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Direct Observation of the Strong Interaction Between Carbon Nanotubes and Quartz Substrate 被引量:4
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作者 Lei Ding Weiwei Zhou +4 位作者 Thomas P.McNicholas Jinyong Wang Haibin Chu Yan Li Jie Liu 《Nano Research》 SCIE EI CSCD 2009年第11期903-910,共8页
We present a chemical vapor deposition(CVD)method for the growth of uniform single-walled carbon nanotube(SWNT)arrays on a stable temperature(ST)-cut single crystal quartz substrate using a mixture of methanol and eth... We present a chemical vapor deposition(CVD)method for the growth of uniform single-walled carbon nanotube(SWNT)arrays on a stable temperature(ST)-cut single crystal quartz substrate using a mixture of methanol and ethanol as carbon source.It is found that introducing methanol during the growth can improve the density and the length of the well-aligned SWNTs in the arrays as well as increase the SWNT/quartz interaction.Obvious“up-shifts”of G-band frequencies in the Raman spectra have been found for the aligned SWNTs.A well-designed control experiment shows that the G-band“up-shifts”originate from the strong interaction between SWNTs and the quartz substrate.It is believed that exploring this interaction will help to elucidate the growth mechanism;ultimately,this will help realize the promise of controlling the chirality of SWNTs. 展开更多
关键词 Single-walled carbon nanotube quartz wafer Raman spectroscopy G-band“up-shift” chemical vapor deposition(CVD)
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DISPERSION OF NANODIAMOND AND ULTRA-FINE POLISHING OF QUARTZ WAFER 被引量:1
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作者 YongweiZhu ZhijingFeng +1 位作者 BaichunWang XianyangXu 《China Particuology》 SCIE EI CAS CSCD 2004年第4期153-156,共4页
Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in t... Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in the pH range 8~11. A super smooth surface with an average roughness of 0.214 nm was achieved using a nanodia-mond-based slurry regulated by N-(2-hydroxyethyl)ethylenediamine. It is suggested that the principal ultra-fine polishing mechanism of quartz wafer involves atom-level removal under the synergism of chemical and mechanical actions. 展开更多
关键词 NANODIAMOND DISPERSION mechanochemical modification ultra-fine polishing quartz wafer
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