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Si(111)表面离子束辅助沉积对类金刚石薄膜结构影响的计算机模拟 被引量:1
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作者 郭德成 李双 +2 位作者 阎梦泽 赵艳春 李之杰 《内蒙古民族大学学报(自然科学版)》 2009年第3期256-258,277,共4页
本文选C2分子和Ar离子作为沉积源和辅助沉积粒子,采用分子动力学(MD)方法在Si(111)面上模拟研究了离子束辅助沉积(IBAD)类金刚石(DLC)膜的物理过程.重点讨论了C2分子和Ar离子的入射能量及到达比(Ar/C)对平均密度和sp3键含量的影响,并与S... 本文选C2分子和Ar离子作为沉积源和辅助沉积粒子,采用分子动力学(MD)方法在Si(111)面上模拟研究了离子束辅助沉积(IBAD)类金刚石(DLC)膜的物理过程.重点讨论了C2分子和Ar离子的入射能量及到达比(Ar/C)对平均密度和sp3键含量的影响,并与Si(001)-(2×1)表面生长类金刚石膜的结果进行比较.结果表明,到达比和入射能的改变,对薄膜结构的影响不同;Si(111)面上生长类金刚石膜,薄膜在衬底的附着力更强. 展开更多
关键词 类金刚石薄膜 si(111) 离子束辅助沉积 分子动力学模拟
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First-principles Study on Geometric and Electronic Structures of Si(111)-√7× √3-In Surface Reconstruction
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作者 商波 袁岚峰 杨金龙 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2012年第4期403-408,I0003,共7页
In order to determine the structures of Si(111)-√7 √3-In surfaces and to understand their electronic properties, we construct six models of both hexagonal and rectangular types and perform first-principles calcula... In order to determine the structures of Si(111)-√7 √3-In surfaces and to understand their electronic properties, we construct six models of both hexagonal and rectangular types and perform first-principles calculations. Their scanning tunneling microscopic images and work functions are simulated and compared with experimental results. In this way, the hex-H3' and rect-T1 models are identified as the experimental configurations for the hexagonal and rectangular types, respectively. The structural evolution mechanism of the In/Si(lll) surface with indium coverage around 1.0 monolayer is discussed. The 4×1 and -√7× √3 phases are suggested to have two different types of evolution mechanisms, consistent with experimental results. 展开更多
关键词 Surface reconstruction si111)-√7× √3In Density functional theory Scanning tunnueling microscopic image
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First-Principles Calculations of Atomic and Electronic Properties of Tl and In on Si(111)
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作者 戴宪起 赵建华 +2 位作者 孙永灿 危书义 卫国红 《Communications in Theoretical Physics》 SCIE CAS CSCD 2010年第9期545-550,共6页
The atomic and electronic structures of T1 and In on Si(111) surfaces are investigated using the firstprinciples total energy calculations. Total energy optimizations show that the energetically favored structure is... The atomic and electronic structures of T1 and In on Si(111) surfaces are investigated using the firstprinciples total energy calculations. Total energy optimizations show that the energetically favored structure is 1/3 ML T1 adsorbed at the T4 sites on Si(111) surfaces. The adsorption energy difference of one T1 adatom between (√3 × √3) and (1 × 1) is less than that of each In adatom. The DOS indicates that TI 6p and Si 3p electrons play a very important role in the formation of the surface states. It is concluded that the bonding of TI adatoms on Si(111) surfaces is mainly polar covalent, which is weaker than that of In on Si(111). So T1 atom is more easy to be migrated than In atom in the same external electric field and the structures of T1 on Si(111) is prone to switch between (√3 × √3) and (1 × 1). 展开更多
关键词 THALLIUM INDIUM silicon charge density adsorption first principles
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Si(111)Electrode/Electrolyte Interfacial Studied by in-situ Second Harmonic Generation
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作者 Cai-he Liu Rui-peng Bai +2 位作者 Yu Bai Yuan Guo Zhen Zhang 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2020年第5期554-560,I0078,共8页
Si(111)electrode has been widely used in electrochemical and photoelectrochemical studies.The potential dependent measurements of the second harmonic generation(SHG)were performed to study Si(111)electrode interface.A... Si(111)electrode has been widely used in electrochemical and photoelectrochemical studies.The potential dependent measurements of the second harmonic generation(SHG)were performed to study Si(111)electrode interface.At different azimuthal angles of the Si(111)and under different polarization combinations,the curve of the intensity of SHG with extern potential has a different form of line or parabola.Quantitative analysis showed that these differences in the potential-dependence can be explained by the isotropic and anisotropic contribution of the Si(111)electrode.The change in the isotropic and anisotropic contribution of the Si(111)electrode may be attributed to the increase in the doping concentration of Si(111)electrodes. 展开更多
关键词 Second harmonic generation si(111)electrode/electrolyte Doping density
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Simulation of Surfactant Effects on Growth of Semiconductor Hetero-Epitaxial Sb-Ge/Si(111)
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作者 吴黎黎 吴锋民 《Communications in Theoretical Physics》 SCIE CAS CSCD 2011年第12期1130-1134,共5页
A kinetic Monte Carlo simulation is performed in order to study the effect of Sb as a surfactant on the growth of Ge/Si(111).In our model the exchange mechanism between Ge and Sb atoms and the re-exchange mechanism in... A kinetic Monte Carlo simulation is performed in order to study the effect of Sb as a surfactant on the growth of Ge/Si(111).In our model the exchange mechanism between Ge and Sb atoms and the re-exchange mechanism in which the exchanged Ge adatom re-exchange with the lifted Sb atom to return to the surfactant layer,are considered. Our simulation shows the re-exchange process plays an important role on the growth mode transition in Ge/Sb/Si(111) system.The influences of the substrate temperature and the deposition rate on the growth of Ge/Sb/Si(111) system is discussed. 展开更多
关键词 growth mode SURFACTANT re-exchange Monte Carlo simulation
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