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RF Ion Beam Sources Used in Etching
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作者 SU Zhiwei CHEN Qingchuan 《Southwestern Institute of Physics Annual Report》 2004年第1期142-145,共4页
Ion beam technology is used widely in many fields such as electric, material, optics, medicine, biology and so on. At the same time, it brings some huge technological effects and economical benefits, especially for th... Ion beam technology is used widely in many fields such as electric, material, optics, medicine, biology and so on. At the same time, it brings some huge technological effects and economical benefits, especially for the optical applocations. According for the technology, the properties of high accuarate spectral analyzer also can be improved by manufacturing the lage-area holographic ion beam eathing(HIBE) grating. Simultaneously, as one of the parts of ion beam technology, the developments of ion beam sources have some important effects to content the demands of ion beam technology such as large ion beam flux, excellent optical qualities. In this paper, an ion beam source called inductively coupled plasma(ICP) ion beam source was introduced, and the extractor system, the application prospect were also discussed. 展开更多
关键词 Inductively coupled plasma(ICP) Ion beam sources rf antenna
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