Wear Resistance of TiN_x/CF_y Coatings Deposited by RF Magnetron Co-Sputtering

TiN x/CF y composite coatings were prepared by RF magnetron co-sputtering using twin cylindrical tube targets with Ar and N 2 mixtures.The composition of the coatings deposited at various positions was analyzed by X-ray photoelectron spectroscopy（XPS） and Rutherford back-scattering spectrometry（RBS）.The results revealed that the composition of the deposited coatings has a wide range of TiN x and CFy contents at different deposition positions,which leads to different structures and performances.The hardness of the composite coatings increases from 32 to 1603 HV with increasing the TiN x concentration.The static contact angle of water ranges from 20° to 102° and decreases upon the incorporation of more TiN x into the CF y polymer.The presence of the CF y groups enhances the contact angle between the coating and the solutions dropped onto it,which could effectively protect the coating from corrosion and improve the wear resistance properties in high relative humidity（RH）.The brittleness of the coatings decreases due to the softness of the CF y component,which can bear most of the load and result in less probability of crack formation.XPS results demonstrate the existence of a Ti-（C N） chemical bond in the composite coatings,which improves the wear resistance of the coatings.It is indicated that the wear resistance of the TiN x/CF y coatings is independent of the hardness.However,these properties depend on the uniform structure and the existence of chemical bonding between the TiN x and CF y phases.Moreover,a specific ratio between the soft CF y phase and the hard TiN x phase can produce coatings with good wear resistance.

Preparation,structure and ferromagnetic properties of the nanocrystalline Ti_(1-x)Mn_xO_2 thin films grown by radio frequency magnetron co-sputtering

This paper reported that the Mn-doped TiO2 films were prepared by radio frequency （RF） magnetron cosputtering. X-ray diffraction measurements indicate that the samples are easy to form the futile structure, and the sizes of the crystal grains grow big and big as the Mn concentration increases. X-ray photoemlssion spectroscopy measurements and high resolution transmission electron microscope photographs confirm that the manganese ions have been effectively doped into the TiO2 crystal when the Mn concentration is lower than 21%. The magnetic property measurements show that the Ti1-xMnxO2 （x = 0.21） films are ferromagnetic at room temperature, and the saturation magnetization, coercivity, and saturation field are 16.0 emu/cm^3, 167.5 × 80 A/m and 3740 × 80 A/m at room temperature, respectively. The room-temperature ferromagnetism of the films can be attributed to the new futile Ti1-xMnxO2 structure formed by the substitution of Mn^4＋ for Ti^4＋ into the TiO2 crystal .lattice, and could be explained by O vacancy （Vo）-enhanced ferromagnetism model.

Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)

This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.

Structural,optical,and electrical properties of Cu-doped ZrO_2 films prepared by magnetron co-sputtering

Copper （Cu）-doped ZrO2 （CZO） films with different Cu content （0 at.%- 8.07 at.%） are successfully deposited on Si （100） substrates by direct current （DC） and radio frequency （RF） magnetron co-sputtering. The influences of Cu content on structural, morphological, optical and electrical properties of CZO films are discussed in detail. The CZO films exhibit ZrO2 monocline （1^-11） preferred orientation, which indicates that Cu atoms are doped in ZrO2 host lattice. The crystallite size estimated form x-ray diffraction （XRD） increases by Cu doping, which accords with the result observed from the scanning electron microscope （SEM）. The electrical resistivity decreases from 2.63 Ω·cm to 1.48 Ω·cm with Cu doping content increasing, which indicates that the conductivity of CZO film is improved. However, the visible light transmittances decrease slightly by Cu doping and the optical band gap values decrease from 4.64 eV to 4.48 eV for CZO fihns.

Structural,Morphological and Electrical Properties of In-Doped Zinc Oxide Nanostructure Thin Films Grown on p-Type Gallium Nitride by Simultaneous Radio-Frequency Direct-Current Magnetron Co-Sputtering

Zinc oxide （ZnO） is one of the most promising and frequently used semiconductor materials. In-doped nanos- tructure ZnO thin films are grown on p-type gallium nitride substrates by employing the simultaneous rf and dc magnetron co-sputtering technique. The effect of In-doping on structural, morphological and electrical properties is studied. The different dopant concentrations are accomplished by varying the direct current power of the In target while keeping the fixed radio frequency power of the ZnO target through the co-sputtering deposition technique by using argon as the sputtering gas at ambient temperature. The structural analysis confirms that all the grown thin films preferentially orientate along the c-axis with the wurtzite hexagonal crystal structure without having any kind of In oxide phases. The presenting Zn, 0 and In elements＇ chemical compositions are identified with EDX mapping analysis of the deposited thin films and the calculated M ratio has been found to decrease with the increasing In power. The surface topographies of the grown thin films are examined with the atomic force microscope technique. The obtained results reveal that the grown film roughness increases with the In power. The Hall measurements ascertain that all the grown films have n-type conductivity and also the other electrical parameters such as resistivity,mobility and carrier concentration are analyzed.

Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co-Sputtering

TiVN films were deposited on Si(100) wafers without external heating and biasing by reactive dc magnetron co-sputtering. Titanium and vanadium metals were used as sputtering targets. Ar and N2 gases were used as sputtering gas and reactive gas, respectively. The flow rates of Ar and N2 were 8 and 4 sccm, respectively. The Ti sputtering current (ITi) was kept constant at 0.6 Aand V sputtering current (IV) was varied from 0.4 to1.0 A. The deposition time for all the deposited films was 30 min. The effects of V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM), and X-ray photoelectron spectroscopy (XPS), respectively. It was found that all the prepared film formed (Ti,V)N solid solution. The lattice parameter was found to decrease while crystallite size, RMS roughness and film thickness increased with increasing V sputtering current. High resolution XPS spectra of the Ti 2p, V 2p and N 1s revealed that the fraction of Ti-N and V-N bonds increased as the V sputtering current increased. However, the V-N bond was observed only at a high V sputtering current.

Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature

Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV.

Properties of doped ZnO transparent conductive thin films deposited by RF magnetron sputtering using a series of high quality ceramic targets

To obtain high transmittance and low resistivity ZnO transparent conductive thin films,a series of ZnO ceramic targets（ZnO：Al,ZnO：（Al,Dy）,ZnO：（Al,Gd）,ZnO：（Al,Zr）,ZnO：（Al,Nb）,and ZnO：（Al,W）） were fabricated and used to deposit thin films onto glass substrates by radio frequency（RF） magnetron sputtering.X-ray diffraction（XRD） analysis shows that the films are polycrystalline fitting well with hexagonal wurtzite structure and have a preferred orientation of the（002） plane.The transmittance of above 86% as well as the lowest resistivity of 8.43 × 10^-3 Ω·cm was obtained.

Preparation of TiAlN/ZrN and TiCrN/ZrN multilayers by RF magnetron sputtering

Titanium-based nitride coatings on cutting tools,press molds and dies can be used to prolong their life cycle because of their superior corrosion and oxidation resistance.TiAlN/ZrN and TiCrN/ZrN multilayer coatings were prepared by RF magnetron sputtering,and their microstructural evolution and corrosion resistance during heat treatment were investigated.The TiAlN/ZrN and TiCrN/ZrN multilayer coatings are degraded by heating up to 600 ℃ with the formation of oxides particles on the surface.During the heat treatment,the TiCrN/ZrN and TiAlN/ZrN multilayer coatings show the lowest corrosion current density and the highest polarization resistance at temperature range of 400-500 ℃.Consequently,the TiAlN/ZrN and TiCrN/ZrN multilayer coatings show good corrosion resistance at temperature range of 400-500 ℃ during heating.

RF magnetron sputtering induced the perpendicular magnetic anisotropy modification in Pt/Co based multilayers

We demonstrate that radio frequency(RF)magnetron sputtering technique can modify the perpendicular magnetic anisotropy(PMA)of Pt/Co/normal metal(NM)thin films.Influence of ion irradiation during RF magnetron sputtering should not be neglected and it can weaken PMA of the deposited magnetic films.The magnitude of this influence can be controlled by tuning RF magnetron sputtering deposition conditions and the upper NM layer thickness.According to the stopping and range of ions in matter(SRIM)simulation results,defects such as displacement atoms and vacancies in the deposited film will increase after the RF magnetron sputtering,which can account for the weakness of PMA.The amplitude changes of the Hall resistance and the threshold current intensity of spin orbit torque(SOT)induced magnetization switching also can be modified.Our study could be useful for controlling magnetic properties of PMA films and designing new type of SOT-based spintronic devices.

Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering

Tin-doped indium oxide （ITO） thin films were prepared using conventional radio frequency （RF） planar magnetron sputtering equipped with IR irradiation using a ceramic target of In2O3/SnO2 with a mass ratio of 1：1 at various IR irradiation temperatures T1 （from room temperature to 400℃）. The refractive index, deposited ratio, and resistivity are functions of the sputtering Ar gas pressure. The microstructure of ITO thin films is related to IR T1, the crystalline seeds appear at T1= 300℃, and the films are amorphous at the temperature ranging from 27℃ to 400℃. AFM investigation shows that the roughness value of peak-valley of ITO thin film （Rp-v） and the surface microstructure of rio thin films have a close relation with T1. The IR irradiation results in a widening value of band-gap energy due to Burstein-Moss effect and the maximum visible transmittance shifts toward a shorter wavelength along with a decrease in the film＇s refractive index. The plasma wavelength and the refractive index of ITO thin films are relative to the T1. XPS investigation shows that the photoelectrolytic properties can be deteriorated by the sub-oxides. The deterioration can be decreased by increasing the oxygen flow rote （fo2）, and the mole ratio of Sn/In in the samples reduces with an increase info2.

Influence of TiO_2 seeding layers on phase composition of lead magnesium niobate-lead titanate thin films prepared by RF magnetron sputtering

The influence of amorphous TiO_2 seeding layers on the phase composition of lead magnesium niobate-lead titanate(0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3,PMN-PT) films deposited on Pt/Ti/SiO2/Si substrate by RF magnetron sputtering was examined.The relation between seeding layer thickness and phase composition at different post annealing temperature was observed by XRD.The thickness of amorphous TiO2 seeding layer and post annealing temperature had remarkable effects on PMN-PT film phase composition.When amorphous seeding layer becomes thick,a new phase of Nb2O5 exists in the films.Only when the seeding layer thickness is suitable,the film with pure perovskite phase can be attained.

Study on SGDC Electrolyte Film Prepared by RF Magnetron Sputtering

Sm and Gd co-doped Ceria (SGDC:Sm_(0.1)Gd_(0.1)Ce_(0.8)O_(1.90)) films as the electrolytes were investigated for the IT-SOFCs (intermediate-temperature solid oxide fuel cells).SGDC sensing films were successfully prepared on the Al_2O_3 substrates by RF-magnetron sputtering.The relationship between sputtering parameters and film microstructure was discussed, and the optimum parameters were gained.The crystal structure analysis and surface morphologic observation of the SGDC films were carried out through X-ray diffraction (XRD) and scanning electron microscopy (SEM).The oxygen ion conductivity of the SGDC film was evaluated by AC impedance spectroscopy at the different temperatures.The XRD analysis shows that the SGDC films grow preferentially along the (111) compact plane.The crystallinity of the SGDC films is enhanced with the increase of the RF sputtering power from 150 W to 250 W.The oxygen ion conductivity of the SGDC was measured at the temperature from 600℃to 800℃in air by AC impedance spectroscopy.The result shows that a high oxygen ion conductivity of 2.44×10^(-2) S.cm^(-1) was achieved at 800℃.

Tribological performance under different environments of Ti-C-N composite films for marine wear-resistant parts

The need for reducing the wear in mechanical parts used in the industry makes self-lubricant films one of the sustainable solutions to achieve long-term protection under different environmental conditions.The purpose of this work is to study the influence of C additions on the tribological behavior of a magnetron-sputtered TiN film in air,water,and seawater.The results show that the addition of C into the TiN binary film induced a new amorphous phase,and the films exhibited a dual phase of fcc(face-centered cubic)-TiN and amorphous carbon.The antifriction and wear-resistance properties were enhanced in air and water by adding 19.1at%C.However,a further increase in the C concentration improved anti-frictional properties but also led to higher wear rates.Although the amorphous phase induced microbatteries and accelerated the corrosion of TiN phases in seawater,the negative abrasion state was detected for all Ti-C-N films due to the adhesion of the tribocorrosion debris on the wear track.

High Ferroelectricities and High Curie Temperature of BiInO3PbTiO3Thin Films Deposited by RF Magnetron Sputtering Method

Properties of ferroelectric xBiInO3-（1-x）PbTiO3（xBI-（1-x）PT） thin films deposited on（101） SrRuO3/（200）Pt/（200） MgO substrates by rf magnetron sputtering method and effects of deposition conditions are investigated.The structures of the xBI-（1-x）PT films are characterized by x-ray diffraction and scanning electron microscopy.The results indicate that the thin films are grown with mainly（001） orientation. The chemical compositions of the films are analyzed by scanning electron probe and the results indicate that the loss phenomena of Pb and Bi elements depend on the pressure and temperature during the sputtering process.The sputtering parameters including target composition, substrate temperature, and gas pressure are adjusted to obtain optimum sputtering conditions. To decrease leakage currents,2 mol% La2 O3 is doped in the targets. The P-E hysteresis loops show that the optimized xBI-（1-x）PT（x = 0.24） film has high ferroelectricities with remnant polarization2 Pr = 80μC/cm2 and coercive electric field 2 EC = 300 kV/cm. The Curie temperature is about 640℃. The results show that the films have optimum performance and will have wide applications.

Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering

Tin-doped indium oxide （ITO） thin films were prepared using conventional radio frequency （RF） planar magnetron sputtering equipped with IR irradiation using a ceramic target of In2O3/SnO2 with a mass ratio of 1∶1 at various IR irradiation temperatures T1 （from room temperature to 400?℃）. The refractive index,deposited ratio,and resistivity are functions of the sputtering Ar gas pressure. The microstructure of ITO thin films is related to IR T1,the crystalline seeds appear at T1=300?℃,and the films are amorphous at the temperature ranging from 27?℃ to 400?℃. AFM investigation shows that the roughness value of peak-valley of ITO thin film （R p-v ） and the surface microstructure of ITO thin films have a close relation with T1. The IR irradiation results in a widening value of band-gap energy due to Burstein-Moss effect and the maximum visible transmittance shifts toward a shorter wavelength along with a decrease in the film’s refractive index. The plasma wavelength and the refractive index of ITO thin films are relative to the T1. XPS investigation shows that the photoelectrolytic properties can be deteriorated by the sub-oxides. The deterioration can be decreased by increasing the oxygen flow rate （fo2）,and the mole ratio of Sn/In in the samples reduces with an increase in fo2.

Al-Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

Zinc oxide (ZnO) and aluminum-doped zinc oxide (ZnO:Al) thin films were deposited onto glass and silicon substrates by RF magnetron sputtering using a zinc-aluminum target. Both films were deposited at a growth rate of 12.5 nm/min to a thickness of around 750 nm. In the visible region, the films exhibit optical transmittances which are greater than 80%. The optical energy gap of ZnO films increased from 3.28 eV to 3.36 eV upon doping with Al. This increase is related to the increase in carrier density from 5.9 × 1018 cm-3 to 2.6 × 1019 cm-3. The RMS surface roughness of ZnO films grown on glass increased from 14 to 28 nm even with only 0.9% at Al content. XRD analysis revealed that the ZnO films are polycrystalline with preferential growth parallel to the (002) plane, which corresponds to the wurtzite structure of ZnO.

Preparation of Sn-doped Ga_(2)O_(3) thin films and their solar-blind photoelectric detection performance

Sn doping is an effective way to improve the response rate of Ga_(2)O_(3) film based solar-blind detectors. In this paper,Sn-doped Ga_(2)O_(3) films were prepared on a sapphire substrate by radio frequency magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and ultraviolet visible spectroscopy, and the effect of annealing atmosphere on the properties of films was studied. The Ga_(2)O_(3) films changed from amorphous to β-Ga_(2)O_(3) after annealing at 900 °C. The films were composed of micro crystalline particles with a diameter of about 5–20 nm.The β-Ga_(2)O_(3) had high transmittance for wavelengths above 300 nm, and obvious absorption for solar-blind signals at 200–280 nm.The metal semiconductor metal type solar-blind detectors were prepared. The detector based on Sn-doped β-Ga_(2)O_(3) thin film annealed in N_2 has the best response performance to 254 nm light. The photo-current is 10 μA at 20 V, the dark-current is 5.76 pA,the photo dark current ratio is 1.7 × 10~6, the response rate is 12.47 A/W, the external quantum efficiency is 6.09 × 10~3%, the specific detection rate is 2.61 × 10~(12) Jones, the response time and recovery time are 378 and 90 ms, respectively.

磁控溅射时长对复合羟基磷灰石涂层性能的影响

采用射频磁控溅射技术在Ti-6Al-4V基体沉积复合羟基磷灰石(HA,Ca_(10)(PO_(4))_(6)(OH)_(2))涂层,研究掺杂Ti和TiN在不同HA溅射时长下对HA复合涂层微观结构、摩擦学性能、钙磷比(Ca/P)及电化学的影响。结果表明:复合HA涂层随着HA溅射时长增加,涂层表面的半球形颗粒状结晶体更明显,对细胞附着生长及生物相容性有重要影响;复合涂层主要由HA相、Ti相和TiN相组成,溅射时间越长的复合HA涂层物相更接近标准值,且涂层Ca/P随着溅射时间的增加逐渐接近标准值;摩擦系数随溅射时长的增加逐渐趋于稳定,涂层的摩擦磨损情况随溅射时间增加而逐渐减小;溅射时长最长的涂层获得了最低的腐蚀电流密度和最大的腐蚀电位。

RF磁控溅射法制备ZnO薄膜的XRD分析

采用RF磁控溅射法，在玻璃村底上制备多晶ZnO薄膜，并对所制备的ZnO薄膜在空气气氛中进行了不同温度（350～600℃）的退火处理和600℃时N2气氛中的退火处理。利用X射线衍射分析了溅射参数如溅射功率、溅射氧分压、衬底温度以及退火处理对ZnO薄膜结晶性能的影响。结果表明，合适的衬底温度和退火处理能够提高ZnO薄膜的结晶质量。