By phenomenological analysis of warm compaction, it is found that, compared with the contribution of particle plastical deformation to densification of powder compact,the particle rearrangement is a dominant densifica...By phenomenological analysis of warm compaction, it is found that, compared with the contribution of particle plastical deformation to densification of powder compact,the particle rearrangement is a dominant densification mechanism for powder warm compaction, and the plastical deformation of particles plays an important role in offering accommodating deformation for particle rearrangement and densifying powder compact at the final stage of pressing.In order to attain density gain as high as possible during warm compaction, six rules for designing warm compacting powder mixtures were proposed in detail.展开更多
5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm...5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm logic photo process,the most appropriate layers for the EUV lithography are the cut layers,metal layers,and via layers.Generally speaking,critical structures in a lithography process are semi-dense patterns,also known as the“forbidden pitch”patterns,the array edge structures,tip-to-tip structures,tip-to-line structures(under 2D design rules),the minimum area structures,the bi-lines,tri-lines,…,etc.Compared to that from the 193 nm immersion process,the behaviors for the above structures are different.For example,in the 193 nm immersion process,the minimum area is about 2~3 times that of minimum pixel squared,while in EUV photolithographic process,the minimum achievable area is found to be significantly larger.In the simulation,we have kept aware of the stochastics impact due to drastically reduced number of photons absorbed compared to the DUV process,the criteria used for various structures of image contrast are tightened.For example,in 193 nm immersion lithography,we have usually set the minimum Exposure Latitude(EL)for the poly layer,the metal layer,and tip-to-tip pattern,respectively,at 18%,13%,and 10%.However,in EUV lithography,reasonable targets for the minima are,respectively,>18%,18%,and 13%.We have also studied the aberration and shadowing impact to the above design rule structures.We will present the results of our work and our explanations.展开更多
The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According t...The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According to the fuzzy probability theory and the robust designprinciple, the robust design rule based on fuzzy probability (named fuzzy robust design rule forshort) was put forward and its validity and practicability were analyzed and tested with a designexample. The theoretical analysis and the design examples make clear that, while the fuzzy robustdesign rule was used, the fine design effect can be obtained and the fuzzy robust design rule can bevery suitable for the choice of the membership function of the fuzzy target; so it has a particularadvantage.展开更多
Diabetes is a serious, long-term (or chronic) disease that occurs when a person’s blood sugar levels are high because their body cannot produce enough insulin, or does not produce enough insulin or that it cannot eff...Diabetes is a serious, long-term (or chronic) disease that occurs when a person’s blood sugar levels are high because their body cannot produce enough insulin, or does not produce enough insulin or that it cannot effectively use the insulin it produces. According to the literature, this disease has several causes, but certain types of diabetes such as type 2 diabetes are most closely linked to a metabolic disorder due to abdominal obesity. Thus, the number of individuals with type 2 diabetes is increasing. It is with this in mind that we work to improve human health. The aim of this study is to design new derivatives of 1,3,4-thiadiazole with improved antidiabetic activity by the mathematical model of multiple linear regression (MLR) established previously. The analysis of the effect on the substituents influencing the antidiabetic activity, fourteen (14) new molecules coded CDTH were generated and presenting values of the potential of inhibitory concentration higher than that of the base compound (pIC50 = 2.526). But thirteen (13) of these new compounds belong to the domain of applicability of the MLR model established previously. In addition, the thermodynamic quantities of formation formed at 298K have been calculated. Lipinski’s rule and pharmacokinetic properties proved that five (5) (TH4, TH9, TH10, TH13 and TH14) new molecules can be used as diabetes medicine.展开更多
文摘By phenomenological analysis of warm compaction, it is found that, compared with the contribution of particle plastical deformation to densification of powder compact,the particle rearrangement is a dominant densification mechanism for powder warm compaction, and the plastical deformation of particles plays an important role in offering accommodating deformation for particle rearrangement and densifying powder compact at the final stage of pressing.In order to attain density gain as high as possible during warm compaction, six rules for designing warm compacting powder mixtures were proposed in detail.
文摘5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm logic photo process,the most appropriate layers for the EUV lithography are the cut layers,metal layers,and via layers.Generally speaking,critical structures in a lithography process are semi-dense patterns,also known as the“forbidden pitch”patterns,the array edge structures,tip-to-tip structures,tip-to-line structures(under 2D design rules),the minimum area structures,the bi-lines,tri-lines,…,etc.Compared to that from the 193 nm immersion process,the behaviors for the above structures are different.For example,in the 193 nm immersion process,the minimum area is about 2~3 times that of minimum pixel squared,while in EUV photolithographic process,the minimum achievable area is found to be significantly larger.In the simulation,we have kept aware of the stochastics impact due to drastically reduced number of photons absorbed compared to the DUV process,the criteria used for various structures of image contrast are tightened.For example,in 193 nm immersion lithography,we have usually set the minimum Exposure Latitude(EL)for the poly layer,the metal layer,and tip-to-tip pattern,respectively,at 18%,13%,and 10%.However,in EUV lithography,reasonable targets for the minima are,respectively,>18%,18%,and 13%.We have also studied the aberration and shadowing impact to the above design rule structures.We will present the results of our work and our explanations.
文摘The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According to the fuzzy probability theory and the robust designprinciple, the robust design rule based on fuzzy probability (named fuzzy robust design rule forshort) was put forward and its validity and practicability were analyzed and tested with a designexample. The theoretical analysis and the design examples make clear that, while the fuzzy robustdesign rule was used, the fine design effect can be obtained and the fuzzy robust design rule can bevery suitable for the choice of the membership function of the fuzzy target; so it has a particularadvantage.
文摘Diabetes is a serious, long-term (or chronic) disease that occurs when a person’s blood sugar levels are high because their body cannot produce enough insulin, or does not produce enough insulin or that it cannot effectively use the insulin it produces. According to the literature, this disease has several causes, but certain types of diabetes such as type 2 diabetes are most closely linked to a metabolic disorder due to abdominal obesity. Thus, the number of individuals with type 2 diabetes is increasing. It is with this in mind that we work to improve human health. The aim of this study is to design new derivatives of 1,3,4-thiadiazole with improved antidiabetic activity by the mathematical model of multiple linear regression (MLR) established previously. The analysis of the effect on the substituents influencing the antidiabetic activity, fourteen (14) new molecules coded CDTH were generated and presenting values of the potential of inhibitory concentration higher than that of the base compound (pIC50 = 2.526). But thirteen (13) of these new compounds belong to the domain of applicability of the MLR model established previously. In addition, the thermodynamic quantities of formation formed at 298K have been calculated. Lipinski’s rule and pharmacokinetic properties proved that five (5) (TH4, TH9, TH10, TH13 and TH14) new molecules can be used as diabetes medicine.
