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XPS Study of Electroless Deposited Sb2Se3 Thin Films for Solar Cell Absorber Material
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作者 Towhid Adnan Chowdhury 《Energy and Power Engineering》 2023年第11期363-371,共9页
As a thin film solar cell absorber material, antimony selenide (Sb<sub>2</sub>Se<sub>3</sub>) has become a potential candidate recently because of its unique optical and electrical properties a... As a thin film solar cell absorber material, antimony selenide (Sb<sub>2</sub>Se<sub>3</sub>) has become a potential candidate recently because of its unique optical and electrical properties and easy fabrication method. X-ray photoelectron spectroscopy (XPS) was used to determine the stoichiometry and composition of electroless Sb<sub>2</sub>Se<sub>3</sub> thin films using depth profile studies. The surface layers were analyzed nearly stoichiometric. But the abundant amount of antimony makes the inner layer electrically more conductive. 展开更多
关键词 sb2Se3 ELECTROLESS Depth Profiling Thin film X-Ray Photoelectron Spectroscopy
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Depth Profile Study of Electroless Deposited Sb2S3 Thin Films Using XPS for Photovoltaic Applications
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作者 Towhid Adnan Chowdhury 《Materials Sciences and Applications》 2023年第7期397-406,共10页
Sb<sub>2</sub>S<sub>3</sub> has gained tremendous research recently for thin film solar cell absorber material because of their easy synthesis, unique electrical and optical properties. The sto... Sb<sub>2</sub>S<sub>3</sub> has gained tremendous research recently for thin film solar cell absorber material because of their easy synthesis, unique electrical and optical properties. The stoichiometry and composition of electroless Sb<sub>2</sub>S<sub>3</sub> thin films were analyzed using XPS depth profile studies. The surface layers were found nearly stoichiometric. On the other hand, the inner layer was rich in antimony composition making it more conductive electrically. 展开更多
关键词 sb2S3 Depth Profiling X-Ray Photoelectron Spectroscopy Thin film ELECTROLESS
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Preparation and Characterization of CeO_2-TiO_2/SnO_2:Sb Films Deposited on Glass Substrates by R.F.Sputtering 被引量:6
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作者 ZHAO Qingnan DONG Yuhong NI Jiamiao WANG Peng ZHAO Xiujian 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2008年第4期443-447,共5页
CeO2-TiO2 films and CeO2-TiO/SnO2:Sb (6 mol%) double films were deposited on glass substrates by radio-frequency magnetron sputtering (R.F. Sputtering), using SnO2:Sb(6 mol%) target, and CeO2- TiO2 targets wit... CeO2-TiO2 films and CeO2-TiO/SnO2:Sb (6 mol%) double films were deposited on glass substrates by radio-frequency magnetron sputtering (R.F. Sputtering), using SnO2:Sb(6 mol%) target, and CeO2- TiO2 targets with different molar ratio of CeO2 to TiO2 (CeO2:TiO2-0:1.0; 0.1:0.9; 0.2:0.8; 0.3:0.7; 0.4:0.6; 0.5:0.5; 0.6:0.4; 0.7:0.3; 0.8:0.2; 0.9:0.1; 1.0:0). The films are characterized by UV-visible transmission and infrared reflection spectra, scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The obtained results show that the amorphous phases composed of CeO2-TiO2 play an important role in absorbing UV, there are Ce^3-, Ce^4- and Ti^4- on the surface of the films; the glass substrates coated with CeO2-TiO2 (Ce/Ti=0.5:0.5; 0.6:0.4)/SnO2:Sb(6 mol%) double films show high absorbing UV(〉99), high visible light transmission (75%) and good infrared reflection (〉70%). The sheet resistance of the films is 30-50 Ω/□. The glass substrates coated with the double functional films can be used as window glass of buildings, automobile and so on. 展开更多
关键词 coating glass CeO2-TiO/sno2:sb double thin films absorbing UV IR reflection R.F. sputterin
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基于SnO_(2)∶Sb薄膜沉积工艺参数优化的支持向量回归分析
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作者 陈远豪 肖黎 +2 位作者 梁昌兴 罗月婷 龚恒翔 《材料导报》 CSCD 北大核心 2023年第11期33-38,共6页
开发低成本高质量透明导电氧化物薄膜材料的生长技术对现代光电产业发展十分重要。面对多维的薄膜生长工艺参数空间,在寻求最优薄膜生长参数过程中如何有效降低时间、材料成本是研究人员迫切关注的问题。基于雾化辅助CVD法在石英衬底上... 开发低成本高质量透明导电氧化物薄膜材料的生长技术对现代光电产业发展十分重要。面对多维的薄膜生长工艺参数空间,在寻求最优薄膜生长参数过程中如何有效降低时间、材料成本是研究人员迫切关注的问题。基于雾化辅助CVD法在石英衬底上制备SnO_(2)∶Sb薄膜,利用实验设计方法,获得不同工艺参数下制备的SnO_(2)∶Sb薄膜实验数据集。应用基于贝叶斯优化的支持向量回归方法,建立SnO_(2)∶Sb薄膜透明导电性能的支持向量回归预测模型,结合预测模型对整个工艺参数空间进行探索。利用有限27组工艺参数组合可在四维参数空间中找到高质量SnO_(2)∶Sb薄膜的有效制备参数。在最优工艺参数下制备薄膜的可见光透过率可达86.61%,方块电阻为21.1Ω·□^(-1),膜厚约380 nm。为基于雾化辅助CVD法制备薄膜材料的最优制备工艺探索提供一条有效途径,可有效节约开发成本。 展开更多
关键词 支持向量回归 sno_(2) sb薄膜 工艺参数优化 雾化辅助CVD
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Optimization of Gas Sensing Performance of Nanocrystalline SnO_2 Thin Films Synthesized by Magnetron Sputtering 被引量:1
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作者 N.Panahi M.T.Hosseinnejad +1 位作者 M.Shirazi M.Ghoranneviss 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第6期99-103,共5页
Tin oxide (SnO2) is one of the most promising transparent conducting oxide materials, which is widely used in thin film gas sensors. We investigate the dependence of the deposition time on structural, morphologicaJ ... Tin oxide (SnO2) is one of the most promising transparent conducting oxide materials, which is widely used in thin film gas sensors. We investigate the dependence of the deposition time on structural, morphologicaJ and hydrogen gas sensing properties of SnO2 thin films synthesized by dc magnetron sputtering. The deposited samples are characterized by XRD, SEM, AFM, surface area measurements and surface profiler. Also the H2 gas sensing properties of SnO2 deposited samples are performed against a wide range of operating temperature. The XRD analysis demonstrates that the degree of crystallinity of the deposited SnO2 films strongly depends on the deposition time. SEM and AFM analyses reveal that the size of nanoparticles or agglomerates, and both average and rms surface roughness is enhanced with the increasing deposition time. Also gas sensors based on these SnO2 nanolayers show an acceptable response to hydrogen at various operating temperatures. 展开更多
关键词 of on as it or in Optimization of Gas Sensing Performance of Nanocrystalline sno2 Thin films Synthesized by Magnetron Sputtering sno by
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Optoelectronic properties of SnO2 thin films sprayed at different deposition times 被引量:1
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作者 Allag Abdelkrim Saad Rahmane +2 位作者 Ouahab Abdelouahab Attouche Hafida Kouidri Nabila 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第4期296-302,共7页
This article presents the elaboration of tin oxide (SnO2) thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film propert... This article presents the elaboration of tin oxide (SnO2) thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film properties are investigated. The films are characterized by several techniques such as x-ray diffraction (XRD), atomic force microscopy (AFM), ultraviolet- visible (UV-Vis) transmission, and four-probe point measurements, and the results suggest that the prepared films are uniform and well adherent to the substrates. X-ray diffraction (XRD) patterns show that SnO2 film is of polycrystal with cassiterite tetragonal crystal structure and a preferential orientation along the (110) plane. The calculated grain sizes are in a range from 32.93 nm to 56.88 nm. Optical transmittance spectra of the films show that their high transparency average transmittances are greater than 65% in the visible region. The optical gaps of SnO2 thin films are found to be in a range of 3.64 eV-3.94 eV. Figures of merit for SnO2 thin films reveal that their maximum value is about 1.15 x 10-4 Ω-1 at λ = 550 nm. Moreover, the measured electrical resistivity at room temperature is on the order of 10^-2 Ω.cm. 展开更多
关键词 thin film sno2 spray pyrolysis thickness PROPERTIES
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Conduction Properties and Scattering Mechanisms in F-doped Textured Transparent Conducting SnO_2 Films Deposited by APCVD 被引量:1
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作者 Deheng ZHANG(Dept. of Physics, Shandong University, Jinan 250100, China)Honglei MA(Institute of Optoelectronic Materials and Devices, Shandong University, Jinan 250100, China) 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1997年第1期50-56,共7页
Transparent conducting F-doped texture SnO2 films with resistivity as low as 5× 10-4 Ω ·cm,with carrier concentrations between 3.5 × 1020 and 7× 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2... Transparent conducting F-doped texture SnO2 films with resistivity as low as 5× 10-4 Ω ·cm,with carrier concentrations between 3.5 × 1020 and 7× 1020 cm-3 and Hall mobilities from 15.7 to 20.1 cm2/(V/s) have been prepared by atmosphere pressure chemical vapour deposition (APCVD). These polycrystalline films possess a variable preferred orientation, the polycrystallite sizes and orientations vary with substrate temperature. The substrate temperature and fluorine flow rate dependence of conductivity, Hall mobility and carrier conentration fOr the resultingfilms have been obtained. The temperature dependence of the mobiity and carrier concentrationhave been measured over a temperature range 16~400 K. A systematically theoretical analysis on scattering mechanisms for the highly conductive SnO2 films has been given. Both theoretical analysis and experimental results indicate that for these degenerate, polycrystalline SnO2 :F films in the low temperature range (below 100 K), ionized impurity scattering is main scattering mechanism. However, when the temperature is higher than 100 K, the lattice vibration scattering becomes dominant. The grain boundary scattering makes a small contribution to limit the mobility of the films. 展开更多
关键词 sno cm Conduction Properties and Scattering Mechanisms in F-doped Textured Transparent Conducting sno2 films Deposited by APCVD
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Structural Evolution and Phase Change Properties of C-Doped Ge_2Sb_2Te_5 Films During Heating in Air 被引量:1
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作者 郑龙 杨幸明 +4 位作者 胡益丰 翟良君 薛建忠 朱小芹 宋志棠 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第12期41-44,共4页
We elucidate the importance of a capping layer on the structural evolution and phase change properties of carbondoped Ge2 Sb2 Te5(C-GST) films during heating in air. Both the C-GST films without and with a thin SiO2... We elucidate the importance of a capping layer on the structural evolution and phase change properties of carbondoped Ge2 Sb2 Te5(C-GST) films during heating in air. Both the C-GST films without and with a thin SiO2 capping layer(C-GST and C-GST/SiO2) are deposited for comparison. Large differences are observed between C-GST and C-GST/SiO2 films in resistance-temperature, x-ray diffraction, x-ray photoelectron spectroscopy,Raman spectra, data retention capability and optical band gap measurements. In the C-GST film, resistancetemperature measurement reveals an unusual smooth decrease in resistance above 110℃ during heating. Xray diffraction result has excluded the possibility of phase change in the C-GST film below 170℃. The x-ray photoelectron spectroscopy experimental result reveals the evolution of Te chemical valence because of the carbon oxidation during heating. Raman spectra further demonstrate that phase changes from an amorphous state to the hexagonal state occur directly during heating in the C-GST film. The quite smooth decrease in resistance is believed to be related with the formation of Te-rich GeTe4-n Gen(n = 0, 1) units above 110℃ in the C-GST film. The oxidation of carbon is harmful to the C-GST phase change properties. 展开更多
关键词 GST Structural Evolution and Phase Change Properties of C-Doped Ge2sb2Te5 films During Heating in Air sb
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Crystallization Process of Superlattice-Like Sb/SiO_2 Thin Films for Phase Change Memory Application
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作者 朱小芹 张锐 +4 位作者 胡益丰 赖天树 张剑豪 邹华 宋志棠 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第5期99-103,共5页
After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature(~240°C), larger crystallization activation energy(6.22 e V), and better data... After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature(~240°C), larger crystallization activation energy(6.22 e V), and better data retention ability(189°C for 10 y). The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb(3 nm)/SiO_2(7 nm)-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb(3 nm)/SiO_2(7 nm) thin film shows a low thermal conductivity of 0.13 W/(m·K). 展开更多
关键词 sb Crystallization Process of Superlattice-Like sb/SiO2 Thin films for Phase Change Memory Application SiO
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Characteristics of Sb6Te4/VO2 Multilayer Thin Films for Good Stability and Ultrafast Speed Applied in Phase Change Memory
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作者 胡益丰 郭璇 +1 位作者 仇庆前 赖天树 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第9期53-56,共4页
The Sb6 Te4/VO2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb6 Te4, Sb6 Te4/VO2 multilayer composite thin f... The Sb6 Te4/VO2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb6 Te4, Sb6 Te4/VO2 multilayer composite thin films have higher phase change temperature and crystallization resistance, indicating better thermal stability and less power consumption. Also, Sb6 Te4/VO2 has a broader energy band of 1.58 eV and better data retention (125℃ for 103/). The crystallization is suppressed by the multilayer interfaces in Sbf Te4/VO2 thin film with a smaller rms surface roughness for Sbf Te4/VO2 than monolayer Sb4Te6. The picosecond laser technology is applied to study the phase change speed. A short crystallization time of 5.21 ns is realized for the Sb6Te4 (2nm)/VO2 (8nm) thin film. The Sb6 Te4/VO2 multilayer thin film is a potential and competitive phase change material for its good thermal stability and fast phase change speed. 展开更多
关键词 VO Te Characteristics of sb6Te4/VO2 Multilayer Thin films for Good Stability and Ultrafast Speed Applied in Phase Change Memory sb
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SnO_2:Sb薄膜的制备和光致发光性质 被引量:4
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作者 王玉恒 马瑾 +3 位作者 计峰 余旭浒 张锡健 马洪磊 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第5期922-926,共5页
用射频磁控溅射法在玻璃衬底上制备出SnO2∶Sb薄膜.制备样品为多晶薄膜,具有纯氧化锡的四方金红石结构和(110)择优取向,Sb离子以替位式掺杂的形式存在于SnO2 晶格中.室温条件下对样品进行光致发光测量,在392nm附近观测到强的紫外紫光发... 用射频磁控溅射法在玻璃衬底上制备出SnO2∶Sb薄膜.制备样品为多晶薄膜,具有纯氧化锡的四方金红石结构和(110)择优取向,Sb离子以替位式掺杂的形式存在于SnO2 晶格中.室温条件下对样品进行光致发光测量,在392nm附近观测到强的紫外紫光发射,发射强度随制备功率的增加而增强,且样品退火后发射强度也明显增强.紫外紫光发射的起源被归于由Sb形成的施主能级和受主能级之间的电子跃迁. 展开更多
关键词 sno2:sb薄膜 射频磁控溅射 光致发光
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钕改性钛基SnO_2/Sb电催化电极的制备及表征 被引量:18
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作者 李善评 胡振 曹翰林 《中国稀土学报》 CAS CSCD 北大核心 2008年第3期291-297,共7页
为改善钛基SnO2/Sb电极的电催化性能,采用浸渍法制备了Nd改性钛基SnO2/Sb电极。以活性艳红X-3B为目标有机物,考察电极的电催化性能,对制备温度和Nd掺杂量进行了研究,确定了适宜的制备条件为:热处理温度550℃,Nd掺杂量1.0%。采用SEM,EDS,... 为改善钛基SnO2/Sb电极的电催化性能,采用浸渍法制备了Nd改性钛基SnO2/Sb电极。以活性艳红X-3B为目标有机物,考察电极的电催化性能,对制备温度和Nd掺杂量进行了研究,确定了适宜的制备条件为:热处理温度550℃,Nd掺杂量1.0%。采用SEM,EDS,XRD及XPS等分析方法对所制备电极的表面形貌、元素组成及结构进行分析,发现掺杂Nd可使SnO2粒径变小,有利于电极电催化性能的改善,同时Nd元素的引入可使杂质元素Sb,Nd在电极表面涂层富集。Nd改性钛基SnO2/Sb电极表面主要是四方相金红石结构的SnO2晶体,掺杂的Sb和Nd分别以Sb5+和Nd3+的形式存在。电极动电位扫描测试结果表明,Nd改性钛基SnO2/Sb电极具有较高的阳极析氧电位,有利于有机物的阳极氧化降解。 展开更多
关键词 sno2/sb电极 掺杂 电催化 稀土
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喷雾热解法制备SnO_2:Sb透明导电薄膜 被引量:17
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作者 张聚宝 侯春 +5 位作者 翁文剑 程逵 杜丕一 沈鸽 汪建勋 韩高荣 《硅酸盐学报》 EI CAS CSCD 北大核心 2003年第11期1063-1068,共6页
采用喷雾热解技术制备出了光电性能优良的SnO_2:Sb透明导电薄膜,对薄膜的结构特性、光电性质以及制备条件对薄膜性能的影响进行了研究。并进一步研究了喷雾热解法中薄膜的形成过程和工艺参数对薄膜微观结构和性能的影响。实验结果表明:... 采用喷雾热解技术制备出了光电性能优良的SnO_2:Sb透明导电薄膜,对薄膜的结构特性、光电性质以及制备条件对薄膜性能的影响进行了研究。并进一步研究了喷雾热解法中薄膜的形成过程和工艺参数对薄膜微观结构和性能的影响。实验结果表明:在Sb掺杂量为11%(摩尔分数)和基板温度为500℃的条件下,SnO_2:Sb薄膜具有最佳的光电性能,平均可见光透过率为82%,方块电阻达13.4Ω/□,电阻率为4.9×10^(-4)Ω·cm。 展开更多
关键词 透明导电薄膜 掺锑二氧化锡 喷雾热解 光电性能 sno2:sb
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High Sensitivity of Porous Cu-Doped SnO2 Thin Films to Methanol
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作者 Sara Benzitouni Mourad Zaabat +6 位作者 Aicha Khial Djamil Rechem Ahlem Benaboud Dhikra Bouras Abdelhakim Mahdjoub Mahdia Toubane Raphael Coste 《Advances in Nanoparticles》 2016年第2期140-148,共9页
Porous Cu-doped SnO<sub>2</sub> thin films were synthesized by the sol-gel dip-coating method for enhancing methanol sensing performance. The effect of Cu doping concentration on the SnO<sub>2</su... Porous Cu-doped SnO<sub>2</sub> thin films were synthesized by the sol-gel dip-coating method for enhancing methanol sensing performance. The effect of Cu doping concentration on the SnO<sub>2</sub> sensibility was investigated. XRD data confirm that the fabricated SnO<sub>2</sub> films are polycrystalline with tetragonal rutile crystal structure. AFM and SEM micrographs confirmed the roughness and the porosity of SnO<sub>2</sub> surface, respectively. UV-Vis spectrum shows that SnO<sub>2</sub> thin films exhibit high transmittance in the visible region &#126;95%. The band gap (3.80 - 3.92 eV) and the optical thickness (893 - 131 nm) of prepared films were calculated from transmittance data. The sensing results demonstrate that SnO<sub>2</sub> films have a high sensitivity and a fast response to methanol. In particular, 3% Cu-SnO<sub>2</sub> films have a higher sensitivity (98%), faster response (10-<sup>2</sup> s) and shorter recovery time (18 s) than other films. 展开更多
关键词 sno2 Cu-Doped Sensitivity Porosity Response Time Band Gap Thin films
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磁控溅射法在有机衬底上制备SnO_2掺Sb透明导电膜 被引量:8
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作者 杨田林 杨光德 +1 位作者 高绪团 万云芳 《半导体技术》 CAS CSCD 北大核心 2002年第12期64-67,共4页
采用射频磁控溅射法在有机柔性衬底上制备出了SnO2: Sb透明导电膜,讨论了薄膜的结构和光电性质对制备条件的依赖关系。制备的样品为多晶薄膜,并且保持了二氧化锡的金红石结构。对衬底适当地加热,当衬底温度为200℃时,在PI(聚酰亚胺)胶... 采用射频磁控溅射法在有机柔性衬底上制备出了SnO2: Sb透明导电膜,讨论了薄膜的结构和光电性质对制备条件的依赖关系。制备的样品为多晶薄膜,并且保持了二氧化锡的金红石结构。对衬底适当地加热,当衬底温度为200℃时,在PI(聚酰亚胺)胶片上制备出了性能良好的薄膜,薄膜相应自由载流子霍耳迁移率的最大值为13.9cm2/V·s,载流子浓度为15.5×1019 cm-3,薄膜电阻率的最小值为3.7×10-3W·cm。在可见光范围内,样品的相对透过率为85%左右。 展开更多
关键词 磁控溅射法 制备 sno2 sb透明导电膜
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基板温度对SnO_2:Sb薄膜结构和性能的影响 被引量:7
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作者 谢莲革 汪建勋 +3 位作者 沈鸽 翁文剑 杜丕一 韩高荣 《功能材料》 EI CAS CSCD 北大核心 2005年第3期411-413,418,共4页
以单丁基三氯化锡(MBTC)和 SbCl3 为反应原料,采用常压化学气相沉积法(APCVD 法)在不同的基板温度下制备 Sb 掺杂 SnO2 薄膜,用 XRD、SEM表征了薄膜的结构和形貌,通过测量薄膜的方块电阻、载流子浓度、霍尔(Hall)系数、紫外可见光谱等性... 以单丁基三氯化锡(MBTC)和 SbCl3 为反应原料,采用常压化学气相沉积法(APCVD 法)在不同的基板温度下制备 Sb 掺杂 SnO2 薄膜,用 XRD、SEM表征了薄膜的结构和形貌,通过测量薄膜的方块电阻、载流子浓度、霍尔(Hall)系数、紫外可见光谱等性质,详细研究了基板温度对薄膜结构和光电性能的影响。实验表明 550℃以上制备的样品为多晶薄膜,并保持四方相金红石型结构;在 650℃下沉积的薄膜具有最低的方块电阻值,为 72Ω/□;在可见光区域薄膜透射率和反射率随着基板温度的提高均有所下降。 展开更多
关键词 APCVD法 sb掺杂sno2薄膜 基板温度
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退火处理对SnO_2:Sb薄膜结构和光致发光性质的影响 被引量:6
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作者 王玉恒 马瑾 +2 位作者 计峰 余旭浒 马洪磊 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2005年第11期1747-1750,共4页
用射频磁控溅射法在玻璃衬底上制备出SnO2:Sb薄膜,研究了不同掺杂和退火对薄膜结构的影响。制备薄膜是具有纯氧化锡四方金红石结构的多晶膜薄,晶粒生长的择优取向为(110)。室温下光致发光测量首次观测到392nm附近存在紫外-紫光发射,并对... 用射频磁控溅射法在玻璃衬底上制备出SnO2:Sb薄膜,研究了不同掺杂和退火对薄膜结构的影响。制备薄膜是具有纯氧化锡四方金红石结构的多晶膜薄,晶粒生长的择优取向为(110)。室温下光致发光测量首次观测到392nm附近存在紫外-紫光发射,并对SnO2:Sb的光致发光机制进行了探索性研究。 展开更多
关键词 射频磁控溅射法 sno2:sb薄膜 光致发光
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耐酸非贵金属Ti/MO_2阳极SnO_2+Sb_2O_4中间层研究 被引量:12
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作者 梁镇海 张福元 孙彦平 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2006年第10期1605-1609,共5页
采用热分解法制备了非贵金属SnO2+Sb2O4中间层Ti基MO2活性层电极,利用SEM,XRD和XPS方法对中间层进行了表征。测定了Ti/SnO2+Sb2O4/MnO2和Ti/SnO2+Sb2O4/PbO2电极在硫酸溶液中的析氧极化曲线,二者起始析氧过电位均比贵金属小;考察了在高... 采用热分解法制备了非贵金属SnO2+Sb2O4中间层Ti基MO2活性层电极,利用SEM,XRD和XPS方法对中间层进行了表征。测定了Ti/SnO2+Sb2O4/MnO2和Ti/SnO2+Sb2O4/PbO2电极在硫酸溶液中的析氧极化曲线,二者起始析氧过电位均比贵金属小;考察了在高电流密度(4A/cm2)下的加速寿命,二者依次分别达到18h和86h。实验表明,SnO2+Sb2O4是一种具有良好导电性和结合力的耐酸Ti基MO2电极中间层材料。 展开更多
关键词 sno2+sb2O4中间层 钛基氧化物 耐酸阳极 非贵金属
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CVD法制备Sb掺杂SnO_2薄膜的结构与性能研究 被引量:7
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作者 谢莲革 沃银花 +4 位作者 汪建勋 沈鸽 翁文剑 刘起英 韩高荣 《浙江大学学报(工学版)》 EI CAS CSCD 北大核心 2005年第11期1824-1828,共5页
采用化学气相沉积法(CVD)制备了Sb掺杂SnO2薄膜(ATO),研究了Sb掺杂量对ATO薄膜结构和性能的影响.利用X射线衍射(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等分析手段对所制得薄膜的结构、形貌、成分等进行了表征,XRD结果表明在基板温... 采用化学气相沉积法(CVD)制备了Sb掺杂SnO2薄膜(ATO),研究了Sb掺杂量对ATO薄膜结构和性能的影响.利用X射线衍射(XRD)、扫描电镜(SEM)、X射线光电子能谱(XPS)等分析手段对所制得薄膜的结构、形貌、成分等进行了表征,XRD结果表明在基板温度为665℃时能够制得结晶性能较好的多晶薄膜,XPS分析确定掺杂后的Sb以Sb5+离子形式存在.讨论了Sb掺杂量对方块电阻、透射率和反射率等薄膜性质的影响,结果表明,当Sb掺杂量为2%时取得最小方块电阻为7.8Ω/□,在可见光区薄膜的透射率和反射率随着Sb掺杂量的增加呈下降趋势.最后探讨了Sb掺杂SnO2薄膜的显色特性,认为Sb5+离子的本征吸收是薄膜显色的主要原因. 展开更多
关键词 化学气相沉积(CVD) sb掺杂sno2薄膜 掺杂量
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有机衬底SnO_2∶Sb透明导电膜的研究 被引量:8
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作者 马瑾 郝晓涛 +2 位作者 马洪磊 张德恒 徐现刚 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第6期599-603,共5页
采用射频磁控溅射法在有机薄膜衬底上制备出 Sn O2 ∶ Sb透明导电膜 ,并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究 .制备的样品为多晶薄膜 ,并且保持了纯二氧化锡的金红石结构 .Sn O2 ∶ Sb薄膜中 Sb2 O3的最佳掺... 采用射频磁控溅射法在有机薄膜衬底上制备出 Sn O2 ∶ Sb透明导电膜 ,并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究 .制备的样品为多晶薄膜 ,并且保持了纯二氧化锡的金红石结构 .Sn O2 ∶ Sb薄膜中 Sb2 O3的最佳掺杂比例为 6 % .适当调节制备参数 ,可以获得在可见光范围内平均透过率大于 85 %的有机衬底 Sn O2 ∶ Sb透明导电薄膜 ,其电阻率~ 3.7× 10 - 3Ω· cm ,载流子浓度~ 1.5 5× 10 2 0 cm- 3,霍耳迁移率~ 13cm2 · V- 1 · 展开更多
关键词 有机衬底 sno2:sb 磁控溅射 透明导电膜 二氧化锡
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