A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The s...A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The solution with ratio of H2O/TEOS≥15,R4N^+ and glycerol as templates,combining with the hydrolyzed intermediate,controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750℃ to 850℃;the formation mechanism of the porous silica films was discussed;morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458,the thermal conductivity <0.7 W/m/K.The fabricating procedure and the sequence had not been reported before.展开更多
文摘A homogeneous crack-free nano- or meso-porous silica films on silicon was fabricated by colloidal silica sol derived by hydrolyzing tetraethyl orthosilicate (TEOS) catalyzing with (C4H9)4N^+OH^- in water medium. The solution with ratio of H2O/TEOS≥15,R4N^+ and glycerol as templates,combining with the hydrolyzed intermediate,controlled the silica aggregating; the templated silica film with heterostructure was developed into homogeneous nano-porous then meso-porous silica films after being annealed from 750℃ to 850℃;the formation mechanism of the porous silica films was discussed;morphologies of the silica films were characterized. The refractive indexes of the porous silica films were 1.256-1.458,the thermal conductivity <0.7 W/m/K.The fabricating procedure and the sequence had not been reported before.
