Common Electronic Features and Electronic Nematicity in Parent Compounds of Iron-Based Superconductors and FeSe/SrTiO_3 Films Revealed by Angle-Resolved Photoemission Spectroscopy

We report comprehensive angle-resolved photoemission investigations on the electronic structures and nematicity of the parent compounds of the iron-based superconductors including CeFeAsO, BaFe2As2, NaFeAs, FeSe and undoped FeSe/SrTiO3 films with 1, 2 and 20 layers. While the electronic structure near tile Brillouin zone center F varies dramatically among different materials, the electronic structure near the Brillouin zone corners （M points）, as well as their temperature dependence, are rather similar. The electronic structure near the zone corners is dominated by the electronic nematicity that gives rise to a band splitting of the dxz and dyz bands below the nematie transition temperature. A clear relation is observed between the band splitting magnitude arid the onset temperature of nematicity. Our results may shed light on the origin of nematicity, its effect on the electronic structures, and its relation with superconductivity in the iron-based superconductors.

Memristive Behavior Based on Ba-Doped SrTiO3 Films

The Sr0.95Ba0.05 TiO3 （SBT） nanometer film is prepared on the commercially available Pt/TiO2/SiO2/Si substrate by radio-frequency magnetron sputtering. The x-ray diffraction pattern and the scanning electron microscope image of the cross-sectional profile of the SBT nanometer film are depicted. The memristive mechanism is inferred. The mathematical model M（q） = 12.3656 - 267.4038｜q（t）｜is calculated, where M（q） denotes the memristance depending on the quantity of electric charge, and q（t） denotes the quantity of electric charge depending on the time. The theoretical I-V characteristics of the SBT nanometer film are obtained by the mathematical model. The results show that the theoretical I-V characteristics are consistent with the measured I-V characteristics. Moreover, the mathematical model could guide the research on applications of the memristor.

Structural and electrical properties of SrTiO3 thin films as insulator of metal-ferroelectric-insulator-semiconductor （MFIS） structures

SrTiOs （STO） thin films were deposited on p-Si（100） substrates at various substrate temperatures from 300℃ to 700℃ by radio frequency （RF） magnetron sputtering technique. Their structure and electrical properties were investigated. It was found that the transition from amorphous phase to polycrystalline phase occurred at the substrate temperatures 300-400℃. Their crystallinity became better when the substrate temperatures further increased. The dielectric and leakage current measurements were carried out by using the Si/STO/Pt metal-insulator-semiconductor （MIS） structures at room temperature. It was found that the fixed charge density decreased and both the interface trap density and the dielectric constant increased when the substrate temperatures were increased. The leakage current mechanisms for STO MIS structures with STO films prepared at 700℃ followed the space charge limited current （SCLC） under the low applied electric field and the Poole-Frenkel emission under the high one. In addition, the resistivity for films prepared at 700℃ was higher than 10^11Ω.cm under the voltage lower than 10V （corresponding to the electric field of 1.54×10^3kV.cm^-1）. It suggested that the STO films prepared at 700℃ were suitable for acting as the insulator of metal-ferroelectric-insulator-semiconductor （MFIS） structures.

Dielectric and Structural Properties of SrTiO_3 Thin Films Grown by Laser Molecular Beam Epitaxy

Here I will review recent progress on the study of dielectric SrTiO3 （STO） thin films. In our work, laser molecular beam epitaxy has been used to prepare multilayer heterostructures consisting of dielectric STO and high temperature superconducting YBa2Cu3Oy （YBCO） thin films for tunable applications. Since the tunability of the dielectric constant and dielectric loss of STO are the key parameters determining the performance of tunable devices and hence the feasibility of this technology, the correlations between the deposition parameters of STO thin films, their structural characteristics, and dielectric properties were studied. An enhanced tunability of 74.7%, comparable to that of STO single-crystal, was observed in our grown STO thin films suitable for tunable YBCO applications. On the other hand, we have grown epitaxial STO （110） films on Si without any buffer layer. The nature of epitaxial growth and interfacial structures of the grown films were examined by various techniques, such as Laue diffraction, high-resolution transmission electron microscopy （HRTEM） and x-ray photoelectron spectroscopy. The in-plane alignments for the STO （110） films grown directly on Si （100） was found as STO//Si and STO//Si . HRTEM study has showed a crystalline transition across the STO/Si interface, indicating it is free from any amorphous oxide layer. We provide clear evidence that the interface mainly consists of Sr silicate phase. The results suggest that such Sr silicate interfacial layer exhibits favourable structural and chemical properties that are particularly useful for epitaxial STO （110） growth on Si. Such STO thin films will be useful for practical applications.

Reversible alternation between bipolar and unipolar resistive switching in La-SrTiO_3 thin films

The alternation from bipolar to unipolar resistive switching is observed in perovskite La0.01Sr0.99TiO3 thin films. These two switching modes can be activated separately depending on the compliance current （Icomp） during the electroforming process： with a higher Icomp （5 mA） the unipolar resistance switching behavior is measured, while the bipolar resistance switching behavior is observed with a lower Icomp （1 mA）. On the basis of I–V characteristics, the switching mechanisms for the URS and BRS modes are considered as being a change in the Schottky-like barrier height and/or width at the Pt/La-SrTiO3 interface and the formation and disruption of conduction filaments, respectively.

Bipolar Resistive Switching in Epitaxial Mn_3O_4 Thin Films on Nb-Doped SrTiO_3 Substrates

Spinel （O01）-orientated Mn304 thin films on Nb-doped SrTi03 （001） substrates are fabricated via the pulsed laser deposition method. X-ray diffraction and high-resolution transmission electron microscopy indicate that the as-prepared epitaxial fihn is well crystaiHzed. In the film plane the orientation relationship between the film and the substrate is [lOOjMn3 04 ｜｜[110] Nb-doped SrTiO3. After an electroforming process, the film shows bipolar nonvolatile resistance switching behavior. The positive voltage bias drives the sample into a low resistance state, while the negative voltage switches it back to a high resistance state. The switching polarity is different from the previous studies. The complex impedance measurement suggests that the resistance switching behavior is of filament type. Due to the performance reproducibility and state stability, Mn3O4 might be a promising candidate for the resistive random access memory devices.

Molecular Beam Epitaxy Growth of Tetragonal FeS Films on SrTiO3(001) Substrates

We report the successful growth of the tetragonal FeS film with one or two unit-cell （UC） thickness on SrTiO33（001） substrates by molecular beam epitaxy. Large lattice constant mismatch with the substrate leads to high density of defects in single-UC FeS, while it has been significantly reduced in the double-UC thick film due to the lattice relaxation. The scanning tunneling spectra on the surface of the FeS thin film reveal the electronic doping effect of single-UC FeS from the substrate. In addition, at the Fermi level, the energy gaps of approximately 1.5？meV are observed in the films of both thicknesses at 4.6？K and below. The absence of coherence peaks of gap spectra may be related to the preformed Cooper-pairs without phase coherence.

High-Quality FeTe_(1-x)Se_x Monolayer Films on SrTiO_3(001) Substrates Grown by Molecular Beam Epitaxy

We report the growth process of FeTe1-xSex （0 〈 x 〈 1） monolayer films on SrTi03 （STO） substrates through molecular beam epitaxy and discuss the possible ways to improve the film quality. By exploring the parameters of substrate treatment, growth control and post growth annealing, we successfully obtain a series of FeTe1-xSex monolayer films. In the whole growth process, we find the significance of the temperature control through surface roughness monitored by the reflection high-energy electron diffraction and scanning tunneling microscopy. We obtain the best quality of FeSe monolayer films with the STO substrate treated at T = 900 950℃ before growth, the FeSe deposited at T = 310℃ during growth and annealed at T = 380℃ after growth. For FeTe1-xSex （x-1）, both the growth temperature and annealing temperature decrease to T=260℃. According to the angle- resolved photoemission spectroscopy measurements, the superconductivity of the FeTe1-xSex film is robust and insensitive to Se concentration. All the above are instructive for further investigations of the superconductivity in FeTe1-xSex films.

Molecular Beam Epitaxy Growth and Scanning Tunneling Microscopy Study of Pyrite CuSe2 Films on SrTiO3

We perform molecular beam epitaxy growth and scanning tunneling microscopy study of copper diselenide （CuSe2 ） films on SrTiO3 （001）. Using a Se-rich condition, the single-phase pyrite CuSe2 grows in the Stranski-Krastanov （layer-plus-island） mode with a preferential orientation of （111）. Our careful inspection of both the as-grown and post-annealed CuSe2 films at various temperatures invariably shows a Cu-terminated surface, which, depending on the annealing temperature, reconstructs into two distinct structures 2 ×√3 and √x ×√3-R30°. The Cu termi- nation is supported by the depressed density of states near the Fermi level, measured by in-situ low temperature scanning tunneling spectroscopy. Our study helps understand the preparation and surface chemistry of transition metal pyrite dichalcogenides thin films.

激光分子束外延SrTiO_3薄膜退火过程中表面扩散的研究

用激光分子束外延研究了SrTiO3 同质外延时原位退火中 ,反射高能电子衍射 (RHEED)强度的恢复———驰豫时间 ,导出了高真空下表面扩散的活化能为 0 31eV ,与低真空下的结果相比要小许多 ,这反映了粒子达到基片时的能量差。对沉积不同厚度的薄膜退火研究 ,表明当薄膜厚度增加时 ,表面恢复情况减弱 ,而导致随后的沉积时RHEED振荡周期的改变。

不同晶向SrTiO_3上外延GaAs薄膜的光谱研究

利用MBE生长技术 ,成功地在不同晶向SrTiO3 ( 1 0 0 ) ( 1 1 1 ) ( 1 1 0 )衬底上生长了GaAs薄膜 ,利用显微Raman和荧光光谱 (PL)对此进行了研究。实验结果表明 ,在不同晶向SrTiO3 上生长的GaAs薄膜有不同的晶向和应力状态。荧光光谱 (PL)研究表明在SrTiO3 ( 1 0 0 ) ( 1 1 1 )晶面上生长的GaAs薄膜的PL峰发生明显的蓝移。研究表明在SrTiO3 ( 1 1 0 )面上生长的GaAs薄膜和体单晶基本上一致 ,有更好的光学质量。

Bias polarity-dependent unipolar switching behavior in NiO/SrTiO_3 stacked layer

The identification of the switching location has been a key technology to tune the physical properties of unipolar resistive switching（RS） cells.Here we report the RS properties of Au/Ni O/Sr Ti O3（STO）/Pt memory cells.The switching repeatability is closely related to the applied bias polarity,which is different from the scenario of the Au/STO/Pt cells reported in our previous researches.The high resistance in positive bias is greater than that in negative bias.The R（T）–R0I^2 R（T） plot of the on-state I–V curve shows a regular shape only with a slight bend and an abnormal shape with an abrupt increase and decrease under negative and positive bias,respectively.These comparative experimental results reveal that the conductance filament consisting of oxygen vacancies grows from the cathode to the anode.The spatial RS location is identified with the weaker part along the conductance filament length direction,which should be near the Ni O/STO interface and STO/Pt interface under positive and negative bias,respectively.

掺杂Fe^(3+)对钛酸锶氧敏薄膜电阻的影响

利用溶胶—凝胶的方法制备钛酸锶氧敏薄膜 ,掺杂不同含量的铁离子 ,测试在不同氧分压、温度下薄膜的电阻。所得到的结果和镁离子的掺杂一样 ,可以改善阻温特性 ,降低薄膜电阻。铁离子的摩尔分数在 2 0 %～ 2 5 %之间时 ,薄膜电阻在一定的温度区间内降低 ,表现出较好的氧敏特性 ,在该区间内阻温特性很好 。

Influence of oxygen treatment and temperature on electrical properties of the epitaxial Nb-doped SrTiO_3 films on silicon

We have fabricated the epitaxial Nb-doped SrTiO3(NbSTO) thin films on Si substrates using a TiN film as the buffer layer.The oxygen-treatment and temperature dependence of electrical properties has been investigated.Oxygen treatment showed the surface change of NbSTO films has immense influence on the resistance switching.The resistance ratio of two resistance states decreased after oxygen treatment.With tested-temperature rising,the resistance and resistance ratio of two resistance states increased.The resistance switching of Pt/NbSTO junction as a function of oxygen-treatment and temperature can be explained by the charge trapping and detrapping process in the Pt/NbSTO interface,which will help understand the resistance switching mechanism of oxides.

The third-order optical nonlinearity of the stainless steel doped SrTiO_3 thin film grown by L-MBE

Stainless steel-doped SrTiO3 thin films were fabricated by laser molecular beam epitaxy (L-MBE). Nonlinear optical property of the thin film was measured by the single beam Z-scan technique at the wavelength of 532 nm. Two two-phonon absorption coefficient and nonlinear refractive index were determined to be 9.37 x 10-7 m/W and 1.55 x 10-6 esu, respectively. The merit figure T was calculated to be 1.8, satisfying condition T < 1 for an optical switch. The thin film has a very promising prospect for the applications in optical device.