We derive an effective Hamiltonian for a spin-1/2 particle confined within a curved thin layer with non-uniform thickness using the confining potential approach.Our analysis reveals the presence of a pseudo-magnetic f...We derive an effective Hamiltonian for a spin-1/2 particle confined within a curved thin layer with non-uniform thickness using the confining potential approach.Our analysis reveals the presence of a pseudo-magnetic field and effective spin–orbit interaction(SOI)arising from the curvature,as well as an effective scalar potential resulting from variations in thickness.Importantly,we demonstrate that the physical effect of additional SOI from thickness fluctuations vanishes in low-dimensional systems,thus guaranteeing the robustness of spin interference measurements to thickness imperfection.Furthermore,we establish the applicability of the effective Hamiltonian in both symmetric and asymmetric confinement scenarios,which is crucial for its utilization in one-side etching systems.展开更多
基金This work was supported in part by the National Natural Science Foundation of China(Grant No.12104239)National Natural Science Foundation of Jiangsu Province of China(Grant No.BK20210581)+2 种基金Nanjing University of Posts and Telecommunications Science Foundation(Grant Nos.NY221024 and NY221100)the Science and Technology Program of Guangxi,China(Grant No.2018AD19310)the Jiangxi Provincial Natural Science Foundation(Grant No.20224BAB211020).
文摘We derive an effective Hamiltonian for a spin-1/2 particle confined within a curved thin layer with non-uniform thickness using the confining potential approach.Our analysis reveals the presence of a pseudo-magnetic field and effective spin–orbit interaction(SOI)arising from the curvature,as well as an effective scalar potential resulting from variations in thickness.Importantly,we demonstrate that the physical effect of additional SOI from thickness fluctuations vanishes in low-dimensional systems,thus guaranteeing the robustness of spin interference measurements to thickness imperfection.Furthermore,we establish the applicability of the effective Hamiltonian in both symmetric and asymmetric confinement scenarios,which is crucial for its utilization in one-side etching systems.
