An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced long...An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.展开更多
Some metal compounds called as Non-Evaporable-Getter have been widely used to improve vacuum system performance of accelerator facility.In this paper,a TiZrV film on the surface of stainless steel vacuum pipe is made ...Some metal compounds called as Non-Evaporable-Getter have been widely used to improve vacuum system performance of accelerator facility.In this paper,a TiZrV film on the surface of stainless steel vacuum pipe is made by direct current magnetron sputtering,and its vacuum performance is experimentally studied.Our results show that the TiZrV film is partly activated at 160℃,and its pressure performance is similar with one at higher temperature. The coating reduces the ultimate pressure and prominently shortens the pressure-down time in a sputter ion pump system,thus creating evenly distributed pressure profile in a coating pipe.The adsorption rate is steady,and adsorption amount increases linearly.Such TiZrV-coated pipe behaves like pump other than gas source in vacuum system.展开更多
TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin fihn coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 p...TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin fihn coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope （AFM）, scanning electron microscope （SEM）, X-ray photoelectron spectroscopy （XPS） and X-Ray Diffraction （XRD）. The grain size of TiZrV and Pd films were about 0.42 1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2 4 nm, but for Pd film it is large, about 17 19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.展开更多
基金supported by the National Natural Science Funds of China(No.11205155)Fundamental Research Funds for the Central Universities(WK2310000041)
文摘An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.
文摘Some metal compounds called as Non-Evaporable-Getter have been widely used to improve vacuum system performance of accelerator facility.In this paper,a TiZrV film on the surface of stainless steel vacuum pipe is made by direct current magnetron sputtering,and its vacuum performance is experimentally studied.Our results show that the TiZrV film is partly activated at 160℃,and its pressure performance is similar with one at higher temperature. The coating reduces the ultimate pressure and prominently shortens the pressure-down time in a sputter ion pump system,thus creating evenly distributed pressure profile in a coating pipe.The adsorption rate is steady,and adsorption amount increases linearly.Such TiZrV-coated pipe behaves like pump other than gas source in vacuum system.
基金Supported by National Natural Science Funds of China(11205155)Fundamental Research Funds for the Central Universities(WK2310000041)
文摘TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin fihn coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H2 pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope （AFM）, scanning electron microscope （SEM）, X-ray photoelectron spectroscopy （XPS） and X-Ray Diffraction （XRD）. The grain size of TiZrV and Pd films were about 0.42 1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2 4 nm, but for Pd film it is large, about 17 19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
