Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine

UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.

具有光协同抗菌作用纳米银复合材料的制备

研究开发了一种利用硫氮掺杂的碳量子点与硝酸银反应制备纳米银@硫氮掺杂碳量子点纳米复合材料(AgNPs@S,N-CQDs)的简易方法,并采用紫外-可见光吸收光谱、傅里叶变换红外光谱、高分辨透射电子显微镜等进行了表征。结果表明:银纳米颗粒与硫氮掺杂碳量子点均匀且紧密地结合,对革兰氏阳性菌、革兰氏阴性菌、抗生素耐药菌、真菌等表现出优越的抗菌性能;试样质量浓度为0.05 mg/mL时,采用420 nm光源、光照功率15 W、光照时间3 min条件下,对耐甲氧西林金黄色葡萄球菌抑菌率接近80%,具有光动力抗菌活性;溶血实验显示,AgNPs@S,N-CQDs具有良好的生物相容性,有望作为新型抗菌剂。