Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile me...Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile memristive devices were compared and the factors that make TaO_2 memristive devices better than T1O_2 memristive devices were studied.TaO_2 memristive devices have shown better endurance performances(10~8times more switching cycles) and faster switching speed(5 times) than TiO_2 memristive devices.Electroforming of TaO_2 memristive devices requires ~ 4.5 times less energy than TiO_2 memristive devices of a similar size.The retention period of TaO_2 memristive devices is expected to exceed 10 years with sufficient experimental evidence.In addition to comparing device performances,this article also explains the differences in physical device structure,switching mechanism,and resistance switching performances of TiO_2 and TaO_2 memristive devices.This article summarizes the reasons that give TaO_2 memristive devices the advantage over TiO_2 memristive devices,in terms of electroformation,switching speed,and endurance.展开更多
Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering. The ZnO thin films are grown at room temperature and 400 ℃ substrate temperature, respectively. By comparing th...Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering. The ZnO thin films are grown at room temperature and 400 ℃ substrate temperature, respectively. By comparing the data, we find that the latter device displayed better stability in the repetitive switching cycle test, and the resistance ratio between a high resistance state and a low resistance state is correspondingly increased. After 104-s storage time measurement, this device exhibits a good retention property. Moreover, the operation voltages are very low: -0.3 V/-0.7 V (OFF state) and 0.3 V (ON state). A high-voltage forming process in the initial state is not required, and a multistep reset process is demonstrated.展开更多
Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering.The ZnO thin films are grown at room temperature and 400 C substrate temperature,respectively.By comparing the da...Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering.The ZnO thin films are grown at room temperature and 400 C substrate temperature,respectively.By comparing the data,we find that the latter device displayed better stability in the repetitive switching cycle test,and the resistance ratio between a high resistance state and a low resistance state is correspondingly increased.After 104-s storage time measurement,this device exhibits a good retention property.Moreover,the operation voltages are very low:-0.3 V/-0.7 V(OFF state) and 0.3 V(ON state).A high-voltage forming process in the initial state is not required,and a multistep reset process is demonstrated.展开更多
Neuromorphic computing is a brain-inspired computing paradigm that aims to construct efficient,low-power,and adaptive computing systems by emulating the information processing mechanisms of biological neural systems.A...Neuromorphic computing is a brain-inspired computing paradigm that aims to construct efficient,low-power,and adaptive computing systems by emulating the information processing mechanisms of biological neural systems.At the core of neuromorphic computing are neuromorphic devices that mimic the functions and dynamics of neurons and synapses,enabling the hardware implementation of artificial neural networks.Various types of neuromorphic devices have been proposed based on different physical mechanisms such as resistive switching devices and electric-double-layer transistors.These devices have demonstrated a range of neuromorphic functions such as multistate storage,spike-timing-dependent plasticity,dynamic filtering,etc.To achieve high performance neuromorphic computing systems,it is essential to fabricate neuromorphic devices compatible with the complementary metal oxide semiconductor(CMOS)manufacturing process.This improves the device’s reliability and stability and is favorable for achieving neuromorphic chips with higher integration density and low power consumption.This review summarizes CMOS-compatible neuromorphic devices and discusses their emulation of synaptic and neuronal functions as well as their applications in neuromorphic perception and computing.We highlight challenges and opportunities for further development of CMOS-compatible neuromorphic devices and systems.展开更多
文摘Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices.In this article,the performances of T1O_2 and TaO_2nonvolatile memristive devices were compared and the factors that make TaO_2 memristive devices better than T1O_2 memristive devices were studied.TaO_2 memristive devices have shown better endurance performances(10~8times more switching cycles) and faster switching speed(5 times) than TiO_2 memristive devices.Electroforming of TaO_2 memristive devices requires ~ 4.5 times less energy than TiO_2 memristive devices of a similar size.The retention period of TaO_2 memristive devices is expected to exceed 10 years with sufficient experimental evidence.In addition to comparing device performances,this article also explains the differences in physical device structure,switching mechanism,and resistance switching performances of TiO_2 and TaO_2 memristive devices.This article summarizes the reasons that give TaO_2 memristive devices the advantage over TiO_2 memristive devices,in terms of electroformation,switching speed,and endurance.
基金Project supported by the National Natural Science Foundation of China (Grant No. 50972007)the National Natural Science Foundation of China for Distinguished Young Scholars (Grant No. 60825407)+3 种基金the Beijing Municipal Natural Science Foundation,China (Grant No. 4092035)the State Key Program for Basic Research of the Ministry of Science and Technology of China (Grant No. 2011CB932703)the Special Items Fund of Beijing Municipal Commission of Education,Chinathe Opened Fund of the State Key Laboratory on Integrated Optoelectronics,China
文摘Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering. The ZnO thin films are grown at room temperature and 400 ℃ substrate temperature, respectively. By comparing the data, we find that the latter device displayed better stability in the repetitive switching cycle test, and the resistance ratio between a high resistance state and a low resistance state is correspondingly increased. After 104-s storage time measurement, this device exhibits a good retention property. Moreover, the operation voltages are very low: -0.3 V/-0.7 V (OFF state) and 0.3 V (ON state). A high-voltage forming process in the initial state is not required, and a multistep reset process is demonstrated.
基金Project supported by the National Natural Science Foundation of China (Grant No. 50972007)the National Natural Science Foundation of China for Distinguished Young Scholars (Grant No. 60825407)+3 种基金the Beijing Municipal Natural Science Foundation,China (Grant No. 4092035)the State Key Program for Basic Research of the Ministry of Science and Technology of China (Grant No. 2011CB932703)the Special Items Fund of Beijing Municipal Commission of Education,Chinathe Opened Fund of the State Key Laboratory on Integrated Optoelectronics,China
文摘Ag/ZnO/Zn/Pt structure resistive switching devices are prepared by radio frequency magnetron sputtering.The ZnO thin films are grown at room temperature and 400 C substrate temperature,respectively.By comparing the data,we find that the latter device displayed better stability in the repetitive switching cycle test,and the resistance ratio between a high resistance state and a low resistance state is correspondingly increased.After 104-s storage time measurement,this device exhibits a good retention property.Moreover,the operation voltages are very low:-0.3 V/-0.7 V(OFF state) and 0.3 V(ON state).A high-voltage forming process in the initial state is not required,and a multistep reset process is demonstrated.
基金supported by the National Natural Science Foundation of China(Grant Nos.62074075,62174082,and 61834001).
文摘Neuromorphic computing is a brain-inspired computing paradigm that aims to construct efficient,low-power,and adaptive computing systems by emulating the information processing mechanisms of biological neural systems.At the core of neuromorphic computing are neuromorphic devices that mimic the functions and dynamics of neurons and synapses,enabling the hardware implementation of artificial neural networks.Various types of neuromorphic devices have been proposed based on different physical mechanisms such as resistive switching devices and electric-double-layer transistors.These devices have demonstrated a range of neuromorphic functions such as multistate storage,spike-timing-dependent plasticity,dynamic filtering,etc.To achieve high performance neuromorphic computing systems,it is essential to fabricate neuromorphic devices compatible with the complementary metal oxide semiconductor(CMOS)manufacturing process.This improves the device’s reliability and stability and is favorable for achieving neuromorphic chips with higher integration density and low power consumption.This review summarizes CMOS-compatible neuromorphic devices and discusses their emulation of synaptic and neuronal functions as well as their applications in neuromorphic perception and computing.We highlight challenges and opportunities for further development of CMOS-compatible neuromorphic devices and systems.