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Design of a novel correlative reflection electron microscope for in-situ real-time chemical analysis
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作者 李天龙 魏征 万唯实 《Chinese Physics B》 SCIE EI CAS CSCD 2021年第12期334-338,共5页
A novel instrument that integrates reflection high energy electron diffraction(RHEED),electron energy loss spectroscopy(EELS),and imaging is designed and simulated.Since it can correlate the structural,elemental,and s... A novel instrument that integrates reflection high energy electron diffraction(RHEED),electron energy loss spectroscopy(EELS),and imaging is designed and simulated.Since it can correlate the structural,elemental,and spatial information of the same surface region via the simultaneously acquired patterns of RHEED,EELS,and energy-filtered electron microscopy,it is named correlative reflection electron microscopy(c-REM).Our simulation demonstrates that the spatial resolution of this c-REM is lower than 50 nm,which meets the requirements for in-situ monitoring the structural and chemical evolution of surface in advanced material. 展开更多
关键词 reflection high energy electron diffraction(RHEED) electron energy loss spectroscopy(EELS) parallel detection energy-filtered electron microscopy
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Effect of thickness on the microstructure of GaN films on Al_2 O_3 (0001) by laser molecular beam epitaxy
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作者 刘莹莹 朱俊 +3 位作者 罗文博 郝兰众 张鹰 李言荣 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第10期435-441,共7页
Heteroepitaxial GaN films are grown on sapphire (0001) substrates using laser molecular beam epitaxy. The growth processes are in-situ monitored by reflection high energy electron diffraction. It is revealed that th... Heteroepitaxial GaN films are grown on sapphire (0001) substrates using laser molecular beam epitaxy. The growth processes are in-situ monitored by reflection high energy electron diffraction. It is revealed that the growth mode of GaN transformed from three-dimensional (3D) island mode to two-dimensional (2D) layer-by-layer mode with the increase of thickness. This paper investigates the interfacial strain relaxation of GaN films by analysing their diffraction patterns. Calculation shows that the strain is completely relaxed when the thickness reaches 15 nm. The surface morphology evolution indicates that island merging and reduction of the island-edge barrier provide an effective way to make GaN films follow a 2D layer-by-layer growth mode. The ll0-nm GaN films with a 2D growth mode have smooth regular hexagonal shapes. The X-ray diffraction indicates that thickness has a significant effect on the crystallized quality of GaN thin films. 展开更多
关键词 reflection high energy electron diffraction thin films laser molecular beam epitaxy GaN sapphires
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Cubic ZnO films obtained at low pressure by molecular beam epitaxy
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作者 王小丹 周华 +5 位作者 王惠琼 任飞 陈晓航 詹华瀚 周颖慧 康俊勇 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第9期454-458,共5页
A zinc oxide thin film in cubic crystalline phase, which is usually prepared under high pressure, has been grown on the Mg O(001) substrate by a three-step growth using plasma-assisted molecular beam epitaxy. The cu... A zinc oxide thin film in cubic crystalline phase, which is usually prepared under high pressure, has been grown on the Mg O(001) substrate by a three-step growth using plasma-assisted molecular beam epitaxy. The cubic structure is confirmed by in-situ reflection high energy electron diffraction measurements and simulations. The x-ray photoelectron spectroscopy reveals that the outer-layer surface of the film(less than 5 nm thick) is of ZnO phase while the buffer layer above the substrate is of ZnMgO phase, which is further confirmed by the band edge transmissions at the wavelengths of about 390 nm and 280 nm, respectively. The x-ray diffraction exhibits no peaks related to wurtzite ZnO phase in the film. The cubic ZnO film is presumably considered to be of the rock-salt phase. This work suggests that the metastable cubic ZnO films, which are of applicational interest for p-type doping, can be epitaxially grown on the rock-salt substrates without the usually needed high pressure conditions. 展开更多
关键词 ZnO film rock-salt structure molecular beam epitaxy reflection high energy electron diffraction
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