In order to effectively and quickly clean the surface of semiconductor silicon wafers, the fluid flow is one of the significant issues. For a batch-type silicon wafer wet cleaning bath, a slim water injection nozzle c...In order to effectively and quickly clean the surface of semiconductor silicon wafers, the fluid flow is one of the significant issues. For a batch-type silicon wafer wet cleaning bath, a slim water injection nozzle consisting of a dual tube was studied, based on theoretical calculations and experiments. A thin inner tube was placed at the optimum position in the water injection nozzle. Such a simple design could make the water injection direction normal and the water velocity profile symmetrical along the nozzle. The water flow in the wet cleaning bath was observed using a blue-colored ink tracer. When the nozzle developed in this study was placed at the bottom of the bath, a fast and symmetrical upward water stream was formed between and around the wafers.展开更多
通许区块山西组发育深部煤层,与浅层煤层气相比含气量高、游离气丰富,割理裂隙发育,压裂施工过程中滤失大、易形成短缝、加砂困难。前期采用浅层煤层气常规压裂技术压裂施工压力高,加砂困难,压后效果不理想。针对深部煤层储层特征及改...通许区块山西组发育深部煤层,与浅层煤层气相比含气量高、游离气丰富,割理裂隙发育,压裂施工过程中滤失大、易形成短缝、加砂困难。前期采用浅层煤层气常规压裂技术压裂施工压力高,加砂困难,压后效果不理想。针对深部煤层储层特征及改造难点,开展了深部煤层气压前注入压降和原地应力测试,获取煤层参数,为压裂设计参数优化提供依据;同时,通过室内实验、数值模拟研究,探索试验了饱填砂压裂技术。现场A井山1煤层采用“大排量、大规模、饱填砂”体积压裂设计思路完成压裂施工,施工排量最高20 m 3/min,入地液量4315 m 3,加砂量347 m 3,是常规压裂加砂强度的7倍,压后最高日产气量7299 m 3,累计产气量71509 m 3,效果显著。该技术的试验成功,为深部煤层气压裂提供了技术指导。展开更多
文摘In order to effectively and quickly clean the surface of semiconductor silicon wafers, the fluid flow is one of the significant issues. For a batch-type silicon wafer wet cleaning bath, a slim water injection nozzle consisting of a dual tube was studied, based on theoretical calculations and experiments. A thin inner tube was placed at the optimum position in the water injection nozzle. Such a simple design could make the water injection direction normal and the water velocity profile symmetrical along the nozzle. The water flow in the wet cleaning bath was observed using a blue-colored ink tracer. When the nozzle developed in this study was placed at the bottom of the bath, a fast and symmetrical upward water stream was formed between and around the wafers.
文摘通许区块山西组发育深部煤层,与浅层煤层气相比含气量高、游离气丰富,割理裂隙发育,压裂施工过程中滤失大、易形成短缝、加砂困难。前期采用浅层煤层气常规压裂技术压裂施工压力高,加砂困难,压后效果不理想。针对深部煤层储层特征及改造难点,开展了深部煤层气压前注入压降和原地应力测试,获取煤层参数,为压裂设计参数优化提供依据;同时,通过室内实验、数值模拟研究,探索试验了饱填砂压裂技术。现场A井山1煤层采用“大排量、大规模、饱填砂”体积压裂设计思路完成压裂施工,施工排量最高20 m 3/min,入地液量4315 m 3,加砂量347 m 3,是常规压裂加砂强度的7倍,压后最高日产气量7299 m 3,累计产气量71509 m 3,效果显著。该技术的试验成功,为深部煤层气压裂提供了技术指导。
