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Evolution of Self-Organized Ge Quantum Dots During Ultra High Vacuum Annealing
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作者 胡冬枝 杨建树 +3 位作者 蔡群 张翔九 胡际璜 蒋最敏 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第6期561-564,共4页
The evolution of self organized Ge quantum dots structure is investigated by scanning tunneling microscopy and atomic force microscopy during annealing treatment up to 700℃ in an ultra high vacuum(UHV) system.When t... The evolution of self organized Ge quantum dots structure is investigated by scanning tunneling microscopy and atomic force microscopy during annealing treatment up to 700℃ in an ultra high vacuum(UHV) system.When the sample temperature rises to 630℃,a great amount of new dots emerge on the wetting layer,which are believed to be incoherent islands compared with the dislocation free coherent islands formed during molecular beam epitaxy growth. 展开更多
关键词 quantum dots si based materials evolution of morphology atomic force microscopy
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