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Improvements on high voltage capacity and high temperature performances of Si-based Schottky potential barrier diode 被引量:1
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作者 王永顺 芮丽 +2 位作者 安恒心 汪再兴 刘春娟 《Journal of Semiconductors》 EI CAS CSCD 2015年第2期116-119,共4页
In order to improve the reverse voltage capacity and low junction temperature characteristics of the traditional silicon-based Schottky diode,a Schottky diode with high reverse voltage capacity and high junction tempe... In order to improve the reverse voltage capacity and low junction temperature characteristics of the traditional silicon-based Schottky diode,a Schottky diode with high reverse voltage capacity and high junction temperature was fabricated using ion implantation,NiPt60 sputtering,silicide-forming and other major technologies on an N-type silicon epitaxial layer of 10.6-11.4μm and(2.2-2.4)×10^15 cm^-3 doping concentration.The measurement results show that the junction temperature of the Schottky diode fabricated can reach 175 °C,that is 50°C higher than that of the traditional one;the reverse voltage capacity VR can reach 112 V,that is 80 V higher than that of the traditional one;the leakage current is only 2μA and the forward conduction voltage drop is VF=0.71 V at forward current If =3 A. 展开更多
关键词 schottky potential barrier diode breakdown voltage I-V characteristics NiPt60 sputtering junction temperature
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