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Rain Erosion Behavior of Silicon Dioxide Films Prepared on Sapphire 被引量:2
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作者 Liping FENG+, Zhengtang LIU and Wenting LIU Laboratory of Functional Materials, College of Materials Science and Engineering, Northwestern Polytechnical University, Xi’an710072, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2005年第6期883-886,共4页
Silicon dioxide (SiO2) films were prepared on sapphire (α-Al2O3) by radio frequency magnetron reactive sputtering in order to increase both transmission and rain erosion resistant performance of infrared domes of... Silicon dioxide (SiO2) films were prepared on sapphire (α-Al2O3) by radio frequency magnetron reactive sputtering in order to increase both transmission and rain erosion resistant performance of infrared domes of sapphire. Composition and structure of SiO2 films were analyzed by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The transmittance of uncoated and coated sapphire was measured using a Fourier transform infrared (FTIR) spectrometer. Rain erosion tests of the uncoated and coated sapphire were performed at 211 m/s impact velocity with an exposure time ranging from 1 to 8 min on a whirling arm rig. Results show that the deposited films can greatly increase the transmission of sapphire in mid-wave IR. After rain erosion test, decreases in normalized transmission were less than 1% for designed SiO2 films and the SiO2 coating was strongly bonded to the sapphire substrate. In addition, sapphires coated with SiO2 films had a higher transmittance than uncoated ones after rain erosion. 展开更多
关键词 silicon dioxide films SAPPHIRE Magnetron reactive sputtering Rain erosion
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Exploration of photosensitive polyimide as the modification layer in thin film microcircuit 被引量:1
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作者 Lily Liu Changbin Song +3 位作者 Bin Xue Jing Li Junxi Wang Jinmin Li 《Journal of Semiconductors》 EI CAS CSCD 2018年第2期74-77,共4页
Positive type photosensitive polyimide is used as the modification layer in the thin film transistors production process. The photosensitive polyimide is not only used as the second insulating layer, it can also be us... Positive type photosensitive polyimide is used as the modification layer in the thin film transistors production process. The photosensitive polyimide is not only used as the second insulating layer, it can also be used instead of a mask because of the photosensitivity. A suitable curing condition can help photosensitive polyimide form the high performance polyimide with orderly texture inside, and the performance of imidization depends on the precise control of temperature, time, and heat control during the curing process. Therefore, experiments of different stepped up heating tests are made, and the ability of protecting silicon dioxide is analyzed. 展开更多
关键词 thin film microcircuit photosensitive polyimide silicon dioxide imidization temperature
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