期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Subthermionic field-effect transistors with sub-5 nm gate lengths based on van der Waals ferroelectric heterostructures 被引量:5
1
作者 Feng Wang Jia Liu +9 位作者 Wenhao Huang Ruiqing Cheng Lei Yin Junjun Wang Marshet Getaye Sendeku Yu Zhang Xueying Zhan Chongxin Shan Zhenxing Wang Jun He 《Science Bulletin》 SCIE EI CAS CSCD 2020年第17期1444-1450,M0003,共8页
Overcoming the sub-5 nm gate length limit and decreasing the power dissipation are two main objects in the electronics research field. Besides advanced engineering techniques, considering new material systems may be h... Overcoming the sub-5 nm gate length limit and decreasing the power dissipation are two main objects in the electronics research field. Besides advanced engineering techniques, considering new material systems may be helpful. Here, we demonstrate two-dimensional(2D) subthermionic field-effect transistors(FETs) with sub-5 nm gate lengths based on ferroelectric(FE) van der Waals heterostructures(vdWHs).The FE vd WHs are composed of graphene, MoS2, and CuInP2S6 acting as 2D contacts, channels, and ferroelectric dielectric layers, respectively. We first show that the as-fabricated long-channel device exhibits nearly hysteresis-free subthermionic switching over three orders of magnitude of drain current at room temperature. Further, we fabricate short-channel subthermionic FETs using metallic carbon nanotubes as effective gate terminals. A typical device shows subthermionic switching over five-to-six orders of magnitude of drain current with a minimum subthreshold swing of 6.1 mV/dec at room temperature. Our results indicate that 2D materials system is promising for advanced highly-integrated energy-efficient electronic devices. 展开更多
关键词 van der Waals heterostructure Ferroelectric two-dimensional materials subthermionic field-effect transistor Short-channel field-effect transistor
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部