The effects of the solution treatment on the microstructure,recrystallization,texture composition and properties of 7A65-T7451(120 mm)hot rolled plates at H/2(1/2 thickness)and H/4(1/4 thickness)were studied.The resul...The effects of the solution treatment on the microstructure,recrystallization,texture composition and properties of 7A65-T7451(120 mm)hot rolled plates at H/2(1/2 thickness)and H/4(1/4 thickness)were studied.The results show that the hot rolled microstructure mainly contains a large amount of MgZn_(2) phases and minor Al_(7)Cu_(2)Fe phase.After solid solution treatments,a large amount of MgZn_(2) phases are dissolved back into the aluminum matrix.The main texture types at H/4 are R-Cube,Cube and part of Brass texture,and the main texture types at H/2 are Cube,R,and Copper texture.The qualitative analysis by Schmidt's law reveals that Copper texture at H/2 will deepen the anisotropy of plate metal properties.For the plate with the same thickness,the two-stage solution state has better mechanical properties due to the lower degree of recrystallization and stronger grain boundary strengthening effects.Under the two-stage solution system of 460℃/165 min+477℃/165 min,the composite mechanical properties of the alloy plate at H/4 are the best and the anisotropy is not obvious.The tensile strength,yield strength,and elongation along the rolling direction are 561.9 MPa,523.4 MPa,and 10.6%,respectively..展开更多
瑞萨科技日前开发出一款面向65nm工艺以上SoC（系统级芯片）混载用途的高密度内存“TTRAM（twin transistor RAM）”。旨在取代传统的SoC混载DRAM。TTRAM由2个在SOI（Silicon On Insulator）底板上形成内存单元的MOS晶体管构成。由于无...瑞萨科技日前开发出一款面向65nm工艺以上SoC（系统级芯片）混载用途的高密度内存“TTRAM（twin transistor RAM）”。旨在取代传统的SoC混载DRAM。TTRAM由2个在SOI（Silicon On Insulator）底板上形成内存单元的MOS晶体管构成。由于无需使用传统DRAM必备的电容器，所以采用65nm以上工艺仍可能继续增大密度。展开更多
文摘The effects of the solution treatment on the microstructure,recrystallization,texture composition and properties of 7A65-T7451(120 mm)hot rolled plates at H/2(1/2 thickness)and H/4(1/4 thickness)were studied.The results show that the hot rolled microstructure mainly contains a large amount of MgZn_(2) phases and minor Al_(7)Cu_(2)Fe phase.After solid solution treatments,a large amount of MgZn_(2) phases are dissolved back into the aluminum matrix.The main texture types at H/4 are R-Cube,Cube and part of Brass texture,and the main texture types at H/2 are Cube,R,and Copper texture.The qualitative analysis by Schmidt's law reveals that Copper texture at H/2 will deepen the anisotropy of plate metal properties.For the plate with the same thickness,the two-stage solution state has better mechanical properties due to the lower degree of recrystallization and stronger grain boundary strengthening effects.Under the two-stage solution system of 460℃/165 min+477℃/165 min,the composite mechanical properties of the alloy plate at H/4 are the best and the anisotropy is not obvious.The tensile strength,yield strength,and elongation along the rolling direction are 561.9 MPa,523.4 MPa,and 10.6%,respectively..
文摘瑞萨科技日前开发出一款面向65nm工艺以上SoC（系统级芯片）混载用途的高密度内存“TTRAM（twin transistor RAM）”。旨在取代传统的SoC混载DRAM。TTRAM由2个在SOI（Silicon On Insulator）底板上形成内存单元的MOS晶体管构成。由于无需使用传统DRAM必备的电容器，所以采用65nm以上工艺仍可能继续增大密度。
