XRD, Raman, TEM, and N2-adsorption were utilized to characterize CeO2/SiO2 prepared by coprecipi-tation and surfactant-assisted method. The results show that nanocrystalline CeO2 can be uniformly supported on the surf...XRD, Raman, TEM, and N2-adsorption were utilized to characterize CeO2/SiO2 prepared by coprecipi-tation and surfactant-assisted method. The results show that nanocrystalline CeO2 can be uniformly supported on the surface of SiO2 particles, when the molar ratio of Si4+/(Ce3++Si4+) is less than 35% in coprecipitation samples. At higher Si content, the surface of SiO2 can not be fully covered by CeO2. With surfactant (CTAB) added, the u-iformly supported structure can even exist when the molar ratio of Si4+/(Ce3++Si4+) is as high as 53%. It is because Ce and Si complexes can be well dispersed in precursor solution in present of CTAB. However, the uniformly supported structure can not be synthesised through surfactant-assisted approch for its hydrothermal threatment, which can easily lead to separate aggregation of nanocrystalline CeO2 and SiO2 particles.展开更多
文摘XRD, Raman, TEM, and N2-adsorption were utilized to characterize CeO2/SiO2 prepared by coprecipi-tation and surfactant-assisted method. The results show that nanocrystalline CeO2 can be uniformly supported on the surface of SiO2 particles, when the molar ratio of Si4+/(Ce3++Si4+) is less than 35% in coprecipitation samples. At higher Si content, the surface of SiO2 can not be fully covered by CeO2. With surfactant (CTAB) added, the u-iformly supported structure can even exist when the molar ratio of Si4+/(Ce3++Si4+) is as high as 53%. It is because Ce and Si complexes can be well dispersed in precursor solution in present of CTAB. However, the uniformly supported structure can not be synthesised through surfactant-assisted approch for its hydrothermal threatment, which can easily lead to separate aggregation of nanocrystalline CeO2 and SiO2 particles.
