期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond 被引量:1
1
作者 Song YUAN Xiaoguang GUO +2 位作者 Hao WANG Renke KANG Shang GAO 《Friction》 SCIE EI CAS CSCD 2024年第6期1119-1132,共14页
The roughness of the contact surface exerts a vital role in rubbing.It is still a significant challenge to understand the microscopic contact of the rough surface at the atomic level.Herein,the rough surface with a sp... The roughness of the contact surface exerts a vital role in rubbing.It is still a significant challenge to understand the microscopic contact of the rough surface at the atomic level.Herein,the rough surface with a special root mean square(RMS)value is constructed by multivariate Weierstrass–Mandelbrot(W–M)function and the rubbing process during that the chemical mechanical polishing(CMP)process of diamond is mimicked utilizing the reactive force field molecular dynamics(ReaxFF MD)simulation.It is found that the contact area A/A0 is positively related with the load,and the friction force F depends on the number of interfacial bridge bonds.Increasing the surface roughness will increase the friction force and friction coefficient.The model with low roughness and high lubrication has less friction force,and the presence of polishing liquid molecules can decrease the friction force and friction coefficient.The RMS value and the degree of damage show a functional relationship with the applied load and lubrication,i.e.,the RMS value decreases more under larger load and higher lubrication,and the diamond substrate occurs severer damage under larger load and lower lubrication.This work will generate fresh insight into the understanding of the microscopic contact of the rough surface at the atomic level. 展开更多
关键词 DIAMOND random roughness reactive force field molecular dynamics(reaxff MD) friction Weierstrass-Mandelbrot(W-M)function chemical mechanical polishing(CMP)
原文传递
Molecular Dynamics Study of Tension Process of Ni-Based Superalloy 被引量:1
2
作者 Hui Li Wan Du Yi Liu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2020年第5期741-750,共10页
To understand the atomistic mechanisms of tension failure of Ni-based superalloy,in this study,the classical molecular dynamics(MD)simulations were used to study the uniaxial tension processes of both the Ni/Ni3 Al in... To understand the atomistic mechanisms of tension failure of Ni-based superalloy,in this study,the classical molecular dynamics(MD)simulations were used to study the uniaxial tension processes of both the Ni/Ni3 Al interface systems and the pure Ni and Ni3 Al systems.To examine the effects of interatomic potentials,we adopted embedded atom method(EAM)and reactive force field(ReaxFF)in the MD simulations.The results of EAM simulations showed that the amorphous structures and voids formed near the interface,facilitating further crack propagation within Ni matrix.The EAM potentials also predicted that dislocations were generated and annihilated alternatively,leading to the oscillation of yielding stress during the tension process.The ReaxFF simulations predicted more amorphous formation and larger tensile strength.The atomistic understanding of the defect initiation and propagation during tension process may help to develop the strengthening strategy for controlling the defect evolution under loading. 展开更多
关键词 Ni-based superalloy Molecular dynamics Embedded atom method(EAM) reactive force field(reaxff) Uniaxial tension
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部