期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Semiconductor Type Dependent Comparison of Electrical Characteristics of Pt/InP Structures Fabricated by Magnetron Sputtering Technique in the Range of 20-400 K 被引量:1
1
作者 H.Korkut 《Nano-Micro Letters》 CAS 2013年第1期34-39,共6页
The paper describes how electrical properties of Pt/In P Schottky diode were affected by semiconductor type. We fabricated Pt/p-In P and Pt/n-In P Schottky diodes and measured electrical characteristics from 20 K to 4... The paper describes how electrical properties of Pt/In P Schottky diode were affected by semiconductor type. We fabricated Pt/p-In P and Pt/n-In P Schottky diodes and measured electrical characteristics from 20 K to 400 K. Thicknesses of less than 30 nm of platinum were deposited on the two types of indium phosphide substrates using magnetron sputtering technique after the creation of Zn-Au ohmic back contact.We discussed basic diode parameters of idealiy factors, barrier heights and serries resistances of the two type of contacts. Additionly, unusual temperature characteristics of the the diodes were highlighted. These results were evaluated in terms of semiconductor type comparision of Pt/In P Schottky structures. 展开更多
关键词 pt/p-in P pt/n-In P Magnetron Sputtering I-V-T characteristics
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部