Silica is one of the most commonly used materials for dielectric layer in organic thin-film transistors due to its excellent stability, excellent electrical properties, mature preparation process, and good compatibili...Silica is one of the most commonly used materials for dielectric layer in organic thin-film transistors due to its excellent stability, excellent electrical properties, mature preparation process, and good compatibility with organic semiconductors. However, most of conventional preparation methods for silica film are generally performed at high temperature and/or high vacuum. In this paper, we introduce a simple solution spin-coating method to fabricate silica thin film from precursor route, which possesses a low leakage current, high capacitance, and low surface roughness. The silica thin film can be produced in the condition of low temperature and atmospheric environment. To meet various demands, the thickness of film can be adjusted by means of preparation conditions such as the speed of spin-coating and the concentration of solution. The p-type and n-type organic field effect transistors fabricated by using this film as gate electrodes exhibit excellent electrical performance including low voltage and high performance. This method shows great potential for industrialization owing to its characteristic of low consumption and energy saving, time-saving and easy to operate.展开更多
SiO_2/TiO_2/methylcellulose composite materials processed by the sol-gel technique were studied for optical waveguide applications. With the help of methylcellulose, an organic binder, SiO2/TiO2/methylcellulose hybrid...SiO_2/TiO_2/methylcellulose composite materials processed by the sol-gel technique were studied for optical waveguide applications. With the help of methylcellulose, an organic binder, SiO2/TiO2/methylcellulose hybrid thick films were prepared by a single spin-coating processes. After annealing at 70 °C for an hour, 2.5-μm crack-free and dense organic-inorganic hybrid optical films with a refractive index of 1.537 were achieved. Optical losses of plane waveguide made up of those films and ordinary slide glass substrate are around 0.3 dB/cm at 650 nm. Scanning electronmicroscopy (SEM) and UV-visible spectroscopy (UV-VIS), have been used to characterize the thick films.展开更多
基金the National Natural Science Foundation of China (Nos. 21573277, 51503221)National Key Research and Development Program (No. 2016YFA0200700)+2 种基金Key Research Program of Frontier Sciences of Chinese Academy of Sciences (No. QYZDB-SSW-SLH031)Natural Sciences Foundation of Jiangsu Province (No. BK20150368),Natural Science Foundation of Inner Mongolia of China (No. 2014JQ02)
文摘Silica is one of the most commonly used materials for dielectric layer in organic thin-film transistors due to its excellent stability, excellent electrical properties, mature preparation process, and good compatibility with organic semiconductors. However, most of conventional preparation methods for silica film are generally performed at high temperature and/or high vacuum. In this paper, we introduce a simple solution spin-coating method to fabricate silica thin film from precursor route, which possesses a low leakage current, high capacitance, and low surface roughness. The silica thin film can be produced in the condition of low temperature and atmospheric environment. To meet various demands, the thickness of film can be adjusted by means of preparation conditions such as the speed of spin-coating and the concentration of solution. The p-type and n-type organic field effect transistors fabricated by using this film as gate electrodes exhibit excellent electrical performance including low voltage and high performance. This method shows great potential for industrialization owing to its characteristic of low consumption and energy saving, time-saving and easy to operate.
基金This work was supported by the National Natu- ral Science Foundation of China (No. 90206002 and 90201013)the National "863" Project of China (No. 2002AA313030).
文摘SiO_2/TiO_2/methylcellulose composite materials processed by the sol-gel technique were studied for optical waveguide applications. With the help of methylcellulose, an organic binder, SiO2/TiO2/methylcellulose hybrid thick films were prepared by a single spin-coating processes. After annealing at 70 °C for an hour, 2.5-μm crack-free and dense organic-inorganic hybrid optical films with a refractive index of 1.537 were achieved. Optical losses of plane waveguide made up of those films and ordinary slide glass substrate are around 0.3 dB/cm at 650 nm. Scanning electronmicroscopy (SEM) and UV-visible spectroscopy (UV-VIS), have been used to characterize the thick films.
