提出了一种解决大高宽比 SU 8结构的新方法 .该方法是将 SU 8胶涂在一块掩模上 ,紫外光从掩模的背面照射 ,这样 SU 8胶的曝光将从底部开始 ,不需要进行过曝光来保证底部胶的曝光剂量 ,从而很容易控制曝光剂量和SU 8胶结构的内应力 .实...提出了一种解决大高宽比 SU 8结构的新方法 .该方法是将 SU 8胶涂在一块掩模上 ,紫外光从掩模的背面照射 ,这样 SU 8胶的曝光将从底部开始 ,不需要进行过曝光来保证底部胶的曝光剂量 ,从而很容易控制曝光剂量和SU 8胶结构的内应力 .实验结果表明 ,该方法能够得到高宽比为 32的 SU 8结构 ,而文献报道的 SU 8胶结构的高宽比最大仅为展开更多
Over the past few decades,polydimethylsiloxane(PDMS)has become the material of choice for a variety of microsystem applications,including microfluidics,imprint lithography,and soft microrobotics.For most of these appl...Over the past few decades,polydimethylsiloxane(PDMS)has become the material of choice for a variety of microsystem applications,including microfluidics,imprint lithography,and soft microrobotics.For most of these applications,PDMS is processed by replication molding;however,new applications would greatly benefit from the ability to pattern PDMS films using lithography and etching.Metal hardmasks,in conjunction with reactive ion etching(RIE),have been reported as a method for patterning PDMS;however,this approach suffers from a high surface roughness because of metal redeposition and limited etch thickness due to poor etch selectivity.We found that a combination of LOR and SU8 photoresists enables the patterning of thick PDMS layers by RIE without redeposition problems.We demonstrate the ability to etch 1.5-μm pillars in PDMS with a selectivity of 3.4.Furthermore,we use this process to lithographically process flexible fluidic microactuators without any manual transfer or cutting step.The actuator achieves a bidirectional rotation of 50°at a pressure of 200 kPa.This process provides a unique opportunity to scale down these actuators as well as other PDMS-based devices.展开更多
文摘提出了一种解决大高宽比 SU 8结构的新方法 .该方法是将 SU 8胶涂在一块掩模上 ,紫外光从掩模的背面照射 ,这样 SU 8胶的曝光将从底部开始 ,不需要进行过曝光来保证底部胶的曝光剂量 ,从而很容易控制曝光剂量和SU 8胶结构的内应力 .实验结果表明 ,该方法能够得到高宽比为 32的 SU 8结构 ,而文献报道的 SU 8胶结构的高宽比最大仅为
基金Supported by the National Natural Science Foundation of China(No.61474130 and No.51572172)the Scientific Development Project ofUniversity of Shanghai for Science and Technology(16KJFZ011)Chinese Academy of Sciences via Hundred Talents Program
基金BG is a Doctoral Fellow of the Research Foundation—Flanders(F.W.O.),Belgium.MDV acknowledges support from the ERC starting grant HIENA(no.337739).
文摘Over the past few decades,polydimethylsiloxane(PDMS)has become the material of choice for a variety of microsystem applications,including microfluidics,imprint lithography,and soft microrobotics.For most of these applications,PDMS is processed by replication molding;however,new applications would greatly benefit from the ability to pattern PDMS films using lithography and etching.Metal hardmasks,in conjunction with reactive ion etching(RIE),have been reported as a method for patterning PDMS;however,this approach suffers from a high surface roughness because of metal redeposition and limited etch thickness due to poor etch selectivity.We found that a combination of LOR and SU8 photoresists enables the patterning of thick PDMS layers by RIE without redeposition problems.We demonstrate the ability to etch 1.5-μm pillars in PDMS with a selectivity of 3.4.Furthermore,we use this process to lithographically process flexible fluidic microactuators without any manual transfer or cutting step.The actuator achieves a bidirectional rotation of 50°at a pressure of 200 kPa.This process provides a unique opportunity to scale down these actuators as well as other PDMS-based devices.
