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On Identifying Influential Observations in the Presence of Multicollinearity
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作者 Chinwendu Alice Uzuke Ifeyinwa Christiana Ezeilo 《Open Journal of Statistics》 2021年第2期290-302,共13页
Influential observation is one which either individually or together with several other observations has a demonstrably large impact on the values of various estimates of regression coefficient. It has been suggested ... Influential observation is one which either individually or together with several other observations has a demonstrably large impact on the values of various estimates of regression coefficient. It has been suggested by some authors that multicollinearity should be controlled before attempting to measure influence of data point. In using ridge regression to mitigate the effect of multicollinearity, there arises a problem of choosing possible of ridge parameter that guarantees stable regression coefficients in the regression model. This paper seeks to check whether the choice of ridge parameter estimator influences the identified influential data points</span></span><span style="font-family:Verdana;">. 展开更多
关键词 Multicollinerity ridge parameter Influential Measures OUTLIERS Leverage Point
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Reactive ion etching of Ti-diffused LiNbO_3 slab waveguides
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作者 吴建杰 李金洋 +1 位作者 要彦清 祁志美 《Journal of Semiconductors》 EI CAS CSCD 2013年第8期188-192,共5页
Reactive ion etching(RIE) of LiNbO_3(LN) in SF_6 plasma atmosphere was studied for optimizing the preparation conditions for LN ridge waveguides.The samples to be etched are Ti-diffused LN slab waveguides overlaid... Reactive ion etching(RIE) of LiNbO_3(LN) in SF_6 plasma atmosphere was studied for optimizing the preparation conditions for LN ridge waveguides.The samples to be etched are Ti-diffused LN slab waveguides overlaid with a chromium film mask that has a Mach-Zehnder interferometer(MZI) array pattern.The experimental results indicate that the LN-etching rate(R_(LN)) and the Cr-etching rate(R_(Cr)) as well as the rate ratio R_(LN)/R_(Cr) increase with either increasing the radio-frequency(RF) power at a given SF_6 flow rate or increasing the SF_6 flow rate at a fixed RF power.The maximum values of R_(LN) = 43.2 nm/min and R_(LN)/R_(Cr) = 3.27 were achieved with 300 W RF power and 40 sccm SF_6 flow.When the SF_6 flow rate exceeds 40 sccm,an increase in the flow rate causes the etching rates and the rate ratio to decrease.The scanning electron microscope images of the LN ridge prepared after~20 min etching show that the ridge height is 680 nm and the sidewall slope angle is about 60°. 展开更多
关键词 reactive ion etching Ti-diffused LiNbO_3 slab waveguide optimal etching parameters ridge waveguide
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