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High-voltage 4H-SiC PiN diodes with the etched implant junction termination extension 被引量:2
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作者 Juntao Li Chengquan Xiao +6 位作者 Xingliang Xu Gang Dai Lin Zhang Yang Zhou An Xiang Yingkun Yang Jian Zhang 《Journal of Semiconductors》 EI CAS CSCD 2017年第2期47-50,共4页
This paper presents the design and fabrication of an etched implant junction termination extension(JTE)for high-voltage 4H-SiC PiN diodes. Unlike the conventional JTE structure, the proposed structure utilizes multi... This paper presents the design and fabrication of an etched implant junction termination extension(JTE)for high-voltage 4H-SiC PiN diodes. Unlike the conventional JTE structure, the proposed structure utilizes multiple etching steps to achieve the optimum JTE concentration range. The simulation results show that the etched implant JTE method can improve the blocking voltage of SiC PiN diodes and also provides broad process latitude for parameter variations, such as implantation dose and activation annealing condition. The fabricated SiC PiN diodes with the etched implant JTE exhibit a highest blocking voltage of 4.5 kV and the forward on-state voltage of 4.6 V at room temperature. These results are of interest for understanding the etched implant method in the fabrication of high-voltage power devices. 展开更多
关键词 silicon carbide PiN diode etched implant junction termination extension blocking voltage
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