树搜索、线性查找、满二元树搜索的计算效率,综合分析了这3种方法的时...提出kinetic Monte Carlo模拟物理气相沉积(physical vapor deposition,简写为PVD)薄膜生长的新算法:用红黑树搜索实现跃迁路径选择及系统跃迁概率更新,通过比较红黑树搜索、线性查找、满二元树搜索的计算效率,综合分析了这3种方法的时间复杂度和空间复杂度。结果表明红黑树搜索优于其它两种搜索方法,模拟效率最高,更适合用于执行大系统的kinetic Monte Carlo模拟。展开更多
采用动态蒙特卡罗(kinetic Monte Carlo,简称KMC)方法研究物理气相沉积(physical vapor deposition,简称PVD)制备Ni薄膜过程中入射角度对薄膜微观结构的影响。该KMC模型中既包括入射原子与表面之间的碰撞,又包括被吸附原子的扩散。模拟...采用动态蒙特卡罗(kinetic Monte Carlo,简称KMC)方法研究物理气相沉积(physical vapor deposition,简称PVD)制备Ni薄膜过程中入射角度对薄膜微观结构的影响。该KMC模型中既包括入射原子与表面之间的碰撞,又包括被吸附原子的扩散。模拟中用动量机制确定被吸附原子在表面上的初始构型,用分子稳态(molecular statics,简称MS)计算方法计算扩散模型中跃迁原子的激活能。对于模拟结果,采用表面粗糙度和堆积密度作为沉积构型评价指标。研究结果表明:当沉积速率是5μm/min,基板温度是300K和500K时,表面粗糙度和堆积密度曲线在入射角度等于35?时出现拐点;入射角度小于35?时,入射角度增大对表面粗糙度增加和堆积密度减小的影响很少;但是入射角度大于35?时,随入射角度增大表面粗糙度迅速增加、堆积密度迅速减小。另外,当基板温度是300K时,入射角度对薄膜微观结构的影响程度大于基板温度为500K时的影响程度。说明高基板温度促使原子更加充分地扩散,从而能削弱自阴影效应的作用。但是,在保证足够高基板温度和合理沉积速率的情况下,入射角度过大同样不利于致密结构形成。展开更多
FeNi multilayer films were prepared by EB-PVD technique. A modified TG-DSC apparatus was used to measure their Curie temperatures, which were around 7600C, lower than that of pure Fe thin films. The easy magnetization...FeNi multilayer films were prepared by EB-PVD technique. A modified TG-DSC apparatus was used to measure their Curie temperatures, which were around 7600C, lower than that of pure Fe thin films. The easy magnetization axis was in-plane. High temperature annealing in vacuum decreased the coercivity sharply. The saturation magnetization also changed with heat treatment. After annealing at the temperature equal to the substrate temperature during deposition, the saturation magnetization decreased.展开更多
文摘By means of EPMA,SIMS and XTEM tech- niques,the element distribution at the transition zone of Y-modified ion plated titanium and titanium nitride film on A3 steel substrate and the variation of the element content on the surface of the evaporation source before and after service were studied in detail.A mode was proposed in terms of preferential evaporation and micro-tunnel trans- portation of Y at the interface of film/substrate.
文摘Evaluation of adhesion of PVD Ti and TiN films on steel A_3 was carried out with constant rate pulling test(CRPT)at 0.05 mm/min under simultaneous SEM observation. As a criterion,the critical elongations of the film/substrate system for the initial cracking and spelling of the film may be applied to evaluate the plasticity and adhesion of the film to substrate.The conventional scratch test was also made for evaluation of the adhesion for the same systems.Both methods give the coordinate assessment for all the systems. In addition,the influence of the films on the ultimate yield strength of the substrate was discussed and another criterion of conherent work was proposed for the evaluation.
基金Hi-tech Research and Development Program of China (2002AA763020)National Natural Science Foundation of China (50304007)+1 种基金Fund of Beforehand Research of National Defense (51418040304HT0114)New Century Excellent Talents in University 2004
文摘The 2D kinetic Monte Carlo （KMC） simulation was used to study the effects of different substrate temperatures on the microstructure of Ni-Cr films in the process of deposition by the electron beam physical vapor deposition （EB-PVD）. In the KMC model, substrate was assumed to be a ＂surface＂ of tight-packed rows, and the simulation includes two phenomena： adatom-surface collision and adatom diffusion. While the interaction between atoms was described by the embedded atom method, the jumping energy was calculated by the molecular static （MS） calculation. The initial location of the adatom was defined by the Momentum Scheme. The results reveal that there exists a critical substrate temperature which means that the lowest packing density and the highest surface roughness structure will be achieved when the temperature is lower than the smaller critical value, while the roughness of both surfaces and the void contents keep decreasing with the substrate temperature increasing until it reaches the higher critical value. The results also indicate that the critical substrate temperature rises as the deposition rate increases.
文摘提出kinetic Monte Carlo模拟物理气相沉积(physical vapor deposition,简写为PVD)薄膜生长的新算法:用红黑树搜索实现跃迁路径选择及系统跃迁概率更新,通过比较红黑树搜索、线性查找、满二元树搜索的计算效率,综合分析了这3种方法的时间复杂度和空间复杂度。结果表明红黑树搜索优于其它两种搜索方法,模拟效率最高,更适合用于执行大系统的kinetic Monte Carlo模拟。
基金This work is supported by the National Natural Science Foundation of China (GrantNo. 69971006).
文摘FeNi multilayer films were prepared by EB-PVD technique. A modified TG-DSC apparatus was used to measure their Curie temperatures, which were around 7600C, lower than that of pure Fe thin films. The easy magnetization axis was in-plane. High temperature annealing in vacuum decreased the coercivity sharply. The saturation magnetization also changed with heat treatment. After annealing at the temperature equal to the substrate temperature during deposition, the saturation magnetization decreased.
