期刊文献+
共找到4篇文章
< 1 >
每页显示 20 50 100
Drop failure modes of Sn-3.0Ag-0.5Cu solder joints in wafer level chip scale package 被引量:5
1
作者 黄明亮 赵宁 +1 位作者 刘爽 何宜谦 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1663-1669,共7页
To reveal the drop failure modes of the wafer level chip scale packages (WLCSPs) with Sn-3.0Ag-0.5Cu solder joints, board level drop tests were performed according to the JEDEC standard. Six failure modes were iden... To reveal the drop failure modes of the wafer level chip scale packages (WLCSPs) with Sn-3.0Ag-0.5Cu solder joints, board level drop tests were performed according to the JEDEC standard. Six failure modes were identified, i.e., short FR-4 cracks and complete FR-4 cracks at the printing circuit board (PCB) side, split between redistribution layer (RDL) and Cu under bump metallization (UBM), RDL fracture, bulk cracks and partial bulk and intermetallic compound (IMC) cracks at the chip side. For the outmost solder joints, complete FR-4 cracks tended to occur, due to large deformation of PCB and low strength of FR-4 dielectric layer. The formation of complete FR-4 cracks largely absorbed the impact energy, resulting in the absence of other failure modes. For the inner solder joints, the absorption of impact energy by the short FR-4 cracks was limited, resulting in other failure modes at the chip side. 展开更多
关键词 sn-3.0ag-0.5Cu wafer level chip scale package solder joint drop failure mode
下载PDF
Bi掺杂对Sn-3.0Ag-0.5Cu钎料电化学腐蚀性能及枝晶生长的影响 被引量:3
2
作者 华丽 郭兴蓬 杨家宽 《中国有色金属学报》 EI CAS CSCD 北大核心 2012年第1期150-157,共8页
采用动电位扫描和交流阻抗等方法研究Bi掺杂对Sn-3.0Ag-0.5Cu钎料在3.5%NaCl(质量分数)溶液中电化学腐蚀性能及枝晶生长的影响;采用SEM和XRD技术分析其腐蚀形貌及成分。结果显示:随着Bi含量增加,腐蚀电流密度增大,但自腐蚀电位不呈规律... 采用动电位扫描和交流阻抗等方法研究Bi掺杂对Sn-3.0Ag-0.5Cu钎料在3.5%NaCl(质量分数)溶液中电化学腐蚀性能及枝晶生长的影响;采用SEM和XRD技术分析其腐蚀形貌及成分。结果显示:随着Bi含量增加,腐蚀电流密度增大,但自腐蚀电位不呈规律性变化。阻抗谱显示:掺杂前后阻抗谱特征相同,均可用两个时间常数的等效电路模型表示,其拟合误差<5%。随着Bi含量的增加,容抗弧半径减小,电荷传递电阻和腐蚀产物膜电阻均减小,耐蚀性能降低。SEM像显示,Bi掺杂对钎料在介质中电化学迁移速度有减缓作用,因而对迁移所致的枝晶生长具有抑制作用。XRD谱显示,枝晶主要成分为Sn和Cu6Sn5,同时伴有少量的Bi和Ag3Sn。 展开更多
关键词 sn-3.0ag-0.5Cu钎料 bi掺杂 腐蚀行为 枝晶生长 抑制作用
下载PDF
Effect of adding Ce on interfacial reactions between Sn-3.0Ag-0.5Cu solder and Cu substrate 被引量:3
3
作者 卢斌 栗慧 +2 位作者 王娟辉 朱华伟 焦羡贺 《Journal of Central South University of Technology》 EI 2008年第3期313-317,共5页
The formation and the growth of Cu-Sn intermetallic compound (IMC) layer at the interface between Sn-3.0Ag-0.5Cu-xCe solder and Cu substrate during soldering and aging were studied. The results show that Cu6Sn5 IMC is... The formation and the growth of Cu-Sn intermetallic compound (IMC) layer at the interface between Sn-3.0Ag-0.5Cu-xCe solder and Cu substrate during soldering and aging were studied. The results show that Cu6Sn5 IMC is observed at the interface between solder and Cu substrate in all conditions. After aging for 120 h,the Cu3Sn IMC is then obtained. With increasing aging time,the scalloped Cu6Sn5 structure changes to a plate structure. The Cu3Sn film always forms with a relatively planar interface. By adding a small amount of the rare earth element Ce (only 0.1%,mass fraction) into the Sn-3.0Ag-0.5Cu solder alloy,the growth rate of the Cu-Sn IMC at the interface of solder alloy system is decreased. When the time exponent is approximately 0.5,the growth of the IMC layer is mainly controlled by a diffusion over the studied time range. 展开更多
关键词 intermetallic compound INTERFACE sn-3.0ag-0.5Cu solder rare earth element
下载PDF
钎焊时间对镀镍SiC_P/Al复合材料界面IMC生长的影响
4
作者 徐冬霞 范晓杰 +3 位作者 许国星 丁连征 陈思杰 牛济泰 《焊接学报》 EI CAS CSCD 北大核心 2018年第7期125-128,共4页
采用Sn-3.0Ag-0.5Cu-3.0Bi钎料对镀镍60%和镀镍15%Si CP/6063Al复合材料之间进行真空钎焊.采用SEM,XRD对接头界面微观组织和成分进行分析.结果表明,在钎焊过程中,钎料与镍层发生界面反应生成了连续的扇贝状金属间化合物(IMC),其具体成分... 采用Sn-3.0Ag-0.5Cu-3.0Bi钎料对镀镍60%和镀镍15%Si CP/6063Al复合材料之间进行真空钎焊.采用SEM,XRD对接头界面微观组织和成分进行分析.结果表明,在钎焊过程中,钎料与镍层发生界面反应生成了连续的扇贝状金属间化合物(IMC),其具体成分为(Cu,Ni)6Sn5;该IMC层排列紧凑,生长方向都垂直于界面指向钎料的内部;在钎焊过程中,IMC的生长分为生长速率较快和生长速率较缓慢两个阶段.在270℃,钎焊时间由10 min延长至40 min时,界面IMC层扇贝状形貌不变,晶粒尺寸变大;IMC层厚度增加,但是其厚度增长速率逐渐降低;钎焊接头抗剪强度不断增大. 展开更多
关键词 sn-3.0ag-0.5cu-3.0bi钎料 SiCP/6063Al复合材料 真空钎焊 金属间化合物 抗剪强度
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部