A combination of photochlorination ofp-xylene and succedent Friedel-Crafts alkylation polymerization was firstly used in the preparation of the hypercrosslinked adsorptive resin. The data of GC-MS and GC showed that a...A combination of photochlorination ofp-xylene and succedent Friedel-Crafts alkylation polymerization was firstly used in the preparation of the hypercrosslinked adsorptive resin. The data of GC-MS and GC showed that a series of chlorizates were produced when p-xylene was photochlorinated. Hypercrosslinked resins could be synthesized by copolymerization, self-polymerization of chlorizates or post crosslinking reaction. The chemical structure and micromorphology of the porous resins were characterized by BET, FF-IR, SEM and elementary analysis （EA）. The results showed that the novel adsorptive resins possess high BET surface near to 1038 m^2/g and large pore volumes range from 0.5 to 1.2 cm^3/g.展开更多
Based on the mechanism analysis of the polychlorination of long chain n-alkanes by photo-initiation,a kinetic model was developed. The model parameters were obtained by the method of non-linear fitting. The influences...Based on the mechanism analysis of the polychlorination of long chain n-alkanes by photo-initiation,a kinetic model was developed. The model parameters were obtained by the method of non-linear fitting. The influences of luminous intensity and concentration of molecular chlorine on the rate of polychlorination are demonstrated by the model. If the luminous intensity is adequate, the polychlorination rate of n-alkane is only controlled by the flow rate of molecular chlorine in a wide range of temperature, and the changes of temperature and luminous intensity have less effect on the reaction rate. In addition, the predictions of chlorine content of polychlorinated n-alkane calculated with the model agree very well with experimental results.展开更多
Ultra-high-purity silicon tetrachloride(SiCl4)is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry.The high requirement for ultra-high-purity ...Ultra-high-purity silicon tetrachloride(SiCl4)is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry.The high requirement for ultra-high-purity SiCl4 has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality.In this paper,a mass of production technology of ultra-high-purity SiCl4 was successfully developed through chlorination reaction in the ultraviolet(UV)-based photo microreactor coupled with the distillation process.The influences of key operational parameters,including temperature,pressure,UV wavelength and light intensity on the product quality,especially for hydrogen-containing impurities,were quantified by the infrared transmittance of Fourier transform infrared spectroscopy(FT-IR)at 2185 cm^-1and 2160 cm^-1indicating that chara cteristic vib rational modes of Si-H bonds,as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing.The advanced intensification of SiCl4 manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.展开更多
基金support of the National Natural Science Foundation of China(Nos.20574063 and 21004055)
文摘A combination of photochlorination ofp-xylene and succedent Friedel-Crafts alkylation polymerization was firstly used in the preparation of the hypercrosslinked adsorptive resin. The data of GC-MS and GC showed that a series of chlorizates were produced when p-xylene was photochlorinated. Hypercrosslinked resins could be synthesized by copolymerization, self-polymerization of chlorizates or post crosslinking reaction. The chemical structure and micromorphology of the porous resins were characterized by BET, FF-IR, SEM and elementary analysis （EA）. The results showed that the novel adsorptive resins possess high BET surface near to 1038 m^2/g and large pore volumes range from 0.5 to 1.2 cm^3/g.
文摘Based on the mechanism analysis of the polychlorination of long chain n-alkanes by photo-initiation,a kinetic model was developed. The model parameters were obtained by the method of non-linear fitting. The influences of luminous intensity and concentration of molecular chlorine on the rate of polychlorination are demonstrated by the model. If the luminous intensity is adequate, the polychlorination rate of n-alkane is only controlled by the flow rate of molecular chlorine in a wide range of temperature, and the changes of temperature and luminous intensity have less effect on the reaction rate. In addition, the predictions of chlorine content of polychlorinated n-alkane calculated with the model agree very well with experimental results.
基金financial support from Industry Base Project supported by Ministry of Industry and Information Technology(0714-EMTC02-5593/13)Scientific Research and Development of Henan province(174200510014)。
文摘Ultra-high-purity silicon tetrachloride(SiCl4)is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry.The high requirement for ultra-high-purity SiCl4 has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality.In this paper,a mass of production technology of ultra-high-purity SiCl4 was successfully developed through chlorination reaction in the ultraviolet(UV)-based photo microreactor coupled with the distillation process.The influences of key operational parameters,including temperature,pressure,UV wavelength and light intensity on the product quality,especially for hydrogen-containing impurities,were quantified by the infrared transmittance of Fourier transform infrared spectroscopy(FT-IR)at 2185 cm^-1and 2160 cm^-1indicating that chara cteristic vib rational modes of Si-H bonds,as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing.The advanced intensification of SiCl4 manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.
