The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits wi...The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3~4.4 nm), astronomy (λ=5~31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.展开更多
A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser ...A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser is focused to produce high temperature plasma emitting EUV radiation. The source is equipped with a newly designed debris stopper protecting a condenser multilayer mirror from the particle debris of the target. The condenser mirror focuses the light onto an EUV beam-splitter to form transmitted and reflected paths for producing interference fringes of a sharing type. The optical configuration is of a common path based on a triangular path type with a focusing at the beam-splitter, which is enabled to produce fringes by a low coherence radiation with a standard optical quality beam-splitter. The fringes are recorded by an imaging plate with pixels as small as 25μm. The dynamic range of linearity in detection of the EUV light was found to be more than 10 4 with sensitivity of 10 4 photons/pixel, enough for the purpose of interferogram recording, possibly with one laser shot.展开更多
Laser shaping was introduced to maskless projection soft lithography by using digital micro-mirror device (DMD). The predesigned intensity pattern was imprinted onto the DMD and the input laser beam with a Gaussian or...Laser shaping was introduced to maskless projection soft lithography by using digital micro-mirror device (DMD). The predesigned intensity pattern was imprinted onto the DMD and the input laser beam with a Gaussian or quasi-Gaussian distribution will carry the pattern on DMD to etch the resin. It provides a method of precise control of laser beam shapes and?photon-induced curing behavior of resin. This technology provides an accurate micro-fabrication of microstructures used for micro-systems. As a virtual mask generator and a binary-amplitude spatial light modulator, DMD is equivalent to the masks in the conventional exposure system. As the virtual masks and shaped laser beam can be achieved flexibly, it is a good method of precision soft lithography for 2D/3D microstructures.展开更多
文摘The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ=13.5 nm), microscopy in the “water window” (λ=2.3~4.4 nm), astronomy (λ=5~31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
文摘A new interferometer for extreme ultraviolet (EUV) radiation with a laser produced plasma (LPP) laboratory source is under construction. The LPP source is operated with a Sn solid rod target on which pulsed YAG laser is focused to produce high temperature plasma emitting EUV radiation. The source is equipped with a newly designed debris stopper protecting a condenser multilayer mirror from the particle debris of the target. The condenser mirror focuses the light onto an EUV beam-splitter to form transmitted and reflected paths for producing interference fringes of a sharing type. The optical configuration is of a common path based on a triangular path type with a focusing at the beam-splitter, which is enabled to produce fringes by a low coherence radiation with a standard optical quality beam-splitter. The fringes are recorded by an imaging plate with pixels as small as 25μm. The dynamic range of linearity in detection of the EUV light was found to be more than 10 4 with sensitivity of 10 4 photons/pixel, enough for the purpose of interferogram recording, possibly with one laser shot.
文摘Laser shaping was introduced to maskless projection soft lithography by using digital micro-mirror device (DMD). The predesigned intensity pattern was imprinted onto the DMD and the input laser beam with a Gaussian or quasi-Gaussian distribution will carry the pattern on DMD to etch the resin. It provides a method of precise control of laser beam shapes and?photon-induced curing behavior of resin. This technology provides an accurate micro-fabrication of microstructures used for micro-systems. As a virtual mask generator and a binary-amplitude spatial light modulator, DMD is equivalent to the masks in the conventional exposure system. As the virtual masks and shaped laser beam can be achieved flexibly, it is a good method of precision soft lithography for 2D/3D microstructures.