The free carrier density and mobility in n-type 4H-SiC substrates and epilayers were determined by accurately analysing the frequency shift and the full-shape of the longitudinal optic phono-plasmon coupled （LOPC） m...The free carrier density and mobility in n-type 4H-SiC substrates and epilayers were determined by accurately analysing the frequency shift and the full-shape of the longitudinal optic phono-plasmon coupled （LOPC） modes, and compared with those determined by Hall-effect measurement and that provided by the vendors. The transport properties of thick and thin 4H-SiC epilayers grown in both vertical and horizontal reactors were also studied. The free carrier density ranges between 2× 10^18 cm^-3 and 8× 10^18 cm^-3with a carrier mobility of 30-55 cm2/（V.s） for ntype 4H-SiC substrates and 1× 10^16 -3× 10^16 cm^-3 with mobility of 290-490 cm2/（V.s） for both thick and thin 4H-SiC epilayers grown in a horizontal reactor, while thick 4H-SiC epilayers grown in vertical reactor have a slightly higher carrier concentration of around 8.1×10^16 cm^-3 with mobility of 380 cm2/（V.s）. It was shown that Raman spectroscopy is a potential technique for determining the transport properties of 4H-SiC wafers with the advantage of being able to probe very small volumes and also being non-destructive. This is especially useful for future mass production of 4H-SiC epi-wafers.展开更多
According to the one-dimensional quantum state distribution, carrier scattering, and fixed range hopping model, the structural stability and electron transport properties of N-, P-, and As-doped SiC nanowires(N-SiCNWs...According to the one-dimensional quantum state distribution, carrier scattering, and fixed range hopping model, the structural stability and electron transport properties of N-, P-, and As-doped SiC nanowires(N-SiCNWs, P-SiCNWs, and As-SiCNWs) are simulated by using the first principles calculations. The results show that the lattice structure of NSiCNWs is the most stable in the lattice structures of the above three kinds of doped SiCNWs. At room temperature,for unpassivated SiCNWs, the doping effect of P and As are better than that of N. After passivation, the conductivities of all doped SiCNWs increase by approximately two orders of magnitude. The N-SiCNW has the lowest conductivity. In addition, the N-, P-, As-doped SiCNWs before and after passivation have the same conductivity–temperature characteristics,that is, above room temperature, the conductivity values of the doped SiCNWs all increase with temperature increasing.These results contribute to the electronic application of nanodevices.展开更多
Two comparative models taking into account of momentum, energy and mass transport coupled with chemical reaction kinetics were proposed to simulate gas transport in isothermal CVI reactor for fabrication of C/SiC comp...Two comparative models taking into account of momentum, energy and mass transport coupled with chemical reaction kinetics were proposed to simulate gas transport in isothermal CVI reactor for fabrication of C/SiC composites. Convection in preform was neglected in one model where momentum transport in preform is neglected and mass transport in preform is dominated by diffusion. Whereas convection in preform was taken into account in the other model where momentum transport in preform is represented by BRINKMAN equations and mass transport in preform includes both diffusion and convection. The integrated models were solved by finite element method. The calculation results show that convection in preform have negligible effect on both velocity distribution and concentration distribution. The difference between MTS molarities in preform of the two models is less than 5×10-5, which indicates that ignorance of convection in preform is reasonable and acceptable for numerical simulation of ICVI process of C/SiC composites.展开更多
采用物理气相传输法在(0001)面偏向<11-20>方向4°的籽晶上生长了掺氮低电阻率碳化硅(SiC)单晶。结合碳化硅邻位面生长机制,通过优化温场设计,在近平温场下生长出了晶型稳定、微管密度低、高结晶质量的低电阻率4H-SiC单晶。...采用物理气相传输法在(0001)面偏向<11-20>方向4°的籽晶上生长了掺氮低电阻率碳化硅(SiC)单晶。结合碳化硅邻位面生长机制,通过优化温场设计,在近平温场下生长出了晶型稳定、微管密度低、高结晶质量的低电阻率4H-SiC单晶。在加工的"epi-ready"SiC衬底上进行了同质外延,获得了光滑的外延层表面。利用该外延材料研制了600V/10 A SiC肖特基二极管,器件的直流性能与进口衬底结果相当,反向漏电成品率高达67%。另外研制了600 V/50 A SiC肖特基二极管,器件的直流性能也达到了进口衬底水平。展开更多
Silicon carbide (SiC) single crystal,which hasn’t melting point at normal pressu r e and sublimates at temperature above 2000℃,is a wide bandgap semiconductor.Si lic on carbide has more than 200 kinds of polytype.Am...Silicon carbide (SiC) single crystal,which hasn’t melting point at normal pressu r e and sublimates at temperature above 2000℃,is a wide bandgap semiconductor.Si lic on carbide has more than 200 kinds of polytype.Among these polytypes,3C SiC、6H SiC and 4H SiC are the most common ones,the band width of them are 2.4eV,3.0eV , an d 3.4eV,restpectively.For its high temperature tolerance and radiation resistanc e,silicon carbide semiconductor can be extensively used to fabricate the power d evi ces and electroluminescence devices operating at high power,high frequency and high radiation environments. The aim of this paper is to introduce our research results of the growth of larg e SiC single crystals by physical vapor transport method.The seed is SiC single crystal wafer with perfect (0001)Si face,which is chosen from the furnace growi ng the green abrasive material of SiC in industry.The source is green powder of SiC .The seed and the source are placed into the graphite crucible of a graphite res i stively heated vacuum furnace.The growth chamber is filled with the atmosphere o f pure araon.When the temperature of source rises to 2300℃,the crystal growth p ro ceeds.The rate of crystal growth is dependent on the growth temperature,the pres sure in furnace and the temperature gradient and distance between the seed and t h e source.Under the controlled growth conditions,the bulk SiC crystal with a diam eter of 40mm and a thickness of 15mm is obtained.The crystal appears to be n type electrical conductivity,the results of X ray Laue photography analysis indicat e that it is 6H SiC polytype.The defects of the crystal are also studied by many kinds of method.展开更多
Two-dimensional silicon carbide（2d-SiC） is a viable material for next generation electronics due to its moderate,direct bandgap with huge potential.In particular,its potential for p–n junctions is yet to be explore...Two-dimensional silicon carbide（2d-SiC） is a viable material for next generation electronics due to its moderate,direct bandgap with huge potential.In particular,its potential for p–n junctions is yet to be explored.In this paper,three types of 2d-SiC-based p–n junctions with different doping configuration are modeled.The doping configurations refer to partially replacing carbon with boron or nitrogen atoms along the zigzag or armchair direction,respectively.By employing density functional theory,we calculate the transport properties of the SiC based p–n junctions and obtain negative differential resistance and high rectification ratio.We also find that the junction along the zigzag direction with lower doping density exhibits optimized rectification performance.Our study suggests that 2d-SiC is a promising candidate as a material platform for future nano-devices.展开更多
基金supported by the National Natural Science Foundation of China (Grant No. 60876003)the Knowledge Innovation Project of Chinese Academy of Sciences (Grant Nos. Y072011000 and ISCAS2008T04)the Science and Technology Projects of the State Grid Corporation of China (ZL71-09-001)
文摘The free carrier density and mobility in n-type 4H-SiC substrates and epilayers were determined by accurately analysing the frequency shift and the full-shape of the longitudinal optic phono-plasmon coupled （LOPC） modes, and compared with those determined by Hall-effect measurement and that provided by the vendors. The transport properties of thick and thin 4H-SiC epilayers grown in both vertical and horizontal reactors were also studied. The free carrier density ranges between 2× 10^18 cm^-3 and 8× 10^18 cm^-3with a carrier mobility of 30-55 cm2/（V.s） for ntype 4H-SiC substrates and 1× 10^16 -3× 10^16 cm^-3 with mobility of 290-490 cm2/（V.s） for both thick and thin 4H-SiC epilayers grown in a horizontal reactor, while thick 4H-SiC epilayers grown in vertical reactor have a slightly higher carrier concentration of around 8.1×10^16 cm^-3 with mobility of 380 cm2/（V.s）. It was shown that Raman spectroscopy is a potential technique for determining the transport properties of 4H-SiC wafers with the advantage of being able to probe very small volumes and also being non-destructive. This is especially useful for future mass production of 4H-SiC epi-wafers.
基金Project supported by the National Natural Science Foundation of China(Grant No.11574261)the Natural Science Foundation of Hebei Province,China(Grant No.A2015203261)。
文摘According to the one-dimensional quantum state distribution, carrier scattering, and fixed range hopping model, the structural stability and electron transport properties of N-, P-, and As-doped SiC nanowires(N-SiCNWs, P-SiCNWs, and As-SiCNWs) are simulated by using the first principles calculations. The results show that the lattice structure of NSiCNWs is the most stable in the lattice structures of the above three kinds of doped SiCNWs. At room temperature,for unpassivated SiCNWs, the doping effect of P and As are better than that of N. After passivation, the conductivities of all doped SiCNWs increase by approximately two orders of magnitude. The N-SiCNW has the lowest conductivity. In addition, the N-, P-, As-doped SiCNWs before and after passivation have the same conductivity–temperature characteristics,that is, above room temperature, the conductivity values of the doped SiCNWs all increase with temperature increasing.These results contribute to the electronic application of nanodevices.
基金Project(90405015) supported by the National Natural Science Foundation of China Project(50425208) supported by the National Young Elitists Foundation of China Project([2005]33) supported by Program for Changjiang Scholars and Innovative Research Team in University of China
文摘Two comparative models taking into account of momentum, energy and mass transport coupled with chemical reaction kinetics were proposed to simulate gas transport in isothermal CVI reactor for fabrication of C/SiC composites. Convection in preform was neglected in one model where momentum transport in preform is neglected and mass transport in preform is dominated by diffusion. Whereas convection in preform was taken into account in the other model where momentum transport in preform is represented by BRINKMAN equations and mass transport in preform includes both diffusion and convection. The integrated models were solved by finite element method. The calculation results show that convection in preform have negligible effect on both velocity distribution and concentration distribution. The difference between MTS molarities in preform of the two models is less than 5×10-5, which indicates that ignorance of convection in preform is reasonable and acceptable for numerical simulation of ICVI process of C/SiC composites.
文摘采用物理气相传输法在(0001)面偏向<11-20>方向4°的籽晶上生长了掺氮低电阻率碳化硅(SiC)单晶。结合碳化硅邻位面生长机制,通过优化温场设计,在近平温场下生长出了晶型稳定、微管密度低、高结晶质量的低电阻率4H-SiC单晶。在加工的"epi-ready"SiC衬底上进行了同质外延,获得了光滑的外延层表面。利用该外延材料研制了600V/10 A SiC肖特基二极管,器件的直流性能与进口衬底结果相当,反向漏电成品率高达67%。另外研制了600 V/50 A SiC肖特基二极管,器件的直流性能也达到了进口衬底水平。
文摘Silicon carbide (SiC) single crystal,which hasn’t melting point at normal pressu r e and sublimates at temperature above 2000℃,is a wide bandgap semiconductor.Si lic on carbide has more than 200 kinds of polytype.Among these polytypes,3C SiC、6H SiC and 4H SiC are the most common ones,the band width of them are 2.4eV,3.0eV , an d 3.4eV,restpectively.For its high temperature tolerance and radiation resistanc e,silicon carbide semiconductor can be extensively used to fabricate the power d evi ces and electroluminescence devices operating at high power,high frequency and high radiation environments. The aim of this paper is to introduce our research results of the growth of larg e SiC single crystals by physical vapor transport method.The seed is SiC single crystal wafer with perfect (0001)Si face,which is chosen from the furnace growi ng the green abrasive material of SiC in industry.The source is green powder of SiC .The seed and the source are placed into the graphite crucible of a graphite res i stively heated vacuum furnace.The growth chamber is filled with the atmosphere o f pure araon.When the temperature of source rises to 2300℃,the crystal growth p ro ceeds.The rate of crystal growth is dependent on the growth temperature,the pres sure in furnace and the temperature gradient and distance between the seed and t h e source.Under the controlled growth conditions,the bulk SiC crystal with a diam eter of 40mm and a thickness of 15mm is obtained.The crystal appears to be n type electrical conductivity,the results of X ray Laue photography analysis indicat e that it is 6H SiC polytype.The defects of the crystal are also studied by many kinds of method.
基金Project supported by the National Science Foundation of China(Nos.61474099,61674127)the ZJ-NSF(No.Z17F04003)
文摘Two-dimensional silicon carbide（2d-SiC） is a viable material for next generation electronics due to its moderate,direct bandgap with huge potential.In particular,its potential for p–n junctions is yet to be explored.In this paper,three types of 2d-SiC-based p–n junctions with different doping configuration are modeled.The doping configurations refer to partially replacing carbon with boron or nitrogen atoms along the zigzag or armchair direction,respectively.By employing density functional theory,we calculate the transport properties of the SiC based p–n junctions and obtain negative differential resistance and high rectification ratio.We also find that the junction along the zigzag direction with lower doping density exhibits optimized rectification performance.Our study suggests that 2d-SiC is a promising candidate as a material platform for future nano-devices.
