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Analytical Modeling of Quantum Mechanical Tunneling in Germanium Nano-MOSFETS
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作者 Amit Chaudhry J. N. Roy 《Journal of Electronic Science and Technology》 CAS 2010年第2期144-148,共5页
A simple analytical model has been developed to study quantum mechanical effects (QME) in a germanium substrate MOSFET (metal oxide semiconductor field effect transistor), which includes gate oxide tunneling consi... A simple analytical model has been developed to study quantum mechanical effects (QME) in a germanium substrate MOSFET (metal oxide semiconductor field effect transistor), which includes gate oxide tunneling considering the energy quantization effects in the substrate. Some alternate high dielectric constant materials to reduce the tunneling have also been studied. By comparing with the numerically reported results, the results match well with the existing reported work. 展开更多
关键词 Index terms---dielectric effective oxide thickness energy quantization quantum mechanical effects Tunneling.
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